Transferable transparent conductive oxide

US9337436B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9337436-B2
Application numberUS-201514736942-A
CountryUS
Kind codeB2
Filing dateJun 11, 2015
Priority dateSep 20, 2013
Publication dateMay 10, 2016
Grant dateMay 10, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for fabricating a photovoltaic device includes forming an adhesion layer on a substrate, forming a material layer on the adhesion layer and applying release tape to the material layer. The substrate is removed at a weakest interface between the adhesion layer and the substrate by mechanically pulling the release tape to form a transfer substrate including the adhesion layer, the material layer and the release tape. The transfer substrate is transferred to a target substrate to contact the adhesion layer to the target substrate. The transfer substrate includes a material sensitive to formation processes of the transfer substrate such that exposure to the formation processes of the transfer substrate is avoided by the target substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for fabricating a photovoltaic device, comprising: forming a material layer on an adhesion layer formed on a substrate; applying release tape to the material layer; mechanically pulling the release tape to form a transfer substrate including the adhesion layer, the material layer and the release tape; and transferring the transfer substrate to a target substrate to contact the adhesion layer to the target substrate such that exposure to the formation processes of the transfer substrate is avoided by the target substrate. 2. The method as recited in claim 1 , wherein the adhesion layer includes a layer of one or more of: gold, silver, copper, platinum, graphene and carbon nanotubes. 3. The method as recited in claim 1 , wherein forming the material layer includes forming one or more of: a transparent conductor, a multi-layer structure, device structures or a metal grid. 4. The method as recited in claim 1 , wherein the material layer includes a sensitive material including an organic photovoltaic layer. 5. The method as recited in claim 4 , wherein the target substrate includes a transparent conductor. 6. The method as recited in claim 4 , wherein the sensitive material is exposed to temperatures not exceeding 120 degrees Celsius. 7. The method as recited in claim 1 , further comprising: removing the release tape using heat. 8. The method as recited in claim 1 , wherein the material layer includes an organic transparent conductor. 9. The method as recited in claim 8 , wherein the organic transparent conductor includes a form of poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate). 10. A method for fabricating a photovoltaic device, comprising: forming a first transparent conductor layer on a metal adhesion layer formed on a substrate; using thermal release tape, mechanically peeling the thermal release tape to remove the first transparent conductor layer and adhesion layer from the substrate; separately forming a sensitive material on a second transparent conductor layer to avoid exposure to formation processes of the adhesion layer and the first transparent conductor layer; and bonding the adhesion layer with the first transparent conductor to the sensitive material to form a photovoltaic device. 11. The method as recited in claim 10 , wherein forming the metal adhesion layer includes forming a layer of one or more of: gold, silver, copper and platinum. 12. The method as recited in claim 10 , further includes forming a metal grid on the first transparent conductor layer. 13. The method as recited in claim 10 , wherein the sensitive material includes an organic photovoltaic layer. 14. The method as recited in claim 10 , further comprising etching the adhesion layer prior to bonding to reduce its thickness. 15. The method as recited in claim 10 , wherein the sensitive material is exposed to temperatures not exceeding 120 degrees Celsius. 16. The method as recited in claim 10 , further comprising: removing the thermal release tape using heat. 17. The method as recited in claim 10 , wherein bonding includes one or more of applying pressure, applying adhesive or chemically bonding the adhesion layer to the sensitive material. 18. The method as recited in claim 10 , wherein the sensitive material includes an organic transparent conductor. 19. The method as recited in claim 18 , wherein the organic transparent conductor includes a form of poly(3,4-ethylenedioxythiophene) poly(styrenesulfonate).

Assignees

Inventors

Classifications

  • Photovoltaic [PV] devices · CPC title

  • Transparent electrodes, e.g. indium tin oxide [ITO] electrodes · CPC title

  • H10K71/18Primary

    using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet · CPC title

  • Electricity · mapped topic

  • Electricity · mapped topic

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Frequently asked questions

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What does patent US9337436B2 cover?
A method for fabricating a photovoltaic device includes forming an adhesion layer on a substrate, forming a material layer on the adhesion layer and applying release tape to the material layer. The substrate is removed at a weakest interface between the adhesion layer and the substrate by mechanically pulling the release tape to form a transfer substrate including the adhesion layer, the materi…
Who is the assignee on this patent?
Globalfoundries Inc
What technology area does this patent fall under?
Primary CPC classification H10K71/18. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 10 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).