Conductive-pattern forming method and composition for forming conductive pattern by photo irradiation or microwave heating

US9318243B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9318243-B2
Application numberUS-201214359958-A
CountryUS
Kind codeB2
Filing dateNov 26, 2012
Priority dateNov 24, 2011
Publication dateApr 19, 2016
Grant dateApr 19, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a conductive pattern forming method and a composition for forming a conductive pattern by photo irradiation or microwave heating, capable of increasing the conductivity of the conductive pattern. A conductive pattern is formed by preparing a composition for forming a conductive pattern comprising, copper particles each having a copper oxide thin film on the entirety or a part of the surface thereof, copper oxide particles, a reducing agent such as a polyhydric alcohol, a carboxylic acid, or a polyalkylene glycol, and a binder resin; forming a printed pattern having any selected shape on a substrate using this composition for forming a conductive pattern; and subjecting the printed pattern to photo irradiation or microwave heating to generate a sintered body of copper.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composition for forming a conductive pattern by photo irradiation or microwave heating, comprising, copper particles each having a copper oxide thin film on the entirety or a part of a surface thereof, copper oxide particles having a diameter smaller than that of the copper particles, a reducing agent, and a binder resin; wherein the copper particles have a number median particle diameter D50 of 100 nm to 10 μm, and the copper oxide particles have a number median particle diameter D50 of 5 nm to 1000 nm. 2. A composition for forming a conductive pattern according to claim 1 , wherein a mass ratio of the copper particles and the copper oxide particles is represented by copper particles:copper oxide particles=98:2 to 50:50. 3. A composition for forming a conductive pattern according to claim 1 , wherein the copper oxide particles are copper (I) oxide particles, copper (II) oxide particles, or a mixture of these particles. 4. A composition for forming a conductive pattern according to claim 1 , wherein the reducing agent is a polyhydric alcohol, a carboxylic acid, or a polyalkylene glycol. 5. A composition for forming a conductive pattern according to claim 1 , wherein the copper particles have a number median particle diameter D50 of 500 nm to 3 μm. 6. A composition for forming a conductive pattern according to claim 1 , wherein the ratio of copper oxide in the copper particles is 20% by mass or less relative to the total amount of metal copper and copper oxide. 7. A method for forming a conductive pattern comprising, preparing a composition for forming a conductive pattern according to claim 1 , and subjecting the composition for forming a conductive pattern to photo irradiation or microwave heating. 8. A conductive pattern forming method according to claim 7 , wherein the light to be irradiated to the composition for forming a conductive pattern is a pulsed light having a wavelength of 200 to 3000 nm. 9. A conductive pattern forming method according to claim 7 , wherein the microwave to heat the composition for forming a conductive pattern has a wavelength of 1 m to 1 mm.

Assignees

Inventors

Classifications

  • Composite particles, i.e. first metal coated with second metal · CPC title

  • characterised by the pigment · CPC title

  • Nanoparticles · CPC title

  • After-treatment of the printed patterns, e.g. sintering or curing methods · CPC title

  • Pigment pastes, e.g. for mixing in paints (artists' paints C09D5/06) · CPC title

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What does patent US9318243B2 cover?
Provided are a conductive pattern forming method and a composition for forming a conductive pattern by photo irradiation or microwave heating, capable of increasing the conductivity of the conductive pattern. A conductive pattern is formed by preparing a composition for forming a conductive pattern comprising, copper particles each having a copper oxide thin film on the entirety or a part of th…
Who is the assignee on this patent?
Showa Denko Kk
What technology area does this patent fall under?
Primary CPC classification H01B13/003. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 19 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).