Artificial marble with transparent and amorphous pattern

Patent metadata

Field	Value
Publication number	US-9340064-B2
Application number	US-201213530148-A
Country	US
Kind code	B2
Filing date	Jun 22, 2012
Priority date	Dec 23, 2009
Publication date	May 17, 2016
Grant date	May 17, 2016

Abstract

Artificial marble having a transparent amorphous pattern includes a base or matrix material portion and a transparent pattern portion. The pattern portion has a specific gravity or about 1.60 or more and is formed by hardening or curing a resin composition comprising a binder selected from halogenated urethane acrylates, halogenated epoxy acrylates and combinations thereof and an acrylic polymerizable monomer.

First claim

What is claimed is:

1. An artificial marble having an amorphous pattern comprising a matrix and a pattern part, wherein said pattern part has a specific gravity of about 1.6 to about 2.0, and wherein said pattern part comprises a cured pattern part forming resin composition (A) comprising a binder, an acrylic polymerizable monomer, and an inorganic filler in an amount of about 0.1 to about 15 parts by weight based on about 100 parts by weight of a mixture of the binder and the acrylic polymerizable monomer.

2. The artificial marble having an amorphous pattern of claim 1 , wherein said pattern part has a transparency of more than about 70%.

3. The artificial marble having an amorphous pattern of claim 1 , wherein the binder comprises an halogenated urethane acrylate, halogenated epoxy acrylate, or a combination thereof.

4. The artificial marble having an amorphous pattern of claim 3 , wherein the pattern part forming resin composition (A) comprises about 50 to about 90 parts by weight of the binder and about 10 to about 50 parts by weight of the acrylic polymerizable monomer, based on the total weight of the pattern part forming resin composition (A).

5. The artificial marble having an amorphous pattern of claim 3 , wherein the pattern part forming resin composition (A) further comprises a reactive monomer in an amount of about 1 to about 100 parts by weight based on about 100 parts by weight of the acrylic polymerizable monomer.

6. The artificial marble having an amorphous pattern of claim 3 , wherein said acrylic polymerizable monomer comprises methyl (meth)acrylate, ethyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, octyl (meth)acrylate, dodecyl (meth)acrylate, octadecyl (meth)acrylate, methylcyclohexyl (meth)acrylate, isobornyl (meth)acrylate, phenyl (meth)acrylate, benzyl (meth)acrylate, chlorophenyl (meth)acrylate, methoxyphenyl (meth)acrylate, bromophenyl (meth)acrylate, ethylene glycol di(meth)acrylate, 1,2-propylene glycol (meth)acrylate, 1,3-butanediol di(meth)acrylate, 1,3-propylene glycol (meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,5-pentanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, dipropylene glycol di(meth)acrylate, diallyl terephthalate, diallyl phthalate, diallyl carbonate, trimethy- lolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, ethoxy ethoxyethyl acrylate, epoxy acrylate of glycidyl methacrylic acid, 1,6-hexanediol di(meth)acrylate, glycerol tri(meth)acrylate, methylpropanediol di(meth)acrylate, polyethylene glycol di(meth)acrylate, or a combination thereof.

7. The artificial marble having an amorphous pattern of claim 3 , wherein said pattern part forming resin composition further comprises an additive comprising a colorant, defoaming agent, coupling agent, ultraviolet absorber, light diffusing agent, polymerization inhibitor, antistatic agent, flame retardant, heat stabilizer or a combination thereof.

8. A method for preparing an artificial marble having an amorphous pattern, the method comprising:
mixing a polymerizable acrylic monomer with a binder comprising a halogenated urethane acrylate, halogenated epoxy acrylate or a combination of thereof and an inorganic filler in an amount of about 0.1 to about 15 parts by weight based on about 100 parts by weight of a mixture of the binder and the acrylic polymerizable monomer to prepare a pattern part forming resin composition (A) having a specific gravity of about 1.6 to about 2.0;
dissolving polyacrylate in an acrylic monomer to prepare a matrix forming slurry (B);
non-uniformly supplying both of the pattern forming resin composition (A) and the matrix forming slurry (B) into a molding cell; and
curing the pattern part forming resin composition (A) and the matrix forming slurry (B).

9. The method of claim 8 , wherein the pattern part forming resin composition (A) comprises about 50 to about 90 parts by weight of the binder and about 10 to about 50 parts by weight of the acrylic polymerizable monomer, based on the total weight of the pattern part forming resin composition (A).

10. The method of claim 8 , wherein the pattern part forming resin composition (A) further comprises a reactive monomer in an amount of about 1 to about 100 parts by weight based on about 100 parts by weight of the acrylic polymerizable monomer.

Assignees

• Kim Dong Hee
• Park Eung Seo
• Son Chang Ho
• Cheil Ind Inc

Inventors

• Kim Dong Hee
• Park Eung Seo
• Son Chang Ho

Classifications

• C08L33/16

  Homopolymers or copolymers of esters containing halogen atoms · CPC title

• Y10T428/24802

  Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] · CPC title

• C08L2205/02

  containing two or more polymers of the same C08L -group · CPC title

• C04B14/285

  Marble · CPC title

• C04B26/06

  Acrylates · CPC title