Directed surface functionalization on selected surface areas of topographical features with nanometer resolution

US9297062B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9297062-B2
Application numberUS-201314071007-A
CountryUS
Kind codeB2
Filing dateNov 4, 2013
Priority dateOct 15, 2013
Publication dateMar 29, 2016
Grant dateMar 29, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method for making a single molecule receptor in a nanopore structure includes depositing a material by a physical vapor deposition (PVD) technique onto a selected interior surface of a nanochannel and functionalizing a surface of the material with a chemical compound having at least two functional groups. The material forms a patch having a diameter of about 3 to about 10,000 nanometers (nm). Also disclosed are embodiments of a nanopore structure including a single molecule receptor.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for making a single molecule receptor in a nanopore structure, the method comprising: depositing a material by a physical vapor deposition (PVD) technique onto a selected interior surface of a nanochannel, the material forming a raised patch having a diameter of about 1 to about 100 nanometers (nm) and extending from the selected area of the interior surface to the nanochannel's opening; and functionalizing a surface of the material with a chemical compound having at least two functional groups to form the single molecule receptor; wherein the single molecule receptor is a binding site with nanometer dimensions that binds to only a single molecule of an analyte in a complex sample. 2. The method of claim 1 , wherein the material a metal, a metal alloy, a semiconductor, an insulator, or any combination thereof. 3. The method of claim 2 , wherein the material is aluminum, platinum, tungsten, gold, silver, nickel, palladium, carbon, cobalt, or any combination thereof. 4. The method of claim 1 , wherein the PVD technique is pulsed laser deposition/ablation (PLD), sputtering, electron-beam deposition, pulsed electron deposition (PED), focused ion beam (FIB) deposition, or any combination thereof. 5. The method of claim 1 , wherein one of the at least two functional groups is a group that forms a contact product with the material and is an acyl halide group, an amine group, an amide group, an alcohol group, a carboxylate thiol group, a nitrile group, a phosphate group, a phosphine group, silane group, a sulfate group, a sulfide group, a sulfite group, thiol group, a thiolate group, or any combination thereof. 6. A method for making a single molecule receptor in a nanopore structure, the method comprising: depositing a material by a PVD technique onto a selected interior surface of a nanochannel, the material forming a raised patch having a diameter of about 1 to about 100 nm and a thickness of about 0.5 to about 10 nm and extending from the selected area of the interior surface to the nanochannel's opening; and functionalizing a surface of the material with a chemical compound having at least two functional groups to form the single molecule receptor; wherein the single molecule receptor is a binding site that binds to a single molecule of an analyte in a single binding event.

Assignees

Inventors

Classifications

  • Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors · CPC title

  • Investigating individual macromolecules, e.g. by translocation through nanopores (Coulter counters in general G01N15/12; fabrication methods for nanoscale apertures B81B1/00; sequencing of nucleic acids C12Q1/68) · CPC title

  • Sputtering · CPC title

  • Ion beam deposition (C23C14/46, C23C14/48 take precedence) · CPC title

  • Nanobiotechnology or nanomedicine, e.g. protein engineering or drug delivery · CPC title

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What does patent US9297062B2 cover?
A method for making a single molecule receptor in a nanopore structure includes depositing a material by a physical vapor deposition (PVD) technique onto a selected interior surface of a nanochannel and functionalizing a surface of the material with a chemical compound having at least two functional groups. The material forms a patch having a diameter of about 3 to about 10,000 nanometers (nm).…
Who is the assignee on this patent?
IBM, Globalfoundries Inc
What technology area does this patent fall under?
Primary CPC classification C23C14/22. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Mar 29 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).