Method for manufacturing liquid discharge head

Patent metadata

Field	Value
Publication number	US-9315026-B2
Application number	US-201514824954-A
Country	US
Kind code	B2
Filing date	Aug 12, 2015
Priority date	Aug 19, 2014
Publication date	Apr 19, 2016
Grant date	Apr 19, 2016

Abstract

A method for manufacturing a liquid discharge head. The method includes a first step of forming a telecentric measurement pattern A by exposure, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in a projection exposing device, and a second step of forming a telecentric measurement pattern B by exposure under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device. The off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement patterns A and B and an amount of defocusing.

First claim

What is claimed is:

1. A method for manufacturing a liquid discharge head, the method including a step of forming a discharge port pattern at a layer containing a photosensitive resin material by exposure using a projection exposing device, the method comprising:
a first step of forming a telecentric measurement pattern A by exposure through a mask, the telecentric measurement pattern A being part of a measurement pattern that allows determination of inclination of a principal ray caused by an off-axis telecentric degree occurring in the projection exposing device; and
a second step of forming a telecentric measurement pattern B by exposure through a mask under an exposure condition defocused from an exposure condition in the first step, the telecentric measurement pattern B being another part of the measurement pattern, which allows the determination of the inclination of the principal ray caused by the off-axis telecentric degree occurring in the projection exposing device,
wherein the off-axis telecentric degree is determined from an amount of misalignment between relative forming positions of the telecentric measurement pattern A and the telecentric measurement pattern B and an amount of defocusing.

2. The method according to claim 1 , wherein in the second step, the discharge port pattern is formed by exposure together with the telecentric measurement pattern B under the exposure condition defocused from the exposure condition in the first step.

3. The method according to claim 1 , wherein at least one of the telecentric measurement pattern A and the telecentric measurement pattern B is formed on a first surface of the layer containing the photosensitive resin material.

4. The method according to claim 3 , wherein a focus position of the telecentric measurement pattern A or the telecentric measurement pattern B is set on the first surface of the layer containing the photosensitive resin material.

5. The method according to claim 1 , wherein the telecentric measurement pattern B is formed inside the telecentric measurement pattern A.

6. The method according to claim 1 , wherein a center position of gravity of the telecentric measurement pattern A formed on the mask in the first step and a center position of gravity of the telecentric measurement pattern B formed on the mask in the second step coincide with each other.

7. The method according to claim 1 , wherein a shape of the telecentric measurement pattern A formed on the mask is similar to a shape of the telecentric measurement pattern B formed on the mask.

8. The method according to claim 1 , wherein a size of the telecentric measurement pattern B is 10% to 90% of a size of the telecentric measurement pattern A.

9. The method according to claim 1 , wherein a shortest distance between the telecentric measurement pattern A and a discharge port nearest the telecentric measurement pattern A is 20 μm or more.

10. The method according to claim 1 , wherein the amount of defocusing is 1 μm or more.

11. A method for manufacturing an inkjet print head including a plurality of liquid discharge heads, the method comprising:
a step of manufacturing the plurality of liquid discharge heads by the method according to claim 1 ; and
a step of selecting liquid discharge heads having the determined off-axis telecentric degrees close to each other.

Assignees

• Canon Kk

Inventors

• MANABE Takanobu
• Tagawa Yoshinori
• Murayama Hiroyuki
• Oya Shuhei

Classifications

• G03F7/2022

  Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure · CPC title

• B41J2/1631 Primary

  photolithography · CPC title

• B41J2/162

  Manufacturing of the nozzle plates · CPC title

• B41J2/1603

  of the front shooter type · CPC title

• G03F7/203

  comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation · CPC title