Selective etch for silicon films

Patent metadata

Field	Value
Publication number	US-9324576-B2
Application number	US-201113088930-A
Country	US
Kind code	B2
Filing date	Apr 18, 2011
Priority date	May 27, 2010
Publication date	Apr 26, 2016
Grant date	Apr 26, 2016

Abstract

A method of etching patterned heterogeneous silicon-containing structures is described and includes a remote plasma etch with inverted selectivity compared to existing remote plasma etches. The methods may be used to conformally trim polysilicon while removing little or no silicon oxide. More generally, silicon-containing films containing less oxygen are removed more rapidly than silicon-containing films which contain more oxygen. Other exemplary applications include trimming silicon carbon nitride films while essentially retaining silicon oxycarbide. Applications such as these are enabled by the methods presented herein and enable new process flows. These process flows are expected to become desirable for a variety of finer linewidth structures. Methods contained herein may also be used to etch silicon-containing films faster than nitrogen-and-silicon containing films having a greater concentration of nitrogen.

First claim

What is claimed is:

1. A method of etching a patterned substrate in a substrate processing region of a substrate processing chamber, wherein the patterned substrate has an exposed oxygen-and-silicon-containing region and an exposed silicon-containing region which contains less oxygen than the oxygen-and-silicon-containing region, the method comprising:
flowing a fluorine-containing precursor into a remote plasma region fluidly coupled to the substrate processing region while forming a plasma in the remote plasma region to produce plasma effluents;
neutralizing charged species generated in the remote plasma prior to flowing plasma effluents into the substrate processing region such that the plasma effluents comprise less than 10 percent charged species;
etching the exposed silicon-containing region faster than the exposed oxygen-and-silicon-containing region by flowing the plasma effluents into the substrate processing region wherein the etching is performed while maintaining a partial pressure of the fluorine-containing precursor below about 100 mTorr; and
wherein the exposed silicon-containing region consists essentially of silicon and the etching is generally uniform.

2. The method of claim 1 wherein an etch rate of the exposed silicon-containing region is greater than an etch rate of the exposed oxygen-and-silicon-containing region by a multiplicative factor greater than 5.

3. The method of claim 1 wherein the exposed silicon-containing region is essentially devoid of oxygen.

4. The method of claim 1 wherein the exposed oxygen-and-silicon-containing region consists essentially of SiO 2 .

5. The method of claim 1 wherein the exposed silicon-containing region is polysilicon, the exposed oxygen-and-silicon-containing region is SiO 2 and the polysilicon is trimmed by between 1 nm and 15 nm.

6. The method of claim 1 wherein the exposed oxygen-and-silicon-containing region consists essentially of silicon, carbon and oxygen.

7. The method of claim 1 wherein the fluorine-containing precursor comprises at least one precursor selected from the group consisting of nitrogen trifluoride, diatomic fluorine, monatomic fluorine and fluorine-substituted hydrocarbons.

8. The method of claim 1 wherein the plasma effluents possess an atomic ratio of fluorine-to-hydrogen which is greater than 5:1.

9. The method of claim 1 wherein essentially no ionized species are present in the plasma effluents within the substrate processing region to increase the etch selectivity of the silicon-containing region.

10. A method of etching a patterned substrate in a substrate processing region of a substrate processing chamber, wherein the patterned substrate has an exposed nitrogen-and-silicon-containing region and an exposed silicon-containing region which contains less nitrogen than the nitrogen-and-silicon-containing region, the method comprising:
flowing a fluorine-containing precursor into a remote plasma region fluidly coupled to but physically separated from the substrate processing region while forming a plasma in the first plasma region to produce plasma effluents;
neutralizing charged species generated in the remote plasma prior to flowing plasma effluents into the substrate processing region by flowing the plasma effluents through an ion suppressor plate positioned within the substrate processing chamber, wherein the plasma effluents exiting the ion suppressor plate comprise less than 10 percent charged species;
etching the exposed silicon-containing region faster than the exposed nitrogen-and-silicon-containing region by flowing the plasma effluents into the substrate processing region; and
wherein the exposed silicon-containing region consists essentially of silicon and the etching is generally uniform.

11. The method of claim 10 wherein an etch rate of the exposed silicon-containing region is greater than an etch rate of the exposed nitrogen-and-silicon-containing region by a multiplicative factor greater than 1.5.

12. The method of claim 10 wherein the exposed silicon-containing region is essentially devoid of nitrogen.

13. The method of claim 10 wherein the exposed nitrogen-and-silicon-containing region consists essentially of silicon nitride.

14. The method of claim 10 wherein the fluorine-containing precursor comprises at least one precursor selected from the group consisting of nitrogen trifluoride, diatomic fluorine, monatomic fluorine and fluorine-substituted hydrocarbons.

15. The method of claim 10 wherein the fluorine-containing precursor and the plasma effluents are essentially devoid of hydrogen.

16. The method of claim 10 wherein the plasma effluents possess an atomic ratio of fluorine-to-hydrogen which is greater than 5:1.

Assignees

• Zhang Jingchun
• Wang Anchuan
• Ingle Nitin K
• Applied Materials Inc

Inventors

• Zhang Jingchun
• Wang Anchuan
• Ingle Nitin K

Classifications

• H10P50/283

  by chemical means · CPC title

• H10P50/267

  using plasmas · CPC title

• H10P50/242 Primary

  of Group IV materials · CPC title

• H10P50/28

  of insulating materials · CPC title

• H10P50/268 Primary

  of silicon-containing layers · CPC title