X-ray topography apparatus

Patent metadata

Field	Value
Publication number	US-9335282-B2
Application number	US-201313845744-A
Country	US
Kind code	B2
Filing date	Mar 18, 2013
Priority date	Apr 2, 2012
Publication date	May 10, 2016
Grant date	May 10, 2016

Abstract

Provided is an X-ray topography apparatus capable of separating a desired characteristic X-ray which enters a sample from an X-ray which is radiated from an X-ray source, and increasing an irradiation region of the desired characteristic X-ray. The X-ray topography apparatus includes: the X-ray source for radiating the X-ray from a fine focal point, the X-ray containing a predetermined characteristic X-ray; an optical system including a multilayer mirror with a graded multilayer spacing which corresponds to the predetermined characteristic X-ray, the optical system being configured to cause the X-ray reflected on the multilayer mirror to enter the sample; and an X-ray detector for detecting a diffracted X-ray. The multilayer mirror includes a curved reflective surface having a parabolic cross section, and the fine focal point of the X-ray source is provided onto a focal point of the curved reflective surface.

First claim

What is claimed is:

1. An X-ray topography apparatus, comprising:
an X-ray source for radiating an X-ray from a fine focal point, the X-ray containing a predetermined characteristic X-ray;
an optical system comprising a multilayer mirror with a graded multilayer spacing which corresponds to the predetermined characteristic X-ray, the optical system being configured to cause the X-ray reflected on the multilayer mirror to enter a sample; and
an X-ray detector for detecting a diffracted X-ray, which is generated through the sample,
wherein the multilayer mirror comprises a curved reflective surface having a parabolic cross section, and the fine focal point of the X-ray source is provided onto a focal point of the curved reflective surface, and the optical system is structured to cause the X-ray to be collimated in a first direction and enter the sample by reflection on the multilayer mirror; and
wherein the optical system is structured to cause the X-ray to be diverged in a second direction intersectional to the first direction to enter the sample by reflection on the multilayer mirror.

2. The X-ray topography apparatus according to claim 1 , further comprising a rotational driving system having the X-ray source and the optical system arranged thereon, the rotational driving system being rotationally movable with respect to the sample,
wherein the rotational driving system is configured to move the X-ray source and the optical system through selection of one of a transmission geometry for transmission topography and a reflection geometry for reflection topography, and to further move the X-ray source and the optical system in the selected one of the transmission geometry and the reflection geometry so that the X-ray satisfies a desired diffraction condition with respect to the sample.

3. The X-ray topography apparatus according to claim 1 , wherein the optical system further comprises a single crystal monochromator arranged between the multilayer mirror and the sample, the single crystal monochromator corresponding to a wavelength of the predetermined characteristic X-ray.

4. The X-ray topography apparatus according to claim 1 , wherein the multilayer mirror has a surface accuracy of 10 arcsec or less.

5. The X-ray topography apparatus according to claim 1 ,
wherein the optical system is configured to cause the X-ray entering the sample to be monochromatized to the predetermined characteristic X-ray by reflection on the multilayer mirror.

6. The X-ray topography apparatus according to claim 1 ,
wherein the curved reflective surface of the multilayer mirror maintains a shape of the parabolic cross section in the second direction.

Assignees

• Rigaku Denki Co Ltd

Inventors

• Omote Kazuhiko
• Ueji Yoshinori
• Matsuo Ryuji
• Kikuchi Tetsuo

Classifications

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G21K1/062

  Devices having a multilayer structure · CPC title

• G01N23/207 Primary

  Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions · CPC title