Magnetic memory devices having a uniform perpendicular nonmagnetic rich antisotropy enhanced pattern

US9318695B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9318695-B2
Application numberUS-201514614724-A
CountryUS
Kind codeB2
Filing dateFeb 5, 2015
Priority dateJul 26, 2010
Publication dateApr 19, 2016
Grant dateApr 19, 2016

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Abstract

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Provided are magnetic memory devices, electronic systems and memory cards including the same, methods of manufacturing the same, and methods of controlling a magnetization direction of a magnetic pattern. In a magnetic memory device, atomic-magnetic moments non-parallel to one surface of a free pattern increase in the free pattern. Therefore, critical current density of the magnetic memory device may be reduced, such that power consumption of the magnetic memory device is reduced or minimized and/or the magnetic memory device is improved or optimized for a higher degree of integration.

First claim

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What is claimed is: 1. A magnetic memory device comprising: a reference pattern on a substrate; a free pattern on the substrate; a tunnel barrier pattern between the free pattern and the reference pattern; and particles within the free pattern and comprising a nonmagnetic conductive material. 2. The magnetic memory device of claim 1 , wherein the free pattern comprises a first surface and a second surface opposite to each other; the first surface of the free pattern is adjacent to the tunnel barrier pattern; and the particles are spaced from the first and second surfaces. 3. The magnetic memory device of claim 1 , wherein the free pattern comprises a first surface adjacent to the tunnel barrier pattern and a second surface opposite to the first surface; and the reference pattern and the tunnel barrier pattern correspond to a first reference pattern and a first tunnel barrier pattern, respectively, and further comprising: a second reference pattern on the second surface of the free pattern; and a second tunnel barrier pattern between the second surface of the free pattern and the second reference pattern. 4. The magnetic memory device of claim 1 , wherein the reference pattern comprises a first magnetic material; the free pattern comprises a second magnetic material; each of the first and second magnetic materials comprises iron (Fe); and a content ratio of iron (Fe) in the second magnetic material is equal to or greater than a content ratio of iron (Fe) in the first magnetic material.

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What does patent US9318695B2 cover?
Provided are magnetic memory devices, electronic systems and memory cards including the same, methods of manufacturing the same, and methods of controlling a magnetization direction of a magnetic pattern. In a magnetic memory device, atomic-magnetic moments non-parallel to one surface of a free pattern increase in the free pattern. Therefore, critical current density of the magnetic memory devi…
Who is the assignee on this patent?
Oh Sechung, Lee Jangeun, Kim Woojin, and 2 more
What technology area does this patent fall under?
Primary CPC classification H01L43/02. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 19 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).