Transition-metal-free silylation of aromatic compounds

US9309269B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9309269-B2
Application numberUS-201514628641-A
CountryUS
Kind codeB2
Filing dateFeb 23, 2015
Priority dateOct 2, 2012
Publication dateApr 12, 2016
Grant dateApr 12, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention describes chemical systems and methods for silylating aromatic organic substrates, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong base, said system being substantially free of a transition-metal compound, and said methods comprising contacting a quantity of the organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate; wherein said system is substantially free of a transition-metal compound.

First claim

Opening claim text (preview).

What is claimed: 1. A chemical system for silylating aromatic substrates comprising an aromatic moiety, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong hydride or alkoxide base, said system being capable of silylating the organic substrate; wherein the system is substantially free of transition-metal compounds. 2. The system of claim 1 , wherein the mixture further comprises an optionally substituted tetraalkylethylenediamine (e.g., tetramethylethylenediamine), an optionally substituted 1,10-phenanthroline derivative, an optionally substituted 2,2′-bipyridine derivatives, or an optionally substituted 4-dimethylaminopyridine derivative. 3. The system of claim 1 , that is substantially free of water, oxygen, or both water and oxygen. 4. The system of claim 1 , wherein at least one organosilane comprises an organosilane of Formula (I) or Formula (II): (R) 4-m Si(H) m   (I) R—[—SiH(R)—O—] n R  (II) where m is 1, 2, or 3; n is 10 to 100; and each R is independently optionally substituted C 1-12 alkyl or heteroalkyl, optionally substituted C 5-20 aryl or heteroaryl, optionally substituted C 6-30 alkaryl or heteroalkaryl, optionally substituted C 6-30 aralkyl or heteroaralkyl, optionally substituted —O—C 1-12 alkyl or heteroalkyl, optionally substituted —O—C 5-20 aryl or heteroaryl, optionally substituted —O—C 6-30 alkaryl or heteroalkaryl, or optionally substituted —O—C 6-30 aralkyl or heteroaralkyl, and, if substituted, the substituents may be phosphonato, phosphoryl, phosphanyl, phosphino, sulfonato, C 1 -C 20 alkylsulfanyl, C 5 -C 20 arylsulfanyl, C 1 -C 20 alkylsulfonyl, C 5 -C 20 arylsulfonyl, C 1 -C 20 alkylsulfinyl, C 5 -C 20 arylsulfinyl, sulfonamido, amino, amido, imino, nitro, nitroso, hydroxyl, C 1 -C 20 alkoxy, C 5 -C 20 aryloxy, C 2 -C 20 alkoxycarbonyl, C 5 -C 20 aryloxycarbonyl, carboxyl, carboxylato, mercapto, formyl, C 1 -C 20 thioester, cyano, cyanato, thiocyanato, isocyanate, thioisocyanate, carbamoyl, epoxy, styrenyl, silyl, silyloxy, silanyl, siloxazanyl, boronato, boryl, or halogen, or a metal-containing or metalloid-containing group, where the metalloid is Sn or Ge, where the substituents may optionally provide a tether to an insoluble or sparingly soluble support media comprising alumina, silica, or carbon. 5. The system of claim 1 , wherein the organosilane is (R) 3 SiH or (R) 2 SiH 2 , where each R is independently C 1-6 alkyl. 6. The system of claim 1 , wherein the at least one strong base comprises an alkali or alkaline earth metal hydride or alkoxide. 7. The system of claim 1 , wherein the at least one strong base comprises an alkali or alkaline earth metal hydride. 8. The system of claim 7 , wherein the at least one strong base comprises calcium hydride or potassium hydride. 9. The system of claim 1 , wherein the at least one strong base comprises an alkali or alkaline earth metal alkoxide. 10. The system of claim 9 , wherein the at least one alkoxide comprises a C 1-12 linear or branched alkyl moiety or a C 5-10 aryl or heteroaryl moiety. 11. The system of claim 10 , wherein the at least one alkoxide comprises methoxide, ethoxide, propoxide, butoxide, or 2-ethyl-hexyl alkoxide. 12. The system of claim 6 , wherein the alkali or alkaline earth metal hydride or alkoxide is a potassium or cesium alkoxide. 13. The system of claim 1 , where the organosilane is triethylsilane and the strong base is potassium tert-butoxide. 14. The system of claim 1 , wherein the organosilane and the at least one strong base are present together at a molar ratio, with respect to one another, in a range of from about 20:1 to about 1:1. 