Photovoltaic device

US9331226B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9331226-B2
Application numberUS-201314134743-A
CountryUS
Kind codeB2
Filing dateDec 19, 2013
Priority dateJun 30, 2011
Publication dateMay 3, 2016
Grant dateMay 3, 2016

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

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A photovoltaic device is provided having a semiconductor substrate, an i-type amorphous layer formed over a front surface of the semiconductor substrate, a p-type amorphous layer formed over the i-type amorphous layer, an i-type amorphous layer formed over a back surface of the semiconductor substrate, and an n-type amorphous layer formed over the i-type amorphous layer. The i-type amorphous layer and the i-type amorphous layer have oxygen concentration profiles in which concentrations are reduced in a step-shape from regions near interfaces with the semiconductor substrate and along a thickness direction, and an oxygen concentration in the step-shape portion of the i-type amorphous layer is higher than an oxygen concentration in the step-shape portion of the i-type amorphous layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A photovoltaic device comprising: a crystalline semiconductor substrate of a first conductive type; a first amorphous semiconductor layer which is intrinsic and formed over a first surface of the semiconductor substrate; a second amorphous semiconductor layer of a second conductive type opposite to the first conductive type and formed over the first amorphous semiconductor layer; a third amorphous semiconductor layer which is intrinsic and formed over a second surface, opposite to the first surface, of the semiconductor substrate; and a fourth amorphous semiconductor layer of the first conductive type and formed over the third amorphous semiconductor layer, wherein an oxygen concentration in a high-oxygen-concentration region within 5 nm near the interface between the crystalline semiconductor substrate and each of the first amorphous semiconductor layer and the third amorphous semiconductor layer is greater than or equal to 1×10 20 /cm 3 and less than or equal to 1×10 21 /cm 3 , wherein a profile of the oxygen concentration in each of the high-oxygen concentration regions is reduced in a step shape near an interface with the semiconductor substrate along a thickness direction, and a slope of each of the profiles has at least two peaks, and the oxygen concentration in the high-oxygen concentration region of the first amorphous semiconductor layer is higher than an oxygen concentration in the high-oxygen concentration region of the third amorphous semiconductor layer, and wherein an oxygen concentration in regions in the first amorphous semiconductor layer other than the high-oxygen-concentration region is less than 1×10 20 /cm 3 . 2. The photovoltaic device according to claim 1 , wherein an oxygen concentration in a high-oxygen-concentration region which is a region within 5nm near the interface between the semiconductor substrate and the first amorphous semiconductor layer is greater than or equal to 2×10 20 /cm 3 and less than or equal to 1×10 21 /cm 3 . 3. The photovoltaic device according to claim 1 , wherein an oxygen concentration in a high-oxygen-concentration region which is a region within 5 nm near the interface between the semiconductor substrate and the third amorphous semiconductor layer is greater than or equal to 1×10 20 /cm 3 and less than or equal to 9×10 20 /cm 3 . 4. The photovoltaic device according to claim 2 , wherein an oxygen concentration in a high-oxygen-concentration region which is a region within 5 nm near an interface between the semiconductor substrate and the third amorphous semiconductor layer is greater than or equal to 1×10 20 /cm 3 and less than or equal to 9×10 20 /cm 3 .

Assignees

Inventors

Classifications

  • Amorphous silicon PV cells · CPC title

  • including only Group IV materials · CPC title

  • H10F10/166Primary

    the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells · CPC title

  • H10F10/142Primary

    comprising multiple PN homojunctions, e.g. tandem cells · CPC title

  • Electricity · mapped topic

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What does patent US9331226B2 cover?
A photovoltaic device is provided having a semiconductor substrate, an i-type amorphous layer formed over a front surface of the semiconductor substrate, a p-type amorphous layer formed over the i-type amorphous layer, an i-type amorphous layer formed over a back surface of the semiconductor substrate, and an n-type amorphous layer formed over the i-type amorphous layer. The i-type amorphous la…
Who is the assignee on this patent?
Panasonic Ip Man Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10F77/1662. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 03 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).