Resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9291893-B2
Application number	US-201113281145-A
Country	US
Kind code	B2
Filing date	Oct 25, 2011
Priority date	Oct 26, 2010
Publication date	Mar 22, 2016
Grant date	Mar 22, 2016

Abstract

A resist composition contains; a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator,

wherein R aa1 represents a hydrogen atom and a methyl group; A aa1 represents an optionally substituted C 1 to C 6 alkanediyl group etc.; R aa2 represents an optionally substituted C 1 to C 18 aliphatic hydrocarbon group; R ab1 represents a hydrogen atom and a methyl group; A ab1 represents a single bond, an optionally substituted C 1 to C 6 alkanediyl group etc.; W 1 represents an optionally substituted C 4 to C 24 alicyclic hydrocarbon group; n represents 1 or 2; A ab2 in each occurrence independently represents an optionally substituted C 1 to C 6 aliphatic hydrocarbon group; R ab2 in each occurrence independently represents a C 1 to C 12 fluorinated alkyl group.

First claim

What is claimed is:

1. A resist composition comprising;
a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and
an acid generator,

wherein R aa1 represents a hydrogen atom or a methyl group;
A aa1 represents an optionally substituted C 1 to C 6 alkanediyl group or a group represented by the formula (a-1);

wherein s represents 0 or 1;
X 10 and X 11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group;
A 10 , A 11 and A 12 independently represent an optionally substituted C 1 to C 5 aliphatic hydrocarbon group;
* represents a bond to —O—C(O)—R aa2 ;
R aa2 represents a perfluoro C 1 to C 18 aliphatic hydrocarbon group;

wherein R ab1 represents a hydrogen atom or a methyl group;
A ab1 represents a single bond, an optionally substituted C 1 to C 6 alkanediyl group or a group represented by the formula (a-2);

wherein t represents 0 or 1;
X 30 and X 31 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group;
A 30 and A 31 independently represent an optionally substituted C 1 to C 5 aliphatic hydrocarbon group;
A 32 represents an optionally substituted C 1 to C 5 aliphatic hydrocarbon group or a single bond;
* represents a bond to W 1 ;
wherein —W 1 -(A ab2 -R ab2 ) n is a group represented by the formula (W 1 -1) or a group represented by the formula (W 1 -2);

wherein one or more —CH 2 — contained in the adamantane ring may be replaced by —O— or —CO—;
one or more hydrogen atom contained in the adamantane ring may be replaced by a hydroxy group, a C 1 to C 12 alkyl group, a C 1 to C 12 alkoxy group, a C 3 to C 12 alicyclic hydrocarbon group or a C 6 to C 10 aromatic hydrocarbon group;
provided that a total carbon number of the adamantane ring and its substituent is 36 or less;
* represents a bond to A ab1 ;
A ab2 in each occurrence independently represents an optionally substituted C 1 to C 6 aliphatic hydrocarbon group, and one or more —CH 2 — contained in the aliphatic hydrocarbon group may be replaced by —O— or —CO—;
R ab2 in each occurrence independently represents a C 1 to C 12 fluorinated alkyl group, and one or more hydrogen atom contained in the fluorinated alkyl group may be replaced by a hydroxy group or a hydroxymethyl group; and
n represents 1 or 2;

wherein one or more —CH 2 — contained in the cyclohexane ring may be replaced by —O— or —CO—;
one or more hydrogen atom contained in the cyclohexane ring may be replaced by a hydroxy group, a C 1 to C 12 alkyl group, a C 1 to C 12 alkoxy group, a C 3 to C 12 alicyclic hydrocarbon group or a C 6 to C 10 aromatic hydrocarbon group;
provided that a total carbon number of the cyclohexane ring and its substituent is 36 or less;
* represents a bond to A ab1 ; and
A ab2 , R ab2 and n have the same definition of the above.

2. The resist composition according to claim 1 , wherein A aa1 of the formula (aa) is a C 1 to C 6 alkanediyl group.

3. The resist composition according to claim 1 , wherein A aa1 of the formula (aa) is an ethylene group.

4. The resist composition according to claim 1 , wherein the acid generator is an acid generator represented by the formula (B1);

wherein Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group;
L b1 represents an optionally substituted C 1 to C 17 divalent aliphatic hydrocarbon group, and one or more —CH 2 — contained in the aliphatic hydrocarbon group may be replaced by —O— or —CO—;
Y represents an optionally substituted C 1 to C 18 aliphatic hydrocarbon group, and one or more —CH 2 — contained in the aliphatic hydrocarbon group may be replaced by —O—, —CO— or —SO 2 —; and
Z + represents an organic cation.

5. The resist composition according to claim 4 , wherein Y of the formula (B1) is an optionally substituted C 3 to C 18 alicyclic hydrocarbon group.

6. The resist composition according to claim 1 , further comprising a resin which is insoluble or poorly soluble in aqueous alkali solution, but becomes soluble in aqueous alkali solution by the action of acid.

7. The resist composition according to claim 1 , further comprising a solvent.

8. A method for producing a resist pattern comprising steps of;
(1) applying the resist composition according to claim 1 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer; and
(5) developing the heated composition layer.

Assignees

• Masuyama Tatsuro
• Yamamoto Satoshi
• Ichikawa Koji
• Sumitomo Chemical Co

Inventors

• Masuyama Tatsuro
• Yamamoto Satoshi
• Ichikawa Koji

Classifications

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• G03F7/0046 Primary

  with perfluoro compounds, e.g. for dry lithography (G03F7/0048 takes precedence) · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title