Method for processing gate dielectric layer deposited on germanium-based or group III-V compound-based substrate

Patent metadata

Field	Value
Publication number	US-9312126-B2
Application number	US-201414415555-A
Country	US
Kind code	B2
Filing date	Jan 8, 2014
Priority date	May 30, 2013
Publication date	Apr 12, 2016
Grant date	Apr 12, 2016

Abstract

The present invention discloses a method for processing a gate dielectric layer deposited on a germanium-based or Group III-V compound-based substrate, belonging to a semiconductor device field. The method comprises the steps of depositing a high-K gate dielectric layer on the germanium-based or Group III-V compound-based substrate, and then performing a plasma process to the high-K gate dielectric layer by using fluorine plasma, wherein during the plasma process, a guiding electric field is applied so that fluorine ions, when being accelerated to a surface of the gate dielectric layer, has an energy of 5-50 eV and the fluorine plasma drifts into the high-K gate dielectric layer, a ratio of a density of the fluorine ions in the high-K gate dielectric layer and a density of oxygen atoms in the high-K gate dielectric layer being 0.01-0.15:1.

First claim

What is claimed is:

1. A method for processing a gate dielectric layer deposited on a germanium-based or Group III-V compound-based substrate, comprising the steps of:
depositing a high-K gate dielectric layer on the germanium-based or Group III-V compound-based substrate: and
performing a plasma process to the high-K gate dielectric layer using fluorine plasma, wherein during the plasma process, a guiding electric field is applied so that fluorine ions, when being accelerated to a surface of the gate dielectric layer, have an energy of from about 5 to about 50 eV and the fluorine plasma drifts into the high-K gate dielectric layer, wherein a ratio of a density of the fluorine ions in the high-K gate dielectric layer and a density of oxygen atoms in the high-K gate dielectric layer is from about 0.01 to about 0.15:1.

2. The method according to claim 1 , further comprising the step of cleaning a surface of the germanium-based or Group III-V compound-based substrate to remove surface contaminations and native oxide layers, before depositing the high-K gate dielectric layer.

3. The method of claim 2 , further comprising adding O2 to the fluorine containing gas at a flow ratio of 02 to fluorine-containing of about 1:20 to about 1:5.

4. The method of claim 1 , further comprising the step of performing a surface passivation process to the germanium-based or Group III-V compound-based substrate before the depositing of the high-K gate dielectric layer.

5. The method of claim 4 , wherein the surface passivation process comprises depositing a passivation layer comprising Si, SiO2, Al2O3, ANx, GeNx, GeO2, Y2O3, La2O3 or CeO2.

6. The method of claim 4 , wherein the surface passivation process is a monolayer surface passivation utilizing S, N or P.

7. The method of claim 1 , wherein the high-K gate dielectric layer comprises HfO2, Al2O3, ZrO2, TiO2, TaO2, Y2O3, La2O3, GeO2 or GeNx.

8. The method of claim 1 , wherein the plasma process utilizes a fluorine-containing gas for producing the fluorine plasma.

9. The method of claim 1 , wherein the fluorine-containing gas is CF4, CHF3, CH2F2, CH3F or a combination thereof.

10. The method of claim 9 , wherein the fluorine containing gas has a flow of from about 20 to about 100 sccm.

11. The method of claim 9 , further comprising adding an inert gas to the fluorine containing gas.

12. The method of claim 11 , wherein the inert gas is Ar, He, or a combination thereof.

13. The method of claim 11 , wherein the inert gas has a flow of from about 0 to about 100 sccm.

14. The method of claim 1 , wherein the fluorine plasma is produced by using inductively coupled plasma ICP equipment, and during the plasma process using the fluorine plasma, a pressure is 10-200 mTorr, a power for producing the plasma is 15-60 W, and a time for the plasma process is 30 s-60 min.

15. The method of claim 1 , wherein the guiding electric field applied in the plasma process using the fluorine plasma is generated using RIE power integrated in an ICP etching system.

16. The method of claim 1 , further comprising the step of performing an annealing process with an annealing temperature of from about 350 to about 550° C. and an annealing time of about 30 s to about 5 min.

Assignees

• Univ Beijing

Inventors

• Huang Ru
• Lin Meng
• An Xia
• Li Ming
• Yun Quanxin
• Li Zhiqiang
• Li Min
• Liu Pengqiang
• Zhang Xing

Classifications

• H10P95/904

  of Group III-V semiconductors · CPC title

• H10P95/90

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P70/23

  during, before or after processing of insulating materials · CPC title

• H10P30/40

  into insulating materials · CPC title

• H10P14/69392

  the material containing hafnium, e.g. HfO2 · CPC title