Method and device for active wedge error compensation between two objects that can be positioned substantially to parallel to each other

Patent metadata

Field	Value
Publication number	US-9329473-B2
Application number	US-201113261204-A
Country	US
Kind code	B2
Filing date	Feb 14, 2011
Priority date	Feb 15, 2010
Publication date	May 3, 2016
Grant date	May 3, 2016

Abstract

The invention relates to a method and device for expanding the travel or control displacement of linear actuators that is available during an imprinting or embossing stroke. The wedge error compensating head ( 2 ) comprises a movable part ( 4 ), a stationary part ( 3 ) and at least three linear actuators ( 8 ). Each linear actuator ( 8 ) is connected to one of the parts ( 3, 4 ) at one end and to the other of the two parts ( 4, 3 ) by wedges ( 9 ) at the other end. By means of the wedges ( 9 ), it is possible to coarsely or roughly compensate for wedge errors and possible tolerances of individual subcomponents of the system. The linear actuators ( 8 ) are only used for fine or precision compensation for the wedge error. In this way, sufficient control displacement is available for the imprinting stroke with the linear actuators.

First claim

The invention claimed is:

1. A device for a controlled relative displacement between a mask or a punch and a substrate in a Z-direction perpendicular to the surface of the substrate with a wedge error compensating head, in particular for imprinting or embossing the substrate and for carrying out an active wedge error compensation, said wedge error compensating head comprising:
(a) a stationary part and a movable part being movable relative to the stationary part in the Z-direction;
(b) operating means for moving the stationary part and the moveable part towards each other and apart from each other in the Z-direction;
(c) at least three linear actuators between the stationary part and the movable part acting in the Z-direction; and
(d) displaceable wedges provided between the linear actuators and the moveable part or the stationary part, and
(e) means for controlling the linear actuators, (e 1 ) for actively compensating the wedge error, and(e 2 ) for the controlled relative displacement between the mask or the punch and the substrate.

2. The device according to claim 1 , wherein the wedges are integrated in the moveable part or in the stationary part of the wedge error compensating head.

3. The device according to claim 1 , wherein the moveable part can be connected with the mask or the substrate.

4. The device according to claim 1 , wherein each linear actuator comprises a piezo element.

5. The device according to claim 4 , comprising a pneumatic or hydraulic means for moving wedges.

6. The device according to claim 4 , comprising a controller for individually controlling or regulating the movement of the individual wedges.

7. The device according to claim 4 , comprising at least three measuring probes or at least three sensors for measuring the position of the moveable part of the wedge compensating head.

8. The device according to claim 4 , comprising a plurality of brakes for locking the position of the moveable part of the wedge compensating head.

9. A device for controlled relative displacement between a mask or a punch and a substrate in a direction perpendicular to the surface of the substrate, having:
a stationary part,
a movable part having a surface for receiving one of a substrate, a mask and a punch, said movable part being movable with respect to said stationary part in a direction perpendicular with respect to said receiving surface,
operating means arranged operatively between said stationary part and said moveable part and adapted for moving said movable part towards said stationary part,
linear actuators arranged operatively between said stationary part and said moveable part and adapted for controlling the relative displacement between the substrate and said mask or punch,
displaceable wedges provided between said linear actuators and said movable part or said stationary part.

10. The device of claim 9 , further comprising a plurality of brakes for temporarily locking a position of said moveable part with respect to said stationary part.

11. The device of claim 9 , further comprising a lifting means for lifting the combination of said stationary part and said moveable part in a direction which is perpendicular with respect to said receiving surface.

12. A device for controlled relative displacement between a mask or a punch and a substrate in a direction perpendicular to the surface of the substrate, having:
a stationary part,
a movable part having a surface for receiving one of a substrate, a mask and a punch, said movable part being movable with respect to said stationary part in a direction perpendicular with respect to said receiving surface,
a plurality of linear actuators comprising piezo elements, said linear actuators being arranged operatively between said stationary part and said moveable part and adapted for controlling the relative displacement between the substrate and said mask or punch,
displaceable wedges provided between said linear actuators and said movable part or said stationary part,
a plurality of brakes configured to temporarily lock a position of said moveable part with respect to said stationary part.

13. The device of claim 12 , further comprising operating means arranged operatively between said stationary part and said moveable part and adapted for moving said movable part towards said stationary part.

14. The device of claim 13 , further comprising a lifting means for lifting the combination of said stationary part and said moveable part in a direction which is perpendicular with respect to said receiving surface.

Assignees

• Hansen Sven
• Conradi Matthias
• Fink Georg
• Suss Microtec Lithography Gmbh

Inventors

• Hansen Sven
• Conradi Matthias
• Fink Georg

Classifications

• B29C43/58

  Measuring, controlling or regulating {(for bank adjustment in calendering B29C43/245)} · CPC title

• G03F7/0002 Primary

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• B29C2043/025

  forming a microstructure, i.e. fine patterning · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title