EUV microlithography illumination optical system and EUV attenuator for same
US-9482959-B2 · Nov 1, 2016 · US
Illumination system for EUV microlithography
US9304400B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9304400-B2 |
| Application number | US-201113038453-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 2, 2011 |
| Priority date | Sep 30, 2008 |
| Publication date | Apr 5, 2016 |
| Grant date | Apr 5, 2016 |
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Abstract
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An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm 2 . The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.
First claim
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What is claimed is: 1. An illumination system, comprising: a light source configured to generate illumination light; an illumination optics comprising an optical modulation component, wherein: the modulation component comprises a displacement device configured to displace the light source; the light source is configured to pass illumination light having an etendue higher than 0.01 mm 2 into the illumination optics; the illumination optics is configured to guide the illum…
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Physics · mapped topic
- G03F7/70083Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US9304400B2 cover?
- An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm 2 . The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At l…
- Who is the assignee on this patent?
- Layh Michael, Stuetzle Ralf, Fiolka Damian, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70083. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Apr 05 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).