15. The system of claim 1 , wherein the at least one strong base and substrate are present together at a molar ratio, with respect to one another, in a range of from about 0.01:1 to about 0.9:1. 16. The system of claim 1 , wherein the organic substrate comprises an optionally substituted benzene, biphenyl, naphthalene, or anthracene ring structure. 17. The system of claim 1 , wherein the organic substrate comprises an exocyclic aromatic C—X bond, where X is N, O, or S. 18. The system of claim 17 , wherein the organic substrate comprises an exocyclic aromatic C—X bond and the silylation occurs ortho to the exocyclic C—X bond. 19. The system of claim 1 , wherein the organic substrate comprises a heteroaryl moiety. 20. The system of claim 19 , wherein the substrate comprises an optionally substituted furan, pyrrole, thiophene, pyrazole, imidazole, benzofuran, benzopyrrole, benzothiophene, indole, azaindole, dibenzofuran, xanthene, dibenzopyrrole, or a dibenzothiophene. 21. The system of claim 1 , wherein the organic aromatic substrate comprises at least one of the following moieties: where X is N—R″, O, or S; Y is H, N(R″) 2 , O—R″, or S—R″ p is 0 to 4; R′ is a halo, hydroxyl, sulfhydryl, alkoxy, aryloxy, aralkyloxy, alkaryloxy, acyl, acyloxy), alkoxycarbonyl, aryloxycarbonyl, halocarbonyl, alkylcarbonato, arylcarbonato, carboxylato (—COO—), dialkyl-substituted carbamoyl, di haloalkyl-substituted carbamoyl, di aryl-substituted carbamoyl, di-alkyl-substituted thiocarbamoyl, di-aryl-substituted thiocarbamoyl, di-N-alkyl), N-aryl-substituted thiocarbamoyl, cyano, cyanato, thiocyanato, di-alkyl-substituted amino, di-aryl-substituted amino, arylimino (—CR═N(aryl), where R=alkyl, aryl, alkaryl, aralkyl), nitro, nitroso, alkylsulfanyl, arylsulfanyl, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, boronato (—B(OR) 2 where R is alkyl or other hydrocarbyl); or (R′) p is an optionally substituted fused alicyclic, heteroalicyclic, aryl or heteroaryl moiety; and R″ is an amine protecting group or an optionally substituted alkyl, aryl, heteroaryl, alkaryl or alk-heteroaryl, preferably optionally substituted C 1 -C 6 alkyl, phenyl, tolyl, benzyl, or phenethyl. 22. The system of claim 1 , wherein the substrate comprises at least one of the following moieties: where X is N—R″, O, or S; Y is H, N(R″) 2 , O—R″, or S—R″ p is 0 to 4; R′ is a halo, hydroxyl, sulfhydryl, alkoxy, aryloxy, aralkyloxy, alkaryloxy, acyl, acyloxy), alkoxycarbonyl, aryloxycarbonyl, halocarbonyl, alkylcarbonato, arylcarbonato, carboxylato (—COO—), dialkyl-substituted carbamoyl, di haloalkyl-substituted carbamoyl, di aryl-substituted carbamoyl, di-alkyl-substituted thiocarbamoyl, di-aryl-substituted thiocarbamoyl, di-N-alkyl), N-aryl-substituted thiocarbamoyl, cyano, cyanato, thiocyanato, di-alkyl-substituted amino, di-aryl-substituted amino, arylimino (—CR═N(aryl), where R=alkyl, aryl, alkaryl, aralkyl), nitro, nitroso, alkylsulfanyl, arylsulfanyl, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, boronato (—B(OR) 2 where R is alkyl or other hydrocarbyl); or (R′) p is an optionally substituted fused alicyclic, heteroalicyclic, aryl or heteroaryl moiety; and R″ is an amine protecting group or an optionally substituted alkyl, aryl, heteroaryl, alkaryl or alk-heteroaryl, preferably optionally substituted C 1 -C 6 alkyl, phenyl, tolyl, benzyl, or phenethyl. 23. The system of claim 21 , wherein the organic substrate comprises a heteroaryl moiety of structure: and th

Assignees

Inventors

Classifications

  • comprising a heterocyclic ring · CPC title

  • said ring is substituted at a C ring atom by Si · CPC title

  • C07F7/0829Primary

    Hydrosilylation reactions · CPC title

  • Compounds with a Si-H linkage · CPC title

  • Chemistry & Metallurgy · mapped topic

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What does patent US9309269B2 cover?
The present invention describes chemical systems and methods for silylating aromatic organic substrates, said system comprising a mixture of (a) at least one organosilane and (b) at least one strong base, said system being substantially free of a transition-metal compound, and said methods comprising contacting a quantity of the organic substrate with a mixture of (a) at least one organosilane …
Who is the assignee on this patent?
California Inst Of Techn
What technology area does this patent fall under?
Primary CPC classification C07F7/0829. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 12 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).