Graphene base and method of preparing the same

US9315387B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9315387-B2
Application numberUS-81579110-A
CountryUS
Kind codeB2
Filing dateJun 15, 2010
Priority dateAug 5, 2009
Publication dateApr 19, 2016
Grant dateApr 19, 2016

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Abstract

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A graphene base, including: graphene; and a substrate, wherein the graphene is formed directly on at least one surface of the substrate, and at least about 90 percent of an area of the surface of the substrate does not have a graphene wrinkle.

First claim

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What is claimed is: 1. A graphene base, comprising: a substrate; a graphitization catalyst layer disposed on the substrate; and graphene disposed between the substrate and the graphitization catalyst layer, wherein the graphene is formed directly on the at least one surface of the substrate, and at least about 90 percent of an area of the graphene does not have a wrinkle, wherein the substrate comprises a glass, gallium nitride, a plastic, polyethylene terephthalate, polyester sulfone, polyethylene napthalate, silica, silicon/silica or a combination thereof, wherein the graphitization catalyst layer comprises at least one selected from the group consisting of nickel, cobalt, iron, platinum, gold, aluminum, chromium, copper, magnesium, manganese, molybdenum, rhodium, silicon, thallium, titanium, tungsten, uranium, vanadium, zirconium, ruthenium, and iridium, and wherein a length of at least one side of the graphene is equal to or greater than 1 millimeter. 2. The graphene base of claim 1 , wherein a ratio of a peak D-band intensity to a peak G-band intensity of the graphene is equal to or less than about 0.5, in a Raman spectrum of the graphene. 3. The graphene base of claim 1 , wherein a ratio of an area of a D-band peak to an area of a G-band peak of the graphene is equal to or less than about 0.5, in a Raman spectrum of the graphene. 4. The graphene base of claim 1 , wherein the graphene has a patterned shape. 5. The graphene base of 1 , wherein a thickness of the graphitization catalyst layer is about 1 nanometer to about 1 micrometer. 6. The graphene base of claim 1 , wherein a pattern layer is disposed on the at least one surface of the substrate before the graphene is formed on the substrate. 7. The graphene base of claim 6 , wherein the graphene is formed according to a shape of the pattern layer on the substrate. 8. The graphene base of claim 1 , wherein at least about 90 percent of an area of the surface of the substrate does not have a graphene wrinkle disposed on the surface of the substrate. 9. An electrical device, comprising: a graphene base, the graphene base comprising a substrate; a graphitization catalyst layer disposed on the substrate; and graphene disposed between the substrate and the graphitization catalyst layer; wherein the graphene is formed directly on the at least one surface of the substrate, and at least about 90 percent of an area of the graphene does not have a wrinkle, wherein the substrate comprises a glass, gallium nitride, a plastic, polyethylene terephthalate, polyester sulfone, polyethylene napthalate, silica, silicon/silica or a combination thereof, wherein the graphitization catalyst layer comprises at least one selected from the group consisting of nickel, cobalt, iron, platinum, gold, aluminum, chromium, copper, magnesium, manganese, molybdenum, rhodium, silicon, thallium, titanium, tungsten, uranium, vanadium, zirconium, ruthenium, and iridium, and wherein a length of at least one side of the graphene is equal to or greater than 1 millimeter.

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What does patent US9315387B2 cover?
A graphene base, including: graphene; and a substrate, wherein the graphene is formed directly on at least one surface of the substrate, and at least about 90 percent of an area of the surface of the substrate does not have a graphene wrinkle.
Who is the assignee on this patent?
Shin Hyeon-Jin, Choi Won-Mook, Choi Jae-Young, and 2 more
What technology area does this patent fall under?
Primary CPC classification C01B31/0446. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 19 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).