Antireflective film comprising large particle size fumed silica

US9310527B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9310527-B2
Application numberUS-201213976535-A
CountryUS
Kind codeB2
Filing dateFeb 17, 2012
Priority dateMar 9, 2011
Publication dateApr 12, 2016
Grant dateApr 12, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Antireflective films are described comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate. The low refractive index layer comprises the reaction product of polymerizable resin composition comprising at least 20 wt-% fumed silica. In one embodiment, the polymerizable resin is ethylenically unsaturated. In a favored embodiment, the low refractive index layer increases in porosity from the light transmissive substrate interface to an opposing porous surface.

First claim

Opening claim text (preview).

What is claimed is: 1. An antireflective film comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate forming an interface wherein the low refractive index layer comprises the reaction product of a polymerizable resin composition comprising at least 55 wt % fumed silica and the low refractive index layer is a single layer that increases in porosity from the light transmissive substrate interface to an opposing porous surface, wherein the fumed silica has an average aggregate particle size as measured by intensity of at least 100 nm. 2. The antireflective film of claim 1 wherein the low refractive index layer has a refractive index ranging from 1.15 to 1.40. 3. The antireflective film of claim 1 wherein the low index layer has a thickness ranging from about 100 nm to about 500 nm. 4. The antireflective film of claim 1 wherein the antireflective film exhibits a haze of less than 2% or less than 1%. 5. The antireflective film of claim 1 wherein the antireflective film exhibits a transparency of at least 93%, or 94%, or 95%, or 96%, or 97%. 6. The antireflective film of claim 1 wherein the antireflective film exhibits a minimum reflectance of no greater than 2.0% for a wavelength from 450 nm to 650 nm. 7. The antireflective film of claim 1 wherein the antireflective film exhibits an average reflectance of no greater than 2.0% for a wavelength range from 450 nm to 650 nm. 8. The antireflective film of claim 1 wherein the antireflective film exhibits an absolute value of the maximum slope of reflectance at increments of 2 nm for wavelengths ranging from 450 nm to 650 nm of no greater than 0.05. 9. The antireflective film of claim 1 wherein the polymerizable resin comprises one or more ethylenically unsaturated monomer or oligomers. 10. The antireflective film of claim 1 wherein the polymerizable resin comprises a non-fluorinated monomer or oligomer having at least two free-radically polymerizable groups. 11. The antireflective film of claim 1 wherein the polymerizable resin comprises a fluorinated monomer or oligomer having at least two free-radically polymerizable group. 12. The antireflective film of claim 1 wherein the light transmissive substrate is glass or a polymeric film having a refractive index greater than the low refractive index layer. 13. The antireflective film of claim 12 wherein the polymeric film is selected from polyester, polycarbonate, or triacetyl cellulose. 14. The antireflective film of claim 1 wherein the light transmissive substrate further comprises a primer layer between the substrate and low refractive index layer. 15. The antireflective film of claim 1 wherein the light transmissive substrate further comprises a hardcoat layer between the substrate and low refractive index layer. 16. An article comprising an antireflective film of claim 1 provided in the optical path of the article.

Assignees

Inventors

Classifications

  • comprising vinyl halide (co)polymers, e.g. PVC, PVDC, PVF, PVDF · CPC title

  • Porous materials, e.g. for reducing the refractive index · CPC title

  • Synthetic resin or natural rubbers · CPC title

  • using fillers, pigments, thixotroping agents · CPC title

  • Void-containing component contains also a solid fiber or solid particle · CPC title

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What does patent US9310527B2 cover?
Antireflective films are described comprising a light transmissive substrate and a low refractive index layer disposed on the light transmissive substrate. The low refractive index layer comprises the reaction product of polymerizable resin composition comprising at least 20 wt-% fumed silica. In one embodiment, the polymerizable resin is ethylenically unsaturated. In a favored embodiment, the …
Who is the assignee on this patent?
Hao Encai, Zhang Jun-Ying, Kamrath Robert F, and 7 more
What technology area does this patent fall under?
Primary CPC classification G02B1/111. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).