Ion implantation device
US-2015206700-A1 · Jul 23, 2015 · US
Ion implantation device
US9336991B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9336991-B2 |
| Application number | US-201314420377-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 12, 2013 |
| Priority date | Sep 18, 2012 |
| Publication date | May 10, 2016 |
| Grant date | May 10, 2016 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
The disclosed ion implantation apparatus has a vacuum chamber 11 , a roller electrode 13 having a portion of an outer circumferential part on which a film 3 is wound, voltage application unit 23 for applying a voltage to the roller electrode, and a gas introduction unit having a gas supply outlet for supplying an ion implantation gas into the vacuum chamber, wherein the gas introduction unit and a gas discharge outlet are disposed so as to be opposite each other along the axial direction of the roller electrode, the roller electrode intervening therebetween.
First claim
Opening claim text (preview).
The invention claimed is: 1. An ion implantation apparatus comprises: a vacuum chamber, a roller electrode having a portion of an outer circumferential part on which a film is wound, voltage application means for applying a voltage to the roller electrode, a gas introduction unit having a gas supply outlet for supplying an ion implantation gas into the vacuum chamber, and a gas discharge outlet for discharging the gas present in the gas introduction unit and in the vacuum chamber, wherein the gas introduction unit and the gas discharge outlet are disposed so as to be opposite each other along the axial direction of the roller electrode, the roller electrode intervening therebetween, the gas introduction unit is disposed so as to be separated from the roller electrode and be opposite a peripheral portion of an axial end of the roller electrode, and the gas supply outlets provided in the gas introduction unit are disposed so as to be opposite a peripheral portion of an axial end of the roller electrode. 2. The ion implantation apparatus according to claim 1 , wherein the gas introduction unit is provided with a plurality of gas supply outlets. 3. The ion implantation apparatus according to claim 2 , wherein the gas supply outlets are disposed so as to be separated from one another and be opposite a peripheral portion of an axial end of the roller electrode. 4. The ion implantation apparatus according to claim 3 , which has a flow straightening member disposed between the roller electrode and the inner wall of the vacuum chamber, along the direction of gas flow from the gas supply outlets to the gas discharge outlet. 5. The ion implantation apparatus according to claim 2 , which has a flow straightening member disposed between the roller electrode and the inner wall of the vacuum chamber, along the direction of gas flow from the gas supply outlets to the gas discharge outlet. 6. The ion implantation apparatus according to claim 1 , which has a flow straightening member disposed between the roller electrode and the inner wall of the vacuum chamber, along the direction of gas flow from the gas supply outlets to the gas discharge outlet. 7. The ion implantation apparatus according to claim 6 , wherein the flow straightening member is formed of a conductive metal. 8. The ion implantation apparatus according to claim 1 , wherein the gas introduction unit has a circular cross-section similar to the generally circular cross-section of the roller electrode. 9. The ion implantation apparatus according to claim 1 , wherein the gas introduction unit curves along the circumferential direction of the roller electrode.
Assignees
Inventors
Classifications
- C23C14/48Primary
Ion implantation · CPC title
Plasma immersion ion implantation · CPC title
Gas-filled discharge tubes (heating by discharge H05B) · CPC title
of continuous material · CPC title
Ion implantation · CPC title
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Frequently asked questions
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- What does patent US9336991B2 cover?
- The disclosed ion implantation apparatus has a vacuum chamber 11 , a roller electrode 13 having a portion of an outer circumferential part on which a film 3 is wound, voltage application unit 23 for applying a voltage to the roller electrode, and a gas introduction unit having a gas supply outlet for supplying an ion implantation gas into the vacuum chamber, wherein the gas introduction …
- Who is the assignee on this patent?
- Lintec Corp
- What technology area does this patent fall under?
- Primary CPC classification C23C14/48. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 10 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).