System and method for protecting a dip tube

Patent metadata

Field	Value
Publication number	US-9296964-B2
Application number	US-201213344437-A
Country	US
Kind code	B2
Filing date	Jan 5, 2012
Priority date	Jan 5, 2012
Publication date	Mar 29, 2016
Grant date	Mar 29, 2016

Abstract

A system includes a dip tube configured to direct a gas toward a sump. The dip tube includes an inner surface and an outer surface. The system also includes a quench ring coupled to the dip tube. The quench ring is configured to provide a quench fluid flow to the sump over both the inner surface and the outer surface of the dip tube.

First claim

The invention claimed is:

1. A system, comprising:
a dip tube configured to direct a gas toward a sump, wherein the dip tube comprises an inner surface and an outer surface; and
a quench ring coupled to the dip tube, wherein the quench ring comprises an inner fluid outlet disposed above the inner surface and an outer fluid outlet disposed above the outer surface, the inner fluid outlet is configured to direct a quench fluid flow onto the inner surface of the dip tube to flow downwardly along the inner surface toward the sump, and the outer fluid outlet is configured to direct the quench fluid flow onto the outer surface of the dip tube to flow downwardly along the outer surface toward the sump.

2. The system of claim 1 , wherein the inner fluid outlet of the quench ring comprises a plurality of inner quench ring openings configured to provide an inner quench fluid flow to the inner surface, and the outer fluid outlet of the quench ring comprises a plurality of outer quench ring openings configured to provide an outer quench fluid flow to the outer surface.

3. The system of claim 2 , wherein the plurality of inner quench ring openings and the plurality of outer quench ring openings are angled to impart a swirling motion to the inner quench fluid flow and the outer quench fluid flow.

4. The system of claim 1 , comprising a partition disposed inside the quench ring, wherein the partition is configured to divide the quench fluid flow into an inner quench fluid flow configured to flow over the inner surface and an outer quench fluid flow configured to flow over the outer surface.

5. The system of claim 4 , comprising a flow baffle disposed in the quench ring, wherein the flow baffle is configured to direct the inner quench fluid flow against a hot face surface of the quench ring.

6. The system of claim 4 , wherein the partition comprises an inner partition opening configured to provide the inner quench fluid flow and an outer partition opening configured to provide the outer quench fluid flow.

7. The system of claim 6 , wherein the inner partition opening is configured to provide a first flow rate of the inner quench fluid flow and the outer partition opening is configured to provide a second flow rate of the outer quench fluid flow.

8. The system of claim 6 , wherein the inner partition opening and the outer partition opening each comprise a plurality of openings.

9. The system of claim 1 , wherein the quench fluid flow comprises at least one of water, or an inert gas, or a combination thereof.

10. The system of claim 1 , wherein the inner fluid outlet of the quench ring is configured to provide an inner quench fluid flow to the sump over the inner surface and the outer fluid outlet of the quench ring is configured to provide an outer quench fluid flow over the outer surface, wherein the inner quench fluid flow and the outer quench fluid flow are different from one another.

11. The system of claim 1 , comprising at least one of a quench unit, a gasifier, a reactor, or a partial oxidation system, or any combination thereof, having the dip tube and the quench ring.

12. The system of claim 1 , wherein the quench ring is configured to output the quench fluid flow from the inner and outer fluid outlets directly onto the respective inner and outer surfaces of the dip tube.

13. The system of claim 1 , wherein the inner fluid outlet is disposed adjacent the inner surface of the dip tube, and the outer fluid outlet is disposed adjacent the outer surface of the dip tube.

14. The system of claim 1 , wherein the dip tube extends at least partially into an interior chamber of the quench ring.

15. The system of claim 1 , wherein the quench ring is configured to output the quench fluid flow as a cascade or waterfall that falls downwardly along the inner and outer surfaces of the dip tube toward the sump.

16. The system of claim 1 , wherein a ratio of the quench fluid flow along the inner and outer surfaces of the dip tube is controlled to reduce a temperature gradient across the dip tube.

17. A system, comprising:
a gasifier, comprising:
a reaction chamber configured to convert a feedstock into a synthetic gas;
a quench chamber configured to cool the synthetic gas;
a sump;
a dip tube disposed downstream of the reaction chamber, wherein the dip tube comprises an inner surface and an outer surface; and
a quench ring comprising an inner fluid outlet disposed above the inner surface and an outer fluid outlet disposed above the outer surface, wherein the inner fluid outlet is configured to direct a quench fluid flow onto the inner surface of the dip tube to flow downwardly along the inner surface toward the sump, and the outer fluid outlet is configured to direct the quench fluid flow to the outer surface of the dip tube to flow downwardly along the outer surface toward the sump.

18. The system of claim 17 , wherein the inner fluid outlet of the quench ring comprises a plurality of inner quench ring openings configured to provide the quench fluid flow to the inner surface, and the outer fluid outlet of the quench ring comprises a plurality of outer quench ring openings configured to provide the quench fluid flow to the outer surface.

19. The system of claim 17 , comprising a partition disposed inside the quench ring, wherein the partition is configured to divide the quench fluid flow into an inner quench fluid flow configured to flow over the inner surface and an outer quench fluid flow configured to flow over the outer surface.

20. The system of claim 19 , wherein the partition comprises an inner partition opening configured to provide the inner quench fluid flow and an outer surface partition configured to provide the outer quench fluid flow.

21. The system of claim 19 , comprising:
a quench fluid valve configured to adjust a flow rate of the quench fluid flow to the quench ring; and
a controller configured to control the quench fluid valve to adjust the flow rate of the quench fluid flow.

22. A method, comprising:
gasifying a feedstock in a reaction chamber to generate a synthetic gas;
flowing the synthetic gas from the reaction chamber to a quench chamber through a dip tube, wherein the dip tube comprises an inner surface and an outer surface;
quenching the synthetic gas in the quench chamber to cool the synthetic gas, wherein quenching comprises providing a quench fluid flow from a quench ring coupled to the dip tube;
outputting the quench fluid flow through an inner fluid outlet of the quench ring above the inner surface of the dip tube;
outputting the quench fluid flow through an outer fluid outlet of the quench ring above the outer surface of the dip tube; and
protecting the dip tube by flowing the quench fluid flow over the inner surface of the dip tube via the inner fluid outlet and the outer surface of the dip tube via the outer fluid outlet, wherein the quench fluid flow moves downwardly along the inner and outer surfaces toward a sump.

23. The method of claim 22 , comprising dividing the quench fluid flow in the quench ring into an inner quench fluid flow configured to flow over the inner surface and an outer quench fluid flow configured to flow over the outer surface using a partition disposed inside the quench ring.

24. The method of claim 23 , comprising:
providing the inner quench fluid flow through an inner partition opening disposed in the partition; and
flowing an outer quench fluid flow through an outer partition opening dispo

Assignees

• Kumar Anand
• Marikatti Prashant
• Gen Electric

Inventors

• Kumar Anand
• Marikatti Prashant

Classifications

• C10J2300/1838

  Autothermal gasification by injection of oxygen or steam · CPC title

• C10J2300/0959

  Oxygen · CPC title

• Y02E20/18

  Integrated gasification combined cycle [IGCC], e.g. combined with carbon capture and storage [CCS] · CPC title

• C10J2300/0976

  as steam · CPC title

• C10J3/845 Primary

  Quench rings · CPC title