Process for producing FePt-based sputtering target

Patent metadata

Field	Value
Publication number	US-9314846-B2
Application number	US-201414330786-A
Country	US
Kind code	B2
Filing date	Jul 14, 2014
Priority date	Jan 13, 2012
Publication date	Apr 19, 2016
Grant date	Apr 19, 2016

Abstract

A process for producing an FePt-based sputtering target includes adding metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the metal oxide powder accounts for 20 vol % or more and 40 vol % or less of a total amount of the FePt-based alloy powder and the metal oxide powder, followed by mixing the FePt-based alloy powder and the metal oxide powder to produce a powder mixture.

First claim

The invention claimed is:

1. A process for producing an FePt-based sputtering target, comprising:
adding metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the metal oxide powder accounts for 20 vol % or more and 40 vol % or less of a total amount of the FePt-based alloy powder and the metal oxide powder, followed by mixing the FePt-based alloy powder and the metal oxide powder to produce a powder mixture; and
molding the produced powder mixture while the powder mixture is heated under pressure.

2. A process for producing an FePt-based sputtering target, comprising:
adding C powder containing unavoidable impurities and metal oxide powder containing unavoidable impurities to FePt-based alloy powder containing Pt in an amount of 40 at % or more and less than 60 at % and one or more kinds of metal elements other than Fe and Pt in an amount of more than 0 at % and 20 at % or less with the balance being Fe and unavoidable impurities and with a total amount of Pt and the one or more kinds of metal elements being 60 at % or less so that the C powder and the metal oxide powder are added to satisfy:
0<α≦20;

10≦β<40; and

20≦α+β≦40,

where α and β represent contents of the C powder and the metal oxide powder by vol %, respectively, based on a total amount of the FePt-based alloy powder, the C powder, and the metal oxide powder, followed by mixing the FePt-based alloy powder, the C powder, and the metal oxide powder to produce a powder mixture; and
molding the produced powder mixture while the powder mixture is heated under pressure.

3. The process for producing an FePt-based sputtering target according to claim 1 ,
wherein a metal oxide phase in the obtained FePt-based sputtering target has an average phase size of 0.4 μm or less as determined by an intercept method.

4. The process for producing an FePt-based sputtering target according to claim 2 ,
wherein a phase consisting of the C phase and the metal oxide phase in the obtained FePt-based sputtering target has an average size of 0.4 μm or less as determined by an intercept method.

5. The process for producing an FePt-based sputtering target according to claim 1 ,
wherein the one or more kinds of metal elements other than Fe and Pt are one or more kinds of Cu, Ag, Mn, Ni, Co, Pd, Cr, V, and B.

6. The process for producing an FePt-based sputtering target according to claim 2 ,
wherein the one or more kinds of metal elements other than Fe and Pt are one or more kinds of Cu, Ag, Mn, Ni, Co, Pd, Cr, V, and B.

7. The process for producing an FePt-based sputtering target according to claim 1 ,
wherein the one or more kinds of metal elements other than Fe and Pt include Cu.

8. The process for producing an FePt-based sputtering target according to claim 2 ,
wherein the one or more kinds of metal elements other than Fe and Pt include Cu.

9. The process for producing an FePt-based sputtering target according to claim 1 ,
wherein the one or more kinds of metal elements other than Fe and Pt are only Cu.

10. The process for producing an FePt-based sputtering target according to claim 2 ,
wherein the one or more kinds of metal elements other than Fe and Pt are only Cu.

11. The process for producing an FePt-based sputtering target according to claim 1 ,
wherein the metal oxide contains at least one of SiO 2 , TiO 2 , Ti 2 O 3 , Ta 2 O 5 , Cr 2 O 3 , CoO, Co 3 O 4 , B 2 O 3 , Fe 2 O 3 , CuO, Cu 2 O, Y 2 O 3 , MgO, Al 2 O 3 , ZrO 2 , Nb 2 O 5 , MoO 3 , CeO 2 , Sm 2 O 3 , Gd 2 O 3 , WO 2 , WO 3 , HfO 2 , and NiO 2 .

12. The process for producing an FePt-based sputtering target according to claim 2 ,
wherein the metal oxide contains at least one of SiO 2 , TiO 2 , Ti 2 O 3 , Ta 2 O 5 , Cr 2 O 3 , CoO, Co 3 O 4 , B 2 O 3 , Fe 2 O 3 , CuO, Cu 2 O, Y 2 O 3 , MgO, Al 2 O 3 , ZrO 2 , Nb 2 O 5 , MoO 3 , CeO 2 , Sm 2 O 3 , Gd 2 O 3 , WO 2 , WO 3 , HfO 2 , and NiO 2 .

13. The process for producing an FePt-based sputtering target according to claim 1 ,
wherein the mixing to produce the powder mixture is performed in an atmosphere in the presence of oxygen.

14. The process for producing an FePt-based sputtering target according to claim 2 ,
wherein the mixing to produce the powder mixture is performed in an atmosphere in the presence of oxygen.

15. The process for producing an FePt-based sputtering target according to claim 13 ,
wherein oxygen is supplied to the atmosphere from outside of the atmosphere.

16. The process for producing an FePt-based sputtering target according to claim 14 ,
wherein oxygen is supplied to the atmosphere from outside of the atmosphere.

17. The process for producing an FePt-based sputtering target according to claim 15 ,
wherein the oxygen is supplied by supplying air.

18. The process for producing an FePt-based sputtering target according to claim 16 ,
wherein the oxygen is supplied by supplying air.

19. The process for producing an FePt-based sputtering target according to claim 13 ,
wherein the atmosphere is air.

20. The process for producing an FePt-based sputtering target according to claim 14 ,
wherein the atmosphere is air.

21. The process for producing an FePt-based sputtering target according to claim 13 ,
wherein the atmosphere is composed substantially of an inert gas and oxygen.

22. The process for producing an FePt-based sputtering target according to claim 14 ,
wherein the atmosphere is composed substantially of an inert gas and oxygen.

23. The process for producing an FePt-based sputtering target according to claim 13 ,
wherein a concentration of oxygen in the atmosphere is 10 vol % or higher and 30 vol % or lower.

24. The process for producing an FePt-based sputtering target according to claim 14 ,
wherein a concentration of oxygen in the atmosphere is 10 vol % or higher and 30 vol % or lower.

25. The process for producing an FePt-based sputtering target according to claim 13 ,
wherein the atmosphere is released to air during the mixing.

26. The process for producing an FePt-based sputtering target according to claim 14 ,
wherein the atmosphere is released to air during the mixing.

Assignees

• Tanaka Precious Metal Ind

Inventors

• Miyashita Takanobu
• Goto Yasuyuki
• Yamamoto Takamichi
• Kushibiki Ryousuke
• Aono Masahiro
• Nishiura Masahiro

Classifications

• C22C5/04 Primary

  Alloys based on a platinum group metal · CPC title

• C22C1/10

  Alloys containing non-metals (C22C1/05, C22C1/08 take precedence) · CPC title

• H01J37/3429

  Plural materials · CPC title

• B22F2999/00

  Aspects linked to processes or compositions used in powder metallurgy · CPC title

• C23C14/0635

  Carbides · CPC title