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Method of forming pattern and laminate
US9291908B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9291908-B2 |
| Application number | US-201514726780-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 1, 2015 |
| Priority date | Sep 26, 2011 |
| Publication date | Mar 22, 2016 |
| Grant date | Mar 22, 2016 |
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Abstract
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According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of forming a pattern, comprising: forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, the thermally crosslinkable molecule having a group that attaches to the substrate and a group that chemically binds to another material by heating; forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, the photosensitive compositi…
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Operations & Transport · mapped topic
- G03F7/40Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US9291908B2 cover?
- According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photose…
- Who is the assignee on this patent?
- Toshiba Kk
- What technology area does this patent fall under?
- Primary CPC classification G03F7/40. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 22 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).