X-ray apparatus, method of using the same and X-ray irradiation method

US9336917B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9336917-B2
Application numberUS-201013142787-A
CountryUS
Kind codeB2
Filing dateJun 30, 2010
Priority dateJul 1, 2009
Publication dateMay 10, 2016
Grant dateMay 10, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a monochromator 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing position of the condensed X-ray beam for selecting an X-ray beam having a wavelength in a specific range, allowing it to pass through, and creating a virtual source. With this arrangement, it is possible to create a virtual source having a narrow energy bandwidth at a focal point 110 and by means of the virtual source a high-resolution X-ray diffraction measurement is available. By using the X-ray apparatus 100 , it is possible to sufficiently separate an X-ray beam having such an extremely narrow energy bandwidth as, for example, Kα1 ray from Kα2 ray. In addition, it is also possible to cut out part of continuous X-ray beams to create a virtual source.

First claim

Opening claim text (preview).

The invention claimed is: 1. An X-ray apparatus comprising: a monochromator that takes a divergent X-ray beam and focuses the X-ray beam while monochromating; a selection part installed at a focused position of said monochromated X-ray beam, for selecting a specific wavelength in a narrow range, and creating a virtual source; and one or more reflectors coordinating the selected specific wavelength having passed through said selection part. 2. The X-ray apparatus according to claim 1 , wherein said one or more reflectors coordinate the selected specific wavelength having passed through said selection part and forms parallel beams. 3. The X-ray apparatus according to claim 1 , wherein said one or more reflectors coordinate the selected specific wavelength having passed through said selection part and forms a focused beam. 4. The X-ray apparatus according to claim 1 , wherein: said monochromator is fixed; and said reflectors can be exchanged between one that coordinates an incident specific wavelength into a focused beam and one that coordinates an incident specific wavelength into parallel beams. 5. The X-ray apparatus according to claim 1 , further comprising a switching mechanism enabling switching of paths between a path that coordinates an X-ray beam emitted from said virtual source into a focused beam and a path that coordinates an X-ray beam emitted from said virtual source into parallel beams. 6. The X-ray apparatus according to claim 5 , comprising a reflector that coordinates an X-ray beam having passed through said selection part and forms parallel beams and a reflector that coordinates an X-ray beam having passed through said selection part and forms a focused beam, as said one or more reflectors, wherein said switching mechanism enables switching of paths among a path that forms parallel beams via said reflector, a path that forms a focused beam via said reflector, and a path that forms a focused beam without the intervention of said reflector. 7. The X-ray apparatus according to claim 1 , wherein said reflector is a multilayer mirror. 8. The X-ray apparatus according to claim 1 , further comprising an X-ray source generating a characteristic X-ray beam as said divergent X-ray beam. 9. The X-ray apparatus according to claim 1 , wherein said monochromator is a Johann type monochromator or Johansson type monochromator. 10. The X-ray apparatus according to claim 1 , further comprising a detector detecting an X-ray beam that has been focused by said reflector and has passed through a specimen or has been reflected from the specimen, wherein said detector has elongated unit detection regions arranged in parallel and is capable of discriminating an X-ray beam having energy between an upper limit value and a lower limit value from other beams by converting the X-ray beams received in said unit detection region into electric signals and detecting said electric signals. 11. A method of using an X-ray apparatus, wherein said selection part passes a specific wavelength and prevents other wavelengths from passing in the X-ray apparatus according to claim 7 . 12. An X-ray irradiation method, wherein: a monochromator takes a divergent X-ray beam and focuses the X-ray beam while monochromating; and a specific wavelength in a narrow range is selected at a focused position of said monochromated X-ray beam, and used to create a virtual source; and coordinating the selected specific wavelength by one or more reflectors.

Assignees

Inventors

Classifications

  • Generating the spectrum; Monochromators · CPC title

  • Devices having a multilayer structure · CPC title

  • Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

  • having a curved surface · CPC title

  • G21K1/06Primary

    using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title

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What does patent US9336917B2 cover?
An X-ray apparatus that creates a virtual source having a narrow energy bandwidth and enables a high-resolution X-ray diffraction measurement; a method of using the same; and an X-ray irradiation method are provided. An X-ray apparatus 100 includes a monochromator 105 that focuses a divergent X-ray beam while dispersing it and a selection part 107 that is installed in a condensing positio…
Who is the assignee on this patent?
Ozawa Tetsuya, Matsuo Ryuji, Jiang Licai, and 3 more
What technology area does this patent fall under?
Primary CPC classification G21K1/06. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue May 10 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).