Film-forming apparatus

Patent metadata

Field	Value
Publication number	US-9322094-B2
Application number	US-201314069897-A
Country	US
Kind code	B2
Filing date	Nov 1, 2013
Priority date	Jun 30, 2011
Publication date	Apr 26, 2016
Grant date	Apr 26, 2016

Abstract

The present invention provides a film forming apparatus configured such that the occurrence of contamination is reduced between targets. The film forming apparatus includes: a plurality of target electrodes respectively having attachment surfaces to which targets can be attached; a substrate holder for holding a substrate at a position opposing the plurality of target electrodes; a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings that can oppose the attachment surfaces; and a shield member disposed adjacent to the first shutter member and having a number of openings equal to the number of the target electrodes, wherein a gap between the first shutter member and the shield member widens toward an outer perimeter from a portion where adjacent target electrodes are closest.

First claim

What is claimed is:

1. A film forming apparatus comprising:
a plurality of target electrodes respectively having attachment surfaces to which targets can be attached;
a substrate holder for holding a substrate at a position opposing the plurality of target electrodes;
a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings that can oppose the attachment surfaces;
a shield member provided between the first shutter member and the plurality of target electrodes and having a number of openings equal to the number of the target electrodes;
first separating walls provided on an upper surface of the first shutter member; and
second separating walls provided on a lower surface of the shield member, which faces the upper surface of the first shutter member,
wherein the first shutter member is rotated about a rotation shaft to change the target to be used for film forming, such that the first separating walls are positioned close to respective ones of the second separating walls and first gaps in a circumferential direction of the rotation are formed between the first separating walls and the respective ones of the second separating walls, the first gaps being effective to prevent atoms from the targets passing through the first gaps, the first separating walls and the second separating walls extending radially about the rotation shaft, and
wherein a second gap between the upper surface of the first shutter member and the lower surface of the shield member widens toward an outer perimeter of the first shutter member from a portion where adjacent target electrodes are closest, and the second gap narrows toward a center of the first shutter member from the portion where the adjacent target electrodes are closest.

2. The film forming apparatus according to claim 1 , wherein the shield member is disposed between the target electrodes and the first shutter member.

3. The film forming apparatus according to claim 2 , wherein in the portion where adjacent target electrodes are closest, the shield member has a radius of curvature greater than that of the first shutter member.

4. The film forming apparatus according to claim 2 , further comprising a second shutter member rotatably provided between the first shutter member and the substrate holder and having a number of openings greater than or equal to the number of the openings of the first shutter member,
wherein the openings of the second shutter member can be positioned so as to oppose the openings of the first shutter member.

5. The film forming apparatus according to claim 1 ,
wherein a sum of a height of the first separating walls at a position and a height of the second separating walls at the position is larger than the first gap between the first shutter member and the shield member at the position, and
wherein the first separating walls are provided so as to sandwich the opening of the first shutter member.

6. The film forming apparatus according to claim 5 , wherein two of the target electrodes are used in simultaneous film formation processing, and
during the simultaneous film formation processing, the openings of the first shutter member simultaneously oppose the attachment surfaces of the target electrodes used in the simultaneous film formation processing.

7. The film forming apparatus according to claim 1 , wherein two openings are formed in the first shutter member, and the two openings are formed in symmetric positions about the rotation shaft.

8. The film forming apparatus according to claim 5 , wherein the openings formed in the first shutter member have a dimension that is longer in a circumferential direction than in a radial direction of the first shutter member.

9. A film forming apparatus comprising:
a plurality of target electrodes respectively having attachment surfaces to which targets can be attached;
a substrate holder for holding a substrate at a position opposing the plurality of target electrodes;
a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings that can oppose the attachment surfaces;
a shield member provided between the first shutter member and the plurality of target electrodes and having a number of openings equal to the number of the target electrodes;
first separating walls provided on an upper surface of the first shutter member; and
second separating walls provided on a lower surface of the shield member, which faces the upper surface of the first shutter member,
wherein the first shutter member is rotated about a rotation shaft to change the target to be used for film forming, such that the first separating walls are positioned close to respective ones of the second separating walls and first gaps in a circumferential direction of the rotation are formed between the first separating walls and the respective ones of the second separating walls, the first gaps being effective to prevent atoms from the targets passing through the first gaps, the first separating walls and the second separating walls extending radially about the rotation shaft, and
wherein a second gap between the upper surface of the first shutter member and the lower surface of the shield member widens toward an outer perimeter of the first shutter member from a portion where adjacent target electrodes are closest, and the second gap widens toward a center of the first shutter member from the portion where the adjacent target electrodes are closest.

10. A film forming apparatus comprising:
a plurality of target electrodes respectively having attachment surfaces to which targets can be attached;
a substrate holder for holding a substrate at a position opposing the plurality of target electrodes;
a first shutter member rotatably provided between the plurality of target electrodes and the substrate holder and having a plurality of openings that can oppose the attachment surfaces;
a shield member provided between the first shutter member and the plurality of target electrodes and having a number of openings equal to the number of the target electrodes, a lower surface of the shield member, around each of the plurality of openings and facing the first shutter member, having a continuously curved shape,
first separating walls provided on an upper surface of the first shutter member; and
second separating walls provided on the lower surface of the shield member, which faces the upper surface of the first shutter member,
wherein the first shutter member is rotated about a rotation shaft to change the target to be used for film forming, such that the first separating walls are positioned close to respective ones of the second separating walls and first gaps in a circumferential direction of the rotation are formed between the first separating walls and the respective ones of the second separating walls, the first gaps being effective to prevent atoms from the targets passing through the first gaps, the first separating walls and the second separating walls extending radially about the rotation shaft, and
wherein a second gap between the upper surface of the first shutter member and the lower surface of the shield member widens toward an outer perimeter of the first shutter member from a portion where the adjacent target electrodes are closest, and the second gap narrows toward a center of the first shutter member from the portion where adjacent target electrodes are closest.

11. The film forming apparatus according to claim 1 , wherein the shield member constitutes a part of a spherical surface.

12. The film forming apparatus according to

Assignees

• Canon Anelva Corp

Inventors

• Kajihara Yuji
• Yasumatsu Yasushi
• Konaga Kazuya

Classifications

• C23C14/54

  Controlling or regulating the coating process · CPC title

• C23C14/3464 Primary

  using more than one target (C23C14/56 takes precedence) · CPC title

• H01J37/3447

  Collimators, shutters, apertures · CPC title

• H01J37/3435

  Target holders (includes backing plates and endblocks) · CPC title

• C23C14/564

  Means for minimising impurities in the coating chamber such as dust, moisture, residual gases · CPC title