Apparatus for and method of source material delivery in a laser produced plasma EUV light source

Patent metadata

Field	Value
Publication number	US-9301382-B2
Application number	US-201314094361-A
Country	US
Kind code	B2
Filing date	Dec 2, 2013
Priority date	Dec 2, 2013
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

A device and method are disclosed in which gas is caused to flow parallel to a flow of source material to form a gas shroud. The gas shroud may protect flow of source material from being disrupted by a cross flow of gas. The gas shroud may also limit heating of a physical shroud through which the source material passes and limit accumulation of source material on the physical shroud by deforming a plasma bubble formed during irradiation of the source material so that the plasma bubble does not come too near the physical shroud. A device and method are also disclosed for establishing an additional transverse flow of gas so that the gas shroud does not cause source material contamination of an optic used to collect light generated during irradiation of the source material.

First claim

What is claimed is:

1. A device comprising:
a chamber;
an EUV source material delivery system having a source material release point and adapted to deliver a stream of source material to a plasma bubble in an irradiation region within the chamber along a path between the source material release point and the irradiation region, the source material delivery system including a solid shroud extending from the source material release point and parallel to the path to a solid shroud end to protect at least a portion of the stream; and
a gap defined between the solid shroud end and the plasma bubble, the gap being maintained at a predetermined width by gas from a first gas delivery system adapted to cause the gas to flow in the chamber along at least a portion of the path between the solid shroud end and the irradiation region.

2. A device as recited in claim 1 wherein the first gas delivery system is adapted to cause gas to flow in the chamber along at least a portion of the path inside the solid shroud and out of the solid shroud end towards the irradiation region.

3. A device as recited in claim 1 wherein the solid shroud has a length parallel to the path and the first gas delivery system is adapted to cause gas to flow in the chamber outside of the solid shroud and parallel to the length of the solid shroud and towards the irradiation region.

4. A device as recited in claim 1 further comprising an EUV optic and a second gas delivery system adapted to cause gas to flow from the direction of the EUV optic and towards the stream.

5. A device as recited in claim 4 wherein a flow rate at which the first gas delivery system causes gas to flow in the chamber along at least a portion of the path is large enough that the flow of gas from the second gas delivery system does not cause the stream to deviate substantially from the path.

6. A device as recited in claim 4 wherein the EUV optic comprises a collector mirror.

7. A device as recited in claim 4 wherein the second gas delivery system is adapted to cause gas to flow through a central aperture in the EUV optic.

8. A device as recited in claim 4 wherein the second gas delivery system comprises a gas delivery line arranged adjacent a substantially radially symmetric surface of the EUV optic confronting the irradiation region and extending substantially radially at least part of a distance between a central aperture in the EUV optic and an outer circumferential edge of the EUV optic, the qas delivery line having orifices for directing qas substantially perpendicularly away from the surface of the EUV optic.

9. A device as recited in claim 4 wherein the second gas delivery system comprises a first gas delivery line arranged adjacent a substantially radially symmetric surface of the EUV optic confronting the irradiation region, the first gas delivery line extending substantially radially at least part of a distance between a central aperture in the EUV optic and an outer circumferential edge of the EUV optic in a direction substantially parallel to the path, the first gas delivery line having orifices arranged along its length for expelling gas in a direction away from the EUV optic surface.

10. A device as recited in claim 9 wherein the second gas delivery system also comprises a second gas delivery line arranged adjacent a substantially radially symmetric surface of the EUV optic confronting the irradiation region and extending substantially radially at least part of a distance between a central aperture in the EUV optic and an outer circumferential edge of the EUV optic in a direction substantially parallel to the path and radially opposite to the direction from the central aperture than the first gas delivery line.

11. A device as recited in claim 8 wherein the gas delivery line is positioned adjacent a portion of the surface of the EUV optic obscured by the solid shroud.

12. A device comprising:
a chamber having an irradiation region within;
a EUV optic with a central aperture;
a first gas delivery system in fluid communication with an interior of the chamber and adapted to cause gas to flow through the central aperture and towards the irradiation region;
a source material delivery system having a source material release point within the chamber and adapted to deliver a stream of source material to the irradiation region along a path between the source material release point and the irradiation region, the source material delivery system comprising a solid shroud extending from the source material release point and parallel to the path to protect at least a portion of the stream; and
a second gas delivery system in fluid communication with the interior of the chamber and adapted to cause gas to flow in the chamber along at least a portion of the path and into a gap defined between the solid shroud end and a plasma bubble established in the irradiation region, the gap being maintained at a predetermined width by gas from the second gas delivery system.

13. A device as claimed in claim 12 further comprising a first gas delivery line arranged adjacent a substantially radially symmetric surface of the EUV optic confronting the irradiation region, the first gas delivery line extending substantially radially at least part of a distance between a central aperture in the EUV optic and an outer edge of the EUV optic in a direction substantially parallel to the path, the first gas delivery line having orifices arranged along its length for expelling gas in a direction substantially perpendicularly away from the EUV optic surface.

14. A device as recited in claim 13 wherein the first gas delivery line is positioned adjacent a portion of the surface of the EUV optic obscured by the solid shroud.

15. A method comprising the steps of:
directing a stream of EUV source material along a path through a solid shroud between a source material release point in a chamber and an irradiation region in the chamber; and
streaming gas along at least a portion of the path and into a gap defined by an end of the solid shroud and a plasma bubble formed in the irradiation region in the direction from the end of the solid shroud towards the plasma bubble so as to maintain the gap at a predetermined width.

16. A method as recited in claim 15 wherein streaming step comprises causing gas to flow in the chamber along at least a portion of the path inside the solid shroud and out of the solid shroud end towards the irradiation region.

17. A method as recited in claim 15 wherein the solid shroud has a length parallel to the path and wherein the streaming step comprises causing gas to flow in the chamber outside of the solid shroud and parallel to the length of the solid shroud and towards the irradiation region.

18. A method as recited in claim 15 further comprising a step concurrent with the streaming step of causing gas to flow from the direction of an EUV optic and towards the path.

19. A method as recited in claim 18 wherein said streaming step comprises streaming gas at a flow rate large enough that the flow of gas from the direction of an EUV optic and towards the path does not prevent the source material from passing through the irradiation region.

20. A method as recited in claim 18 further comprising causing gas to flow into the chamber along a length of a gas delivery line arranged adjacent a substantially radially symmetric surface of the EUV optic confronting an irradiation region, the gas delivery line extending substantially radially at least part of a distance between a central aperture

Assignees

• Cymer LLC
• Asml Netherlands Bv

Inventors

• Ershov Alexander I
• Evans David
• Graham Matthew

Classifications

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title

• H05G2/003

  the plasma being generated from a material in a liquid or gas state · CPC title

• H05G2/0027 Primary

  Arrangements for controlling the supply; Arrangements for measurements · CPC title

• G03F7/70033

  by plasma extreme ultraviolet [EUV] sources · CPC title

• H05G2/0094

  Reduction, prevention or protection from contamination; Cleaning · CPC title