Nitride semiconductor light-emitting element

Patent metadata

Field	Value
Publication number	US-9318645-B2
Application number	US-201314394059-A
Country	US
Kind code	B2
Filing date	Oct 16, 2013
Priority date	Oct 19, 2012
Publication date	Apr 19, 2016
Grant date	Apr 19, 2016

Abstract

A nitride semiconductor light-emitting element includes a second light-emitting layer, a third barrier layer, and a first light-emitting layer from a side close to a p-type nitride semiconductor layer. The first light-emitting layer includes a plurality of first quantum well layers and a first barrier layer provided between the plurality of first quantum well layers. The second light-emitting layer includes a plurality of second quantum well layers and a second barrier layer provided between the plurality of second quantum well layers. The second quantum well layers include a multiple quantum well light-emitting layer thicker than the first quantum well layers.

First claim

The invention claimed is:

1. A nitride semiconductor light-emitting element, comprising:
an n-type nitride semiconductor layer;
a p-type nitride semiconductor layer; and
a multiple quantum well light-emitting layer provided between said n-type nitride semiconductor layer and said p-type nitride semiconductor layer,
said multiple quantum well light-emitting layer including a second light-emitting layer, a third barrier layer, and a first light-emitting layer from a side close to said p-type nitride semiconductor layer,
said first light-emitting layer including a plurality of first quantum well layers and a first barrier layer provided between said plurality of first quantum well layers,
said second light-emitting layer including a plurality of second quantum well layers and a second barrier layer provided between said plurality of second quantum well layers,
said second quantum well layers being thicker than said first quantum well layers,
said second barrier layer being thinner than said first barrier layer, and
said second barrier layer being thinner than said third barrier layer.

2. The nitride semiconductor light-emitting element according to claim 1 , wherein said second quantum well layers have a larger band gap energy than said first quantum well layers.

3. The nitride semiconductor light-emitting element according to claim 2 , wherein a band gap energy of said plurality of second quantum well layers is smaller on a side close to said p-type nitride semiconductor layer.

4. The nitride semiconductor light-emitting element according to claim 1 , wherein said first quantum well layers are made of Al c1 Ga d1 In (1-c1-d1) N (0≦c1<1, 0<d1≦1), and
said second quantum well layers are made of Al c2 Ga d2 In (1-c2-d2) N (0≦c2<1, 0<d2≦1), and
an In composition ratio of said first quantum well layers is higher than an In composition ratio of said second quantum well layers.

Assignees

• Sharp Kk

Inventors

• Tani Yoshihiko
• Takeoka Tadashi
• Kurisu Akihiro
• Hanamoto Tetsuya
• Senes Mathieu

Classifications

• H10H20/819

  characterised by their shape, e.g. curved or truncated substrates · CPC title

• H10H20/815

  having stress relaxation structures, e.g. buffer layers · CPC title

• H10H20/825

  containing nitrogen, e.g. GaN · CPC title

• H10H20/812 Primary

  within the light-emitting regions, e.g. having quantum confinement structures · CPC title

• H10H20/824

  comprising only Group III-V materials, e.g. GaP · CPC title