Organic light emitting display apparatus, method of manufacturing the same, and mask used in the method

Patent metadata

Field	Value
Publication number	US-9318544-B2
Application number	US-201514707562-A
Country	US
Kind code	B2
Filing date	May 8, 2015
Priority date	May 2, 2013
Publication date	Apr 19, 2016
Grant date	Apr 19, 2016

Abstract

A method of manufacturing an organic light emitting display apparatus is provided. A plurality of first electrodes is formed on a substrate. An intermediate layer including an emission layer is formed on the plurality of first electrodes. A deposition mold including a plurality of auxiliary patterning lines is formed by performing a deposition process twice using a mask. The mask includes a plurality of aperture sets, each of the plurality of aperture sets corresponding to part of each of the plurality of auxiliary patterning lines. A plurality of second electrodes is formed on the intermediate layer by depositing a conductive material into the deposition mold.

First claim

What is claimed is:

1. A method of manufacturing an organic light emitting display apparatus, the method comprising:
forming a plurality of first electrodes on a substrate;
forming an intermediate layer including an emission layer on the plurality of first electrodes;
forming a deposition mold including a plurality of auxiliary patterning lines by performing a deposition process twice using a mask, wherein the mask includes a plurality of aperture sets, each of the plurality of aperture sets corresponding to part of each of the plurality of auxiliary patterning lines; and
forming a plurality of second electrodes on the intermediate layer by depositing a conductive material into the deposition mold.

2. The method of claim 1 , wherein performing the deposition process twice using the mask comprises:
forming a first auxiliary patterning layer by depositing a mold material into the plurality of aperture sets of the mask;
moving the mask so that the plurality of aperture sets of the mask partially overlap the first auxiliary layer; and
forming the second auxiliary patterning layer by depositing the mold material into the plurality of aperture sets of the mask so that the second auxiliary patterning layer is connected to the first auxiliary patterning layer to form the plurality of auxiliary patterning lines.

3. The method of claim 1 , wherein the plurality of aperture sets comprises a plurality of first aperture sets arranged in a second direction, wherein each of the plurality of first aperture sets comprises a plurality of first apertures arranged in a first direction and spaced apart from each other in the first direction, the first direction crossing the second direction.

4. The method of claim 3 , wherein each of the plurality of first apertures is extended in the first direction and each of the plurality of first apertures has a length that is greater than a distance between two adjacent first apertures of the plurality of first apertures along the first direction.

5. The method of claim 3 , wherein the plurality of aperture sets comprises a plurality of second aperture sets arranged in the second direction, wherein each of the plurality of second aperture sets comprises a plurality of second apertures arranged in a second direction and spaced apart from each other in the first direction, wherein the mask further comprises a plurality of second apertures extending in the second direction and spaced apart each other in the second direction, and wherein the forming of the plurality of auxiliary patterning lines comprises forming additional auxiliary patterning lines corresponding to the plurality of second apertures in the mask so that the additional auxiliary patterning lines alternately connect first ends of two adjacent auxiliary patterning lines of the plurality of auxiliary patterning lines and second ends of two adjacent auxiliary patterning lines of the plurality of auxiliary patterning lines, the first ends opposite to the second ends.

6. The method of claim 1 , wherein a bonding force between the plurality of auxiliary patterning lines and the plurality of second electrodes is weaker than a bonding force between the plurality of second electrodes and the intermediate layer.

7. The method of claim 6 , wherein the plurality of auxiliary patterning lines includes a mold material including 8-quinolinolato lithium, (N,N-diphenyl-N,N-bis(9-phenyl-9H-carbazol-3-yl)biphenyl-4,4′-diamine), (N(diphenyl-4-yl)9,9-dimethyl-N-(4(9-phenyl-9H-carbazol-3-yl)phenyl)-9H-fluorene-2-amine), or 2-(4-(9,10-di(naphthalene-2-yl)anthracene-2-yl)phenyl)-1-phenyl-1H-benzo-[D]imidazole).

8. The method of claim 1 , wherein the plurality of second electrodes are formed as stripes extending in the first direction between the plurality of auxiliary patterning lines and arranged in the second direction.

9. The method of claim 1 , further comprising:
forming connection wires connecting ends of some of the plurality of second electrodes.

Assignees

• Samsung Display Co Ltd

Inventors

• Chung Jin-Koo
• Choi Jun-Ho
• Kim Seong-Min

Classifications

• H10K59/80521

  characterised by their shape · CPC title

• H10K59/131

  Interconnections, e.g. wiring lines or terminals · CPC title

• H10K71/60 Primary

  Forming conductive regions or layers, e.g. electrodes · CPC title

• H01L27/3276 Primary

  Electricity · mapped topic

• H01L51/0058

  Electricity · mapped topic