Spectral filtering device in the visible and infrared ranges

Patent metadata

Field	Value
Publication number	US-9297939-B2
Application number	US-201313950691-A
Country	US
Kind code	B2
Filing date	Jul 25, 2013
Priority date	Aug 16, 2012
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

Spectral filtering device including a dielectric substrate, a first filter capable of acting as a passband filter in the visible range and having a plurality of first nanostructures with a uniform spacing between each other. Each nanostructure has a portion of dielectric material arranged between two portions of metallic material such that one of the two portions of metallic material is arranged between the substrate and the portion of dielectric material. A second filter capable of acting as a passband filter in the infrared range is also included having a plurality of second nanostructures with a uniform spacing between each other and each comprising a portion of dielectric material of which only one face is in contact with a portion of metallic material.

First claim

The invention claimed is:

1. A spectral filtering device comprising at least:
a substrate comprising at least one dielectric material;
a first filter acting as a passband filter in the visible range and comprising a plurality of first nanostructures with a uniform spacing between each other and arranged on the substrate, each of the first nanostructures comprising a portion of dielectric material arranged between two portions of metallic material such that one of the two portions of metallic material is arranged between the substrate and the portion of dielectric material;
a second filter acting as a passband filter in the infrared range and comprising a plurality of second nanostructures with a uniform spacing between each other and arranged on the substrate, each of the second nanostructures comprising a portion of dielectric material having a plurality of surfaces, of which only one surface is in contact with a portion of metallic material; and
a superstrate material provided over the first and second nanostructures such that the superstrate material is interposed between side surfaces of adjacent nanostructures.

2. A method of making a spectral filtering device, comprising at least the following steps:
making a plurality of first nanostructures, at a uniform spacing from each other on a substrate comprising at least one dielectric material, each of the first nanostructures comprising a portion of dielectric material arranged between two portions of metallic material such that one of the two portions of metallic material is arranged between the substrate and the portion of dielectric material, forming a first filter capable of making a passband filter in the visible range,
making a plurality of second nanostructures at a uniform spacing from each other and located on the substrate, each of the second nanostructures comprising a portion of dielectric material having a plurality of surfaces, of which only one surface is in contact with a portion of metallic material, forming a second filter capable of making a passband filter in the infrared range, and
providing a superstrate material over the first and second nanostructures such that the superstrate material is interposed between side surfaces of adjacent nanostructures.

3. The spectral filtering device according to claim 1 , wherein at least one of the following conditions is satisfied:
the portions of metallic material of the first and the second nanostructures comprise aluminium, and
the portions of metallic material of the first and the second nanostructures are between about 30 nm and 70 nm thick.

4. The spectral filtering device according to claim 1 , wherein at least one of the following conditions is satisfied:
the dielectric portions of the first and second nanostructures comprise SiN,
each of the dielectric portions of the first nanostructures are between about 75 nm and 100 nm thick, and
each of the dielectric portions of the second nanostructures are between about 250 nm and 325 nm thick.

5. The spectral filtering device according to claim 1 , wherein the portions of metallic material arranged in contact with portions of dielectric material of the second nanostructures are arranged between the substrate and said portions of dielectric material.

6. The spectral filtering device according to claim 1 , wherein at least one of the following conditions is satisfied:
one dimension of each of the first nanostructures that is perpendicular to a principal plane of the substrate is less than the shortest wavelength of the spectral band that the first filter can allow to pass, and
one dimension of each of the second nanostructures that is perpendicular to the principal plane of the substrate is less than the shortest wavelength of the spectral band that the second filter can allow to pass.

7. The spectral filtering device according to claim 1 , in which wherein at least one of the following conditions is satisfied:
the first nanostructures are each rectangular parallelepiped shaped, and
the second nanostructures are each rectangular parallelepiped shaped.

8. The spectral filtering device according to claim 1 , wherein at least one of the following conditions is satisfied:
the first nanostructures are laid out side by side on the substrate, within their corresponding filters, in the form of rows parallel to each other, and
the second nanostructures are laid out side by side on the substrate, within their corresponding filters, in the form of rows parallel to each other.

9. The spectral filtering device according to claim 1 , wherein at least one of the following conditions is satisfied:
the distance between the centres of two neighbouring first nanostructures is less than the shortest wavelength of the band that the first filter can allow to pass, and
the distance between the centres of two neighbouring second nanostructures is less than the shortest wavelength of the band that the second filter can allow to pass.

10. The spectral filtering device according to claim 1 , further comprising a third filter acting as a passband filter in the visible range and comprising a plurality of third nanostructures at a uniform spacing from each other and located on the substrate, each of the third nanostructures comprising a portion of dielectric material arranged between two portions of metallic material such that one of the two metallic portions is arranged between the substrate and the portion of dielectric material, and in which the band of wavelengths that the third filter allows to pass is different from the band of wavelengths that the first filter allows to pass.

11. The spectral filtering device according to claim 10 , further comprising a fourth filter acting as a passband filter in the visible range and comprising a plurality of fourth nanostructures at a uniform spacing from each other and arranged on the substrate, each of the fourth nanostructures comprising a portion of dielectric material arranged between two portions of metallic material such that one of the two metallic portions is arranged between the substrate and the portion of dielectric material, and in which the band of wavelengths that the fourth filter allows to pass is different from the band of wavelengths that the first and third filters allows to pass.

12. The spectral filtering device according to claim 1 , further comprising a layer of dielectric material covering the first nanostructures and the second nanostructures arranged on the substrate.

13. An imaging device comprising at least one spectral filtering device according to claim 1 , and further comprising a plurality of photodetectors each facing a filter of the spectral filtering device.

14. The method according to claim 2 , wherein the first nanostructures and the second nanostructures are made using the following steps:
depositing a stack of layers on the substrate, comprising a first metallic layer, a first dielectric layer and a second metallic layer,
etching a part of the second metallic layer covering a part of the first dielectric layer that will form part of the portions of dielectric material of the second nanostructures,
depositing a second layer of dielectric material, at least on said part of the first dielectric layer,
etching the first metallic layer, the first dielectric layer and the second metallic layer such that remaining portions of these layers form the first nanostructures, and
etching the first metallic layer, said part of the first dielectric layer and the second dielectric layer such that remaining portions of these layers form the second nanostructures.

15. The spectral filtering device a

Assignees

• Commissariat Energie Atomique
• Commissariat à l'énergie atomique et aux énergies alternatives

Inventors

• Palanchoke Ujwol
• Boutami Salim
• Hazart Jerome

Classifications

• G02B2207/101

  Nanooptics · CPC title

• G02B5/208 Primary

  for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation · CPC title

• G02B5/203

  having holographic or diffractive elements (diffraction gratings per se G02B5/18; holographic elements per se G02B5/32; generating the spectrum using diffraction elements G01J3/18) · CPC title

• G02B5/201

  in the form of arrays · CPC title

• B82Y20/00

  Nanooptics, e.g. quantum optics or photonic crystals · CPC title