Method of manufacturing printed circuit board
US-2024414849-A1 · Dec 12, 2024 · US
US9295152B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9295152-B2 |
| Application number | US-201514686548-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 14, 2015 |
| Priority date | Mar 20, 2012 |
| Publication date | Mar 22, 2016 |
| Grant date | Mar 22, 2016 |
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A device comprising a single crystal diamond substrate with a buried electrically conducting layer with μm square openings spaced apart milled into the diamond by ablating the carbon above wherein the step of ablating uses a diode pumped tripled Nd:YAG laser at 355 nm and wherein the square openings have electrical contacts and wherein the resistance measured between the square openings is dominated by the buried electrically conducting layer and on the order of about 1 kΩ.
Opening claim text (preview).
What we claim is: 1. A device comprising: a single crystal diamond substrate having a first carbon surface; an electrically conducting carbon layer beneath the first carbon surface formed by implanting the diamond with a beam of 180 KeV followed by 150 KeV C + ions at fluencies of 4×10 15 ions/cm 2 and 5×10 15 ions/cm 2 respectively; and a layer of ablated single crystal diamond wherein the layer lies between the electrically conducting layer and the first carbon surface. 2. The device of claim 1 wherein the layer of ablated single crystal diamond is formed using a diode pumped tripled Nd:YAG laser at 355 nm and wherein the laser pulse duration is about 35 ns with a pulse frequency of 10 kHz. 3. The device of claim 2 wherein the Nd:YAG laser is focused at about 0.5 mm above the first carbon surface. 4. The device of claim 3 wherein the laser is defocused to an about 9 μm diameter beam spot laser output pulses of 17 μJ. 5. The device of claim 4 wherein the implanting occurs at 7 degrees to the C(100) axis; wherein the electrically conducting carbon layer is about 50 nm beneath the first carbon surface; and wherein the electrically conducting carbon layer is about 200 nm thick. 6. The device of claim 5 wherein there is no damage at the first carbon surface. 7. The device of claim 6 further including an electrical contact to the electrically conducting carbon layer. 8. A device comprising: a single crystal diamond substrate with a buried electrically conducting layer with two 300×300 μm square openings spaced about 2.45 mm apart milled into the diamond by ablating the carbon above wherein the step of ablating uses a diode pumped tripled Nd:YAG laser at 355 nm wherein the Nd:YAG laser was focused about 0.5 mm above the first carbon surface the defocusing to an about 9 μm diameter beam spot laser output pulses of 17 μJ wherein the laser pulse duration is about 35 ns with a pulse frequency of 10 kHz and wherein the square openings have electrical contacts and wherein the resistance measured between the square openings is dominated by the buried electrically conducting layer and on the order of about 1 kΩ.
Diamond · CPC title
Diamond · CPC title
Silicon carbide · CPC title
Electricity · mapped topic
Operations & Transport · mapped topic
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