Logic function generation from single microplasma transistor devices and arrays of devices
US-2015294831-A1 · Oct 15, 2015 · US
US9330877B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9330877-B2 |
| Application number | US-201514727156-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 1, 2015 |
| Priority date | Jul 19, 2010 |
| Publication date | May 3, 2016 |
| Grant date | May 3, 2016 |
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Logic devices are provided in multiple sub-collector and sub-emitter microplasma devices formed in thin and flexible, or inflexible, semiconductor materials. Logic operations are provided with one of a plurality of microplasmas forming sub-collectors with a common emitter, or a common collector plasma with a plurality of sub-emitter regions in a solid state semi-conductor pn-junction, and generating a logic output from an electrode, based upon electrode inputs to two other electrodes.
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The invention claimed is: 1. A method for providing a logic function with a single microplasma transistor device, the method comprising: generating a microplasma within a microcavity in proximity to a solid state semiconductor pn junction; and with one of a plurality of microplasmas forming sub-collectors with a common emitter, or a common collector plasma with a plurality of sub-emitter regions in the solid state semi-conductor pn-junction, generating a logic output from an electrode based upon electrode inputs to two other electrodes. 2. The method of claim 1 , wherein the microplasma transistor device comprises a plurality of sub-collector microcavities that share a common base and emitter solid state regions, and said generating comprises applying input to base and emitter electrodes and the logic output is generated at a collector electrode. 3. The method of claim 1 , wherein the plurality of sub-collector microcavities contain a plurality of plasma media. 4. The method of claim 1 , further comprising generating a display while generating the logic output. 5. The method of claim 1 , further comprising generating a plurality of wavelengths from a plurality of microplasmas. 6. The method of claim 5 , wherein said plurality of wavelengths comprises a plurality of visible wavelengths. 7. The method of claim 1 , wherein the single microplasma transistor device comprises a plurality of solid state sub-emitter regions that share a common base region and a common collector microcavity. 8. The method of claim 7 , comprising three sub-emitter regions that share the common base region and the common collector microcavity, wherein two of the three sub-emitters regions have an annular shape and, together encompass a third sub-emitter region having a circular cross-section. 9. The method of claim 8 , wherein said generating comprises biasing the third emitter-base junction slightly below turn-on, and forward biasing the first and second emitter-base junctions to provide an AND logic function. 10. The method of claim 7 , wherein said generating comprises driving a plurality of sub-emitter and base junctions with voltage waveforms of differing frequencies to modulate the current of other sub-emitter and base junctions and provide sum and difference frequencies in collector current. 11. The method of claim 7 , wherein said generating comprises first biasing a sub-emitter to turn it on to reduce threshold for igniting plasma in the vicinity of another sub-emitter. 12. The method of claim 1 , wherein the single microplasma transistor device is in an array of microplasma transistor devices and additional logic functions are performed by devices in the array of microplasma transistor devices. 13. The method of claim 1 , wherein the single microplasma transistor device comprises: a thin and flexible semiconductor base layer; a plurality of sub-emitter regions diffused into said thin and flexible base layer forming a plurality of pn-junctions; an insulator layer upon one side of said thin and flexible semiconductor base layer and said emitter region; base and sub-emitter electrodes isolated from each other by said insulator layer and electrically contacting said thin and flexible semiconductor base layer and said sub-emitter regions through said insulator layer; a thin and flexible collector layer upon an opposite side of said thin and flexible semiconductor base layer; a microcavity formed in said thin and flexible collector layer aligned with said plurality of emitter regions; and collector electrodes arranged to sustain a microplasma within said microcavity. 14. The method of claim 1 , wherein the single microplasma transistor device comprises: a thin and flexible semiconductor base layer; an emitter region diffused into said thin and flexible base layer forming a pn-junction; an insulator layer upon one side of said thin and flexible semiconductor base layer and said emitter region; base and emitter electrodes isolated from each other by said insulator layer and electrically contacting said thin and flexible semiconductor base layer and said emitter region through said insulator layer; a thin and flexible collector layer attached to another said of said thin and flexible semiconductor base layer; a plurality of microcavities formed in said thin and flexible collector layer aligned with said emitter region; and collector electrodes arranged to sustain separate microplasmas within said plurality of microcavities. 15. A method for providing a logic function with a single microplasma transistor device, the method comprising: generating one or a plurality of microplasmas within one or a plurality of a microcavities in proximity to one or a plurality of solid state semiconductor pn junctions; and applying voltage waveforms to affect selected ones of the one or a plurality of microplasmas or the one or plurality of semiconductor pn junctions to influence electrical characteristics of other ones of the plurality of microplasmas or the plurality of semiconductor pn junctions to thereby provide the logic function. 16. The method of claim 15 , wherein said applying reduces threshold voltage of one of the other ones of the plurality of pn junctions. 17. The method of claim 15 , wherein said applying comprises biasing one of the other ones of the plurality of pn junctions by turning on the one or plurality of semiconductor pn junctions.
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