Recirculation substrate container purging systems and methods

US9312152B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9312152-B2
Application numberUS-201414569662-A
CountryUS
Kind codeB2
Filing dateDec 13, 2014
Priority dateDec 13, 2013
Publication dateApr 12, 2016
Grant dateApr 12, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods and systems to reduce the consumption of purge gas for semiconductor substrate containers. The recirculation purging system recycles purge gas back to substrate containers by filtering and purifying gas flow from substrate containers, receiving gas flow from load port, or including a recirculation tank.

First claim

Opening claim text (preview).

What is claimed is: 1. A recirculation purging system, comprising: a container; a load port; wherein the container is disposed inside the load port; a purge gas flow input to the container; an exhaust purge gas flow output from the container; and a recirculation tank configured to provide a recirculated gas flow to the container and to accept an exhaust purge gas flow output from the container. 2. The recirculation purging system of claim 1 , further comprising: at least one nozzle disposed on a support of the load port configured to provide the purge gas flow input to the container or remove exhaust purge gas flow output from the container. 3. The recirculation purging system of claim 2 , further comprising: wherein the at least one nozzle is open when the container is placed on the support of the load port. 4. The recirculation purging system of claim 2 , further comprising: wherein the at least one nozzle comprises a spring, and wherein the spring is configured to push a nozzle plug upward to close a gas path in its resting state. 5. The recirculation purging system of claim 4 , further comprising: wherein placing the container on the nozzle plug pushes the nozzle plug downward thereby opening the gas path. 6. The recirculation purging system of claim 1 , further comprising: a pump system configured to first evacuate a gas inside the container and subsequently discards the gas when the recirculation purging system is initially activated. 7. The recirculation purging system of claim 6 , further comprising: wherein the pump system is configured to switch the gas inside the container with the recirculated gas flow when the recirculation purging system is subsequently in use after its initial activation.

Assignees

Inventors

Classifications

  • characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier · CPC title

  • Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

  • Fluid cleaning or flushing · CPC title

  • B08B9/0321Primary

    using pressurised, pulsating or purging fluid (E04F17/126 takes precedence) · CPC title

  • With separate material addition · CPC title

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Frequently asked questions

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What does patent US9312152B2 cover?
Methods and systems to reduce the consumption of purge gas for semiconductor substrate containers. The recirculation purging system recycles purge gas back to substrate containers by filtering and purifying gas flow from substrate containers, receiving gas flow from load port, or including a recirculation tank.
Who is the assignee on this patent?
Brooks Ccs Gmbh, Brooks Automation Inc
What technology area does this patent fall under?
Primary CPC classification H10P72/1926. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).