Scale for photoelectric encoder

US9310225B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9310225-B2
Application numberUS-201414284902-A
CountryUS
Kind codeB2
Filing dateMay 22, 2014
Priority dateJun 14, 2013
Publication dateApr 12, 2016
Grant dateApr 12, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A scale for a photoelectric encoder includes a scale substrate and a reflection film formed at a predetermined pitch on the scale substrate. A surface of the reflection film forms a reflection surface. A low-reflection surface is formed by etching the scale substrate between reflection films. Accordingly, a scale can be provided which is lower in cost and has favorable yield rates.

First claim

Opening claim text (preview).

What is claimed is: 1. A scale for a photoelectric encoder comprising: a stainless steel scale substrate; a plurality of chrome reflection films each having a thickness of 25 nm to 200 nm and located on the substrate at a predetermined pitch, the plurality of reflection films comprising a reflection surface; and a low-reflection surface between reflection films of the plurality of reflection films and formed by etching the scale substrate. 2. The scale for the photoelectric encoder according to claim 1 , wherein the scale substrate is Special Use Stainless Steel. 3. The scale for the photoelectric encoder according to claim 1 , wherein the scale substrate is Invar material. 4. The scale for the photoelectric encoder according to claim 1 , wherein the reflection film is adhesive with the scale substrate. 5. An encoder comprising: a stainless steel scale substrate; a scale arranged on the scale substrate, the scale comprising: a low-reflection surface in which the substrate is etched at a predetermined pitch and in an orthogonal direction on top of the scale substrate; and a light reflection surface having a chrome reflection film with a higher reflectance than the low-reflection surface formed in a region between where the low-reflection surfaces are formed and following a direction orthogonal to a measurement direction of the scale, the chrome reflection film having a thickness of 25 nm to 200 nm; and a reader configured to read the scale. 6. A method of forming a scale having a low-reflection surface and a light reflection surface, the method comprising: forming, on a polished surface of a stainless steel substrate, a chrome reflection film adhesive with a scale substrate and a higher reflectance than the low-reflection surface, the reflection film having a thickness of 25 nm to 200 nm; etching a portion of the reflection film at fixed intervals and in a direction orthogonal to a measurement direction of the scale to form the light reflection surface; and etching the reflection film, then further etching a region where a polished surface of the substrate is exposed to form the low-reflection surface.

Assignees

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Classifications

  • Linear encoders · CPC title

  • Scales; Discs, e.g. fixation, fabrication, compensation · CPC title

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What does patent US9310225B2 cover?
A scale for a photoelectric encoder includes a scale substrate and a reflection film formed at a predetermined pitch on the scale substrate. A surface of the reflection film forms a reflection surface. A low-reflection surface is formed by etching the scale substrate between reflection films. Accordingly, a scale can be provided which is lower in cost and has favorable yield rates.
Who is the assignee on this patent?
Mitutoyo Corp
What technology area does this patent fall under?
Primary CPC classification G01D5/34707. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).