Apparatus for manufacturing polishing pad and method of manufacturing polishing pad using the same

Patent metadata

Field	Value
Publication number	US-9333467-B2
Application number	US-201414301823-A
Country	US
Kind code	B2
Filing date	Jun 11, 2014
Priority date	Jun 12, 2013
Publication date	May 10, 2016
Grant date	May 10, 2016

Abstract

An apparatus for manufacturing a polishing pad includes a housing including a body, an interconnection portion, and a discharging portion, and a stirrer located in the housing, the stirrer mixing a polishing pad composition and a pore forming material with each other. A diameter of the discharging portion is in a range of about 9 mm to about 16 mm.

First claim

What is claimed is:

1. An apparatus for manufacturing a polishing pad, the apparatus comprising:
a housing including a body, an interconnection portion, and a discharging portion; and
a stirrer to mix a polishing pad composition and a pore forming material with each other, the stirrer being located in the housing,
wherein a diameter of the discharging portion is in a range of about 9 mm to about 16 mm.

2. The apparatus as claimed in claim 1 , wherein the discharging portion discharges the polishing pad composition mixed with the pore forming material at a velocity of about 10 kgf/min to about 30 kgf/min through the discharging portion.

3. The apparatus as claimed in claim 1 , wherein the discharging portion includes polyvinyl chloride (PVC).

4. The apparatus as claimed in claim 1 , further comprising:
a drying container facing the discharging portion and spaced apart from the discharging portion.

5. The apparatus as claimed in claim 1 , further comprising:
a heating part that increases a temperature of the polishing pad composition and the pore forming material in the housing.

6. The apparatus as claimed in claim 1 , wherein the polishing pad composition includes at least one selected from the group of a polyethylene resin, a polypropylene resin, a polystyrene resin, a polyvinylchloride resin, a polyamide resin, an acryl resin, a polyurethane resin, a polycarbonate resin, a phenol resin, an amino resin, an epoxy resin, a polyester resin, rubber, acrylonitrile butadiene styrene (ABS), and a styrene acrylonitrile copolymer (SAN).

7. The apparatus as claimed in claim 1 , wherein the pore forming material includes an inert gas, an encapsulating blowing agent, and/or a chemical blowing agent.

8. A method of manufacturing a polishing pad, the method comprising:
providing a polishing pad composition and a pore forming material in a mixing chamber;
mixing the polishing pad composition and the pore forming material by a stirrer of the mixing chamber to form pores in the polishing pad composition;
discharging the polishing pad composition including the pores from the mixing chamber through a discharging portion of the mixing chamber at a velocity of about 10 kgf/min to about 30 kgf/min;
drying the discharged polishing pad composition including the pores to form a polishing pad mold; and
cutting the polishing pad mold to form polishing pads.

9. The method as claimed in claim 8 , wherein a diameter of the discharging portion is in the range of about 9 mm to about 16 mm.

10. The method as claimed in claim 8 , wherein the mixing chamber is heated at a temperature of about 70° C. to about 85° C.

11. The method as claimed in claim 8 , wherein a portion of the pore forming material remains in the polishing pad composition discharged through the discharging portion such that the remaining pore forming material additionally generates pores in the discharged polishing pad composition.

12. An apparatus for manufacturing a polishing pad, the apparatus comprising:
a housing including a body, an interconnection portion, and a discharging portion; and
a drying container spaced apart from and facing the discharging portion,
the discharging portion of the housing being configured to discharge a mixture of a polishing pad composition and a pore forming material from the housing to the drying container at a velocity of about 10 kgf/min to about 30 kgf/min.

13. The apparatus as claimed in claim 12 , wherein a diameter of the discharging portion is in a range of about 9 mm to about 16 mm.

14. The apparatus as claimed in claim 12 , wherein the housing includes a stirrer located in the housing, the stirrer mixing the polishing pad composition and the pore forming material with each other in the housing to form the mixture of the polishing pad composition and the pore forming material.

15. The apparatus as claimed in claim 14 , further including a heater that heats the mixture of the polishing pad composition and the pore forming material in the housing.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Jang Youngjun
• Ahn Bong-Su
• Jeong Jin-Su
• Choi Jungsik

Classifications

• B24B37/24

  characterised by the composition or properties of the pad materials · CPC title

• B01F7/00491 Primary

  Operations & Transport · mapped topic

• B01F2015/062

  Operations & Transport · mapped topic

• B24D18/00

  Manufacture of grinding tools {or other grinding devices}, e.g. wheels, not otherwise provided for · CPC title

• B01F15/065

  Operations & Transport · mapped topic