Device comprising a low dielectric loss borosilicate glass substrate and methods of making the same
US-2024400438-A1 · Dec 5, 2024 · US
US9296643B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9296643-B2 |
| Application number | US-201313889947-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 8, 2013 |
| Priority date | May 10, 2012 |
| Publication date | Mar 29, 2016 |
| Grant date | Mar 29, 2016 |
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Provided are a enamel composition, a preparation method thereof, and a cooking appliance. The enamel composition includes a glass frit comprising P 2 O 5 , SiO 2 , B 2 O 3 , Al 2 O 3 , R 2 O (where R is an alkali metal), a chemical property enhancement component, and an adhesion enhancement component. The chemical property enhancement component includes at least one of ZrO 2 and TiO 2 , and the adhesion enhancement component includes at least one of CoO, NiO, MnO 2 and Fe 2 O 3 .
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What is claimed is: 1. An enamel composition comprising: a glass frit comprising P 2 O 5 , SiO 2 , B 2 O 3 , Al 2 O 3 , R 2 O (where R is an alkali metal), a chemical property enhancement component, an adhesion enhancement component, F and a compound containing F, wherein the chemical property enhancement component comprises one of ZrO 2 and TiO 2 , and wherein the adhesion enhancement component comprises one of CoO, NiO, MnO 2 , and Fe 2 O 3 , wherein R 2 O comprises Na 2 O, K 2 O and Li 2 O, wherein the glass frit contains: 11.0 wt % to 17 wt % of P 2 O 5 , 29.6 wt % to 38.8 wt % of SiO 2 , 13.6 wt % to 19.6 wt % of B 2 O 3 , 3.8 wt % to 13.2 wt % of Al 2 O 3 , 1.8 wt % to 6.9 wt % of F and/or the compound containing F, 0.4 wt % to 1.6 wt % of Li 2 O, 5.3 wt % to 14.5 wt % of Na 2 O, 2.3 wt % to 4.5 wt % of K 2 O, 1.5 wt % to 4.5 wt % of the chemical property enhancement component, and 2 wt % to 7 wt % of the adhesion enhancement component. 2. The enamel composition according to claim 1 , wherein the chemical property enhancement component comprises ZrO 2 and TiO 2 . 3. The enamel composition according to claim 2 , wherein the adhesion enhancement component comprises CoO, NiO, MnO, and Fe 2 O 3 . 4. The enamel composition according to claim 1 , wherein the glass frit further comprises BaO, ZnO, CaO, and MgO. 5. The enamel composition according to claim 1 , wherein the glass frit further contains: 0.8 wt % to 4.1 wt % of ZrO 2 , 0.1 wt % to 1.5 wt % of TiO 2 , 1.8 wt % to 6.9 wt % of F and/or the compound containing F, 0.6 wt % to 2.6 wt % of CoO, 0.1 wt % to 0.6 wt % of MnO 2 , 0.3 wt % to 1.4 wt % of NiO, and 0.1 wt % to 4.3 wt % of Fe 2 O 3 . 6. A method of preparing an enamel composition, the method comprising: preparing a glass frit material comprising P 2 O 5 , SiO 2 , B 2 O 3 , Al 2 O 3 , R 2 O (where R is an alkali metal), a chemical property enhancement component, and an adhesion enhancement component, and one of F and a compound containing F; melting the glass frit material; quenching the melted P 2 O 5 , SiO 2 , B 2 O 3 , Al 2 O 3 , R 2 O, a chemical property enhancement component, and an adhesion enhancement component to form the enamel composition, wherein the chemical property enhancement component comprises ZrO 2 and TiO 2 , and wherein the adhesion enhancement component comprises CoO, NiO, MnO 2 , and Fe 2 O 3 , wherein the glass frit contains: 11.0 wt % to 17 wt % of P 2 O 5 , 29.6 wt % to 38.8 wt % of SiO 2 , 13.6 wt % to 19.6 wt % of B 2 O 3 , 0.4 wt % to 1.6 wt % of Li 2 O, 5.3 wt % to 14.5 wt % of Na 2 O, 2.3 wt % to 4.5 wt % of K 2 O, 3.8 wt % to 13.2 wt % of Al 2 O 3 , 0.8 wt % to 4.1 wt % of ZrO 2 , 0.1 wt % to 1.5 wt % of TiO 2 , 1.8 wt % to 6.9 wt % of F and/or the compound containing F, 0.6 wt % to 2.6 wt % of CoO, 0.1 wt % to 0.6 wt % of MnO 2 , 0.3 wt % to 1.4 wt % of NiO, and 0.1 wt % to 4.3 wt % of Fe 2 O 3 . 7. A method of coating an enamel composition, the method comprising: preparing a substrate; coating the enamel composition on the substrate; and firing the enamel composition, wherein the enamel composition comprises a glass frit containing 11.0 wt % to 17 wt % of P 2 O 5 , 29.6 wt % to 38.8 wt % of SiO 2 , 13.6 wt % to 19.6 wt % of B 2 O 3 , 0.4 wt % to 1.6 wt % of Li 2 O, 5.3 wt % to 14.5 wt % of Na 2 O, 2.3 wt % to 4.5 wt % of K 2 O, 3.8 wt % to 13.2 wt % of Al 2 O 3 , 0.8 wt % to 4.1 wt % of ZrO 2 , 0.1 wt % to 1.5 wt % of TiO 2 , 1.8 wt % to 6.9 wt % of F and/or the compound containing F, 0.6 wt % to 2.6 wt % of CoO, 0.1 wt % to 0.6 wt % of MnO 2 , 0.3 wt % to 1.4 wt % of NiO, and 0.1 wt % to 4.3 wt % of Fe 2 O 3 . 8. The method according to claim 7 , wherein, after the firing of the enamel composition is performed, the glass frit contains: 11.0 wt % to 17 wt % of P 2 O 5 , 29.6 wt % to 38.8 wt % of SiO 2 , 13.6 wt % to 19.6 wt % of B 2 O 3 , 0.4 wt % to 1.6 wt % of Li 2 O, 5.3 wt % to 14.5 wt % of Na 2 O, 2.3 wt % to 4.5 wt % of K 2 O, 3.8 wt % to 13.2 wt % of Al 2 O 3 , 0.8 wt % to 4.1 wt % of ZrO 2 , 0.1 wt % to 1.5 wt % of TiO 2 , 1.8 wt % to 6.9 wt % of F and/or the compound containing F, 0.6 wt % to 2.6 wt % of CoO, 0.1 wt % to 0.6 wt % of MnO 2 , 0.3 wt % to 1.4 wt % of NiO, and 0.1 wt % to 4.3 wt % of Fe 2 O 3 . 9. A cooking appliance, comprising; a cavity defining a cooking chamber; a door selectively opening or closing the cooking chamber; a heating source to heat foods within the cooking chamber; and a coating layer comprising the enamel composition according to claim 1 , wherein the coating layer is coated on an inner surface of the cavity. 10. A cooking appliance, comprising; a cavity defining a cooking chamber; a door selectively opening or closing the cooking chamber; a heating source to heat foods within the cooking chamber; and a coating layer comprising the enamel composition according to claim 1 , wherein the coating layer is coated on a back surface of the door facing the cooking chamber in a state where an inside of the cooking chamber is covered by the door.
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