Photosensitive adhesive composition, film-like adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device

US9309446B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9309446-B2
Application numberUS-201213410702-A
CountryUS
Kind codeB2
Filing dateMar 2, 2012
Priority dateOct 30, 2009
Publication dateApr 12, 2016
Grant dateApr 12, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to a photosensitive adhesive composition that has thermal press bondability to an adherent after being patterned by exposure and development and enables alkali development, wherein a storage elastic modulus at 110° C. after exposure and further heat curing is not less than 10 MPa.

First claim

Opening claim text (preview).

What is claimed is: 1. A photosensitive adhesive composition that has thermal press bondability to an adherent after being patterned by exposure and development and enables alkali development, wherein the composition comprises an (A) alkali-soluble polyimide resin obtained by reacting a tetracarboxylic acid dianhydride with a diamine containing 10 mol % to 80 mol % of a phenolic hydroxyl group-containing diamine represented by formula (A-1) based on the diamines in total and an aliphatic ether diamine represented by formula (8): wherein R 1 , R 2 and R 3 are independently alkylene groups having 1 to 10 carbons atoms, wherein in the above formulae b is an integer between 2 and 80, and a storage elastic modulus at 110° C. after exposure and further heat curing is not less than 10 MPa. 2. The photosensitive adhesive composition according to claim 1 , wherein a Tg after exposure and further heat curing is not less than 80° C. 3. The photosensitive adhesive composition according to claim 1 , wherein a lowest melt viscosity at 20° C. to 200° C. after exposure is not more than 30000 Pa·s. 4. The photosensitive adhesive composition according to claim 1 , comprising a (B) radiation polymerizable compound, and a (C) photoinitiator. 5. The photosensitive adhesive composition according to claim 1 , wherein a Tg of the (A) alkali-soluble resin is 40° C. to 150° C. 6. The photosensitive adhesive composition according to claim 4 , wherein the (A) alkali-soluble resin is a polyimide resin having a carboxyl group and/or a hydroxyl group. 7. The photosensitive adhesive composition according to claim 1 , wherein the (B) radiation polymerizable compound contains at least one (meth)acrylate having a functionality of 3or more. 8. The photosensitive adhesive composition according to claim 4 , further comprising a (D) epoxy resin. 9. The photosensitive adhesive composition according to claim 8 , wherein the (D) epoxy resin contains at least one of a bisphenol F epoxy resin and a bisphenol A epoxy resin. 10. The photosensitive adhesive composition according to claim 4 , further comprising an (E) compound having an ethylenically unsaturated group and an epoxy group. 11. The photosensitive adhesive composition according to claim 4 , further comprising an (F) filler. 12. A film-like adhesive obtained by molding the photosensitive adhesive composition according to claim 1 into a film-like shape. 13. An adhesive sheet comprising a base material, and an adhesive layer formed on the base material and composed of the film-like adhesive according to claim 12 . 14. An adhesive pattern obtained by exposing an adhesive layer laminated on an adherent and composed of the film-like adhesive according to claim 12 , and performing a developing treatment on the adhesive layer after exposure with an alkali developer. 15. A semiconductor wafer with an adhesive layer comprising: a semiconductor wafer; and an adhesive layer laminated on the semiconductor wafer and composed of the film-like adhesive according to claim 12 . 16. A transparent substrate with an adhesive layer comprising: a transparent substrate; and an adhesive layer laminated on the transparent substrate and composed of the film-like adhesive according to claim 12 . 17. A semiconductor device having a structure in which using the photosensitive adhesive composition according to claim 1 , semiconductor elements are bonded to each other, and/or a structure in which using the photosensitive adhesive composition according to claim 1 , a semiconductor element and a semiconductor element-mounting support member are bonded to each other. 18. The semiconductor device according to claim 17 , wherein the semiconductor element-mounting support member is a transparent substrate. 19. The photosensitive adhesive composition according to claim 1 , wherein a Tg of the (A) alkali-soluble resin is at least 60° C. 20. The photosensitive adhesive composition according to claim 1 , further comprising a (B) radiation polymerizable compound containing at least one (meth)acrylate having a functionality of at least 2. 21. The photosensitive adhesive composition according to claim 1 , further comprising: a (B) radiation polymerizable compound; a (C) photoinitiator; an (D) epoxy resin; a curing agent; and a (F) filler. 22. The photosensitive adhesive composition according to claim 1 , wherein the content of the diamine represented by formula (A-1) is 30 mol % to 70 mol % in total. 23. The photosensitive adhesive composition according to claim 1 , wherein the photosensitive adhesive composition has a property of airtight sealing. 24. The photosensitive adhesive composition according to claim 1 , wherein the photosensitive adhesive composition is configured to form an adhesive pattern on a transparent substrate of a solid-state imaging element.

Assignees

Inventors

Classifications

  • the wafer tape being a laminate of three or more layers, e.g. including additional layers beyond a base layer and an uppermost adhesive layer · CPC title

  • Encapsulations, e.g. protective coatings · CPC title

  • the stacked chips having different sizes, e.g. chip stacks having a pyramidal shape · CPC title

  • of bond wires · CPC title

  • of die-attach connectors · CPC title

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What does patent US9309446B2 cover?
The present invention relates to a photosensitive adhesive composition that has thermal press bondability to an adherent after being patterned by exposure and development and enables alkali development, wherein a storage elastic modulus at 110° C. after exposure and further heat curing is not less than 10 MPa.
Who is the assignee on this patent?
Mitsukura Kazuyuki, Kawamori Takashi, Masuko Takashi, and 2 more
What technology area does this patent fall under?
Primary CPC classification C08L63/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).