Apparatus and method for electron irradiation scrubbing
US-2024316494-A1 · Sep 26, 2024 · US
Plasma treatment device
US9333460B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9333460-B2 |
| Application number | US-8436006-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 21, 2006 |
| Priority date | Oct 28, 2005 |
| Publication date | May 10, 2016 |
| Grant date | May 10, 2016 |
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- Title
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Abstract
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A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapor.
First claim
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I claim: 1. A microwave plasma abatement device comprising a microwave resonant cavity having a gas inlet and a gas outlet, and a waveguide for conveying microwave radiation to the resonant cavity, the resonant cavity having an inner surface comprising an electrically conductive material resistant to corrosion induced by chemical reaction between a gas containing a halocompound and water vapour, wherein said electrically conductive material comprises titanium. 2. A device according to claim 1 wherein the inner surface of the cavity comprises a layer of said electrically conductive material formed on the inner surface of a housing defining, at least in part, the cavity. 3. A device according to claim 2 wherein the housing is formed from stainless steel. 4. A device according to claim 1 wherein the cavity is defined at least in part by a housing formed from said electrically conductive material. 5. A device according to claim 1 wherein said electrically conductive material is paramagnetic. 6. A device according to claim 1 wherein said electrically conductive material is diamagnetic. 7. A device according to claim 1 comprising an electrically conducting member protruding into the resonant cavity, the electrically conducting member comprising said electrically conductive material.
Assignees
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Classifications
using glow discharges · CPC title
Employing electrical discharges or the generation of a plasma · CPC title
Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title
Organic halogen compounds · CPC title
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9333460B2 cover?
- A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapor.
- Who is the assignee on this patent?
- Radoiu Marilena, Edwards Ltd
- What technology area does this patent fall under?
- Primary CPC classification B01D53/32. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue May 10 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).