High-purity 1-fluorobutane and plasma etching method
US-2016372335-A1 · Dec 22, 2016 · US
US9309176B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9309176-B2 |
| Application number | US-201514662465-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 19, 2015 |
| Priority date | Oct 15, 2009 |
| Publication date | Apr 12, 2016 |
| Grant date | Apr 12, 2016 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
The invention relates to a process for removing one or more undesired (hydro)halocarbon compounds from a (hydro)fluoroalkene, the process comprising contacting a composition comprising the (hydro)fluoroalkene and one or more undesired (hydro)halocarbon compounds with an aluminum-containing absorbent, activated carbon, or a mixture thereof.
Opening claim text (preview).
We claim: 1. A process for removing one or more undesired (hydro)fluoroalkyne compounds from a (hydro)fluoroalkene, the process comprising contacting a composition comprising the (hydro)fluoroalkene and one or more undesired (hydro)fluoroalkyne compounds with an aluminium-containing adsorbent, activated carbon, or a mixture thereof, wherein the (hydro)fluoroalkene does not contain a ═CF2 moiety. 2. The process according to claim 1 wherein the (hydro)fluoroalkene is a C3-7 (hydro)fluoroalkene. 3. The process according to claim 2 wherein the C3-7 (hydro)fluoroalkene is a hydrofluoropropene. 4. The process according to claim 3 wherein the hydrofluoropropene is a trifluoropropene or a tetrafluoropropene. 5. The process according to claim 4 wherein the trifluoropropene is 3,3,3-trifluoropropene (R-1243zf). 6. The process according to claim 4 wherein the tetrafluoropropene is E/Z-1,3,3,3-tetrafluoropropene (R-1234ze). 7. The process according to claim 4 wherein the tetrafluoropropene is 2,3,3,3-tetrafluoropropene (R-1234yf). 8. The process according to claim 1 wherein the (hydro)fluoroalkyne is trifluoromethylacetylene (TFMA). 9. The process according to claim 1 wherein the aluminium-containing adsorbent is porous and comprises alumina or aluminosilicate. 10. The process according to claim 9 wherein the alumina comprises acidic functionality. 11. The process according to claim 9 wherein the aluminosilicate is a molecular sieve (zeolite) having pore sizes in the range 3 to 12 Angstroms. 12. The process according to claim 1 wherein the activated carbon is impregnated with an additive selected from a metal, a metal compound, a base and a mixture thereof. 13. The process according to claim 12 wherein the additive is an alkali metal salt. 14. The process according to claim 1 wherein the activated carbon has a surface area of from 50 to 3000 m2. 15. The process according to claim 14 wherein the activated carbon has a surface area of from 100 to 2000 m2. 16. The process according to claim 1 wherein the or each undesired (hydro)fluoroalkyne compound is present in an amount of from about 0.1 to about 1000 ppm, based on the weight of the composition comprising the (hydro)fluoroalkene and one or more undesired (hydro)fluoroalkyne compounds. 17. The process according to claim 16 wherein the or each undesired (hydro)fluoroalkyne compound is present in an amount of from 0.1 to 500 ppm. 18. The process according to claim 17 wherein the or each undesired (hydro)fluoroalkyne compound is present in an amount of from 1 to 100 ppm. 19. The process according to claim 1 wherein at least 50% of the or each undesired (hydro)fluoroalkyne compound present in the composition is removed therefrom. 20. The process according to claim 19 wherein at least 70% of the or each undesired (hydro)fluoroalkyne compound present in the composition is removed therefrom. 21. The process according to claim 20 wherein at least 90% of the or each undesired (hydro)fluoroalkyne compound present in the composition is removed therefrom. 22. The process according to claim 1 , wherein the process is conducted at from −50° C. to 200° C. 23. The process according to claim 22 , wherein the process is conducted at from 0° C. to 100° C. 24. The process according to claim 23 , wherein the process is conducted at from 10° C. to 50° C. 25. The process according to claim 1 wherein following the contacting step, the resulting composition comprises the (hydro)fluoroalkene and from 0 to 10 ppm of the or each undesired (hydro)fluoroalkyne compound. 26. The process according to claim 25 wherein following the contacting step, the resulting composition comprises the (hydro)fluoroalkene and from 0 to 5 ppm of the or each undesired (hydro)fluoroalkyne compound. 27. The process according to claim 1 wherein the composition comprising the (hydro)fluoroalkene and one or more undesired (hydro)fluoroalkyne compounds is a product stream from a process for producing the (hydro)fluoroalkene. 28. The process for removing one or more undesired (hydro)fluoroalkyne compounds from a (hydro)fluoroalkene according to claim 27 , which process is combined with one or more steps of distillation, condensation or phase separation steps, and/or by scrubbing with water or aqueous base.
by adsorption on solids · CPC title
Purification; Separation (separation of optically-active compounds C07B57/00); Stabilisation; Use of additives · CPC title
by distillation · CPC title
by dehalogenation · CPC title
by splitting-off hydrogen halides from halogenated hydrocarbons · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.