System and method for forming a nozzle inlet of a nozzle
US-2024227050-A9 · Jul 11, 2024 · US
US9333598B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9333598-B2 |
| Application number | US-201013387550-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 29, 2010 |
| Priority date | Jul 30, 2009 |
| Publication date | May 10, 2016 |
| Grant date | May 10, 2016 |
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A method of fabricating a nozzle that includes providing a first material capable of undergoing multiphoton reaction; forming a first microstructured pattern in the first material using a multiphoton process; replicating the first microstructured pattern in a second material to make a first mold comprising a second microstructured pattern in the second material; replicating the second microstructured pattern in a third material to make a second mold comprising a third microstructured pattern comprising microstructures in the third material; replicating the third microstructured pattern in a fourth material to make a replicated structure; planarizing the replicated structure to expose tops of the microstructures in the plurality of microstructures in the third microstructured pattern; and removing the third material resulting in the nozzle having a plurality of holes in the fourth material.
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What is claimed is: 1. A method of fabricating a nozzle comprising the steps of: (a) providing a first material capable of undergoing multiphoton reaction; (b) forming a first microstructured pattern in the first material by selectively reacting the first material using a multiphoton process, where the multiphoton process confines a multiphoton reaction of the first material to separate focal regions of a focused beam of light; (c) replicating the first microstructured pattern in a second material different than the first material to make a first mold comprising a second microstructured pattern of holes in the second material, with each hole only having a hole entry; (d) replicating the second microstructured pattern in a third material different than the second material to make a second mold comprising a third microstructured pattern comprising a plurality of microstructures in the third material; (e) replicating the third microstructured pattern in a fourth material different than the third material to make a replicated structure; (f) planarizing the fourth material of the replicated structure to expose tops of the microstructures in the plurality of microstructures in the third microstructured pattern; and (g) removing the third material resulting in the nozzle having a plurality of through-holes in the fourth material and corresponding to the plurality of microstructures in the third microstructured pattern. 2. The method of claim 1 , wherein the step of forming the first microstructured pattern in the first material comprises exposing at least a portion of the first material to cause a simultaneous absorption of multiple photons. 3. The method of claim 2 , wherein the step of forming the first microstructured pattern in the first material comprises removing the exposed portions of the first material. 4. The method of claim 2 , wherein the step of forming the first microstructured pattern in the first material comprises removing the unexposed portions of the first material. 5. The method of claim 1 , wherein the first microstructured pattern comprises a plurality of discrete microstructures, and the plurality of discrete microstructures comprises a discrete spiraling microstructure. 6. The method of claim 1 , wherein replicating the first microstructured pattern in the second material comprises electroplating the first microstructured pattern. 7. The method of claim 1 , wherein the second microstructured pattern is substantially a negative replica of the first microstructured pattern. 8. The method of claim 1 , wherein the step of replicating the second microstructured pattern in the third material comprises injection molding. 9. The method of claim 1 , wherein the second mold comprises a polymer. 10. The method of claim 1 , wherein the step of replicating the third microstructured pattern comprises electroplating the third microstructured pattern or coating the third microstructured pattern with the fourth material. 11. The method of claim 1 , wherein the step of replicating the third microstructured pattern comprises electroplating the third microstructured pattern with the fourth material.
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