Process for producing 3-dimensional structure assembled from nanoparticles

Patent metadata

Field	Value
Publication number	US-9321633-B2
Application number	US-201314233011-A
Country	US
Kind code	B2
Filing date	Mar 4, 2013
Priority date	Jul 13, 2012
Publication date	Apr 26, 2016
Grant date	Apr 26, 2016

Abstract

The present invention relates to a process for producing a 3-dimensional structure assembled from nanoparticles by using a mask having a pattern of perforations, which comprises the steps of: in a grounded reactor, placing a mask having a pattern of perforations corresponding to a determined pattern at a certain distance above a substrate to be patterned, and then applying voltage to the substrate to form an electrodynamic focusing lens; and introducing charged nanoparticles into the reactor, the charged particles being guided to the substrate through the pattern of perforations so as to be selectively attached to the substrate with 3-dimensional shape. According to the process of the present invention, a 3-dimensional structure of various shapes can be produced without producing noise pattern, with high accuracy and high efficiency.

First claim

What is claimed is:

1. A process for producing a structure assembled from nanoparticles comprising the steps of:
(i) in a grounded reactor, placing a mask having a pattern of perforations with a width (w) corresponding to a predetermined pattern at a certain distance (d) above a substrate to be patterned, with the mask being nonconductive and having an electrode or ion layer on one or both sides, and then applying voltage to the substrate or the mask to form an electrodynamic focusing lens; and
(ii) introducing charged nanoparticles into the reactor, with the charged particles guided to the substrate through the pattern of perforations so as to be focused and attached to the substrate wherein the shape of 3-dimensional structures is changed by changing focusing level of the charged particles through controlling the charge or voltage by using a voltage and current supplying device, a battery or a storage battery.

2. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein the mask has an ion layer and the process further comprising a step of accumulating the ion layer by introducing charged gas ions, which are charged with the same polarity as that of charged nanoparticles, onto the mask surface.

3. The process for producing a structure assembled from nanoparticles according to claim 2 , wherein, in the step of accumulating the ion layer, a voltage in a range of 0.01˜10 kV, having opposite polarity to the charged particles is applied to the substrate.

4. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein, in the step of depositing the nanoparticles of the step (ii), a voltage, in a range of 0.01˜10 kV, having opposite polarity to the charged particles is applied to the substrate.

5. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein the ratio of the width (w) of the perforations in the mask and the distance (d) between the substrate and the mask is in the range of 1:0.01˜10.

6. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein the step (ii) comprises a first deposition at a first voltage and a second deposition at a second voltage, the first voltage and the second voltage being in the range of 0.01˜10 kV having the opposite polarity to the charged particles, and the voltage intensities being different from each other.

7. The process for producing a structure assembled from nanoparticles according to claim 1 , wherein, in the step of guiding the charged nanoparticles to the substrate through the pattern of perforations, the 3-dimensional structure formed by focused attachment of the charged nanoparticles is produced by focusing the charged nanoparticles while moving the mask or the substrate in a direction parallel or perpendicular to each other.

Assignees

• Snu R&Db Foundation
• Global Frontier Ct For Multiscale Energy Systems

Inventors

• Choi Hoseop
• Choi Man Soo

Classifications

• B81C2201/0187

  Controlled formation of micro- or nanostructures using a template positioned on a substrate · CPC title

• Y10T428/24893

  including particulate material · CPC title

• B81C1/00373 Primary

  Selective deposition, e.g. printing or microcontact printing · CPC title

• B81C1/00031 Primary

  Regular or irregular arrays of nanoscale structures, e.g. etch mask layer (photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002) · CPC title

• H10P76/2041

  Photolithographic processes · CPC title