Beam pattern projector with modulating array of light sources

US9291806B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9291806-B2
Application numberUS-201213529991-A
CountryUS
Kind codeB2
Filing dateJun 21, 2012
Priority dateJun 21, 2012
Publication dateMar 22, 2016
Grant dateMar 22, 2016

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  1. Title

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  5. First independent claim

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Abstract

Official abstract text for this publication.

This disclosure provides systems, methods and apparatus for a beam pattern projection device that includes a modulating array of light sources. In one aspect, the beam pattern projection device may include a lens. The array of light sources can be positioned such that its output plane is substantially one focal length away from the lens along the optical axis. The output of the array of light sources can be controllable to create an adjustable beam pattern out of a plurality of possible beam patterns that are each associated with a power level of each light source in the array of light sources. The device can project at a distance the adjustable beam pattern created by the array of light sources.

First claim

Opening claim text (preview).

What is claimed is: 1. A beam pattern projection device comprising: a lens, the lens having a focal length and an optical axis; and a first array of light sources having an output plane that is positioned substantially one focal length away from the lens along the optical axis such that light from each point on the output plane of the first array of light sources is substantially collimated by the lens, the output of the first array of light sources being controllable to create a first adjustable beam pattern out of a first plurality of possible beam patterns, each of the first plurality of possible beam patterns being associated with a power level of each light source in the first array of light sources, wherein the device is configured to project at a distance the first adjustable beam pattern created by the first array of light sources, wherein the first array of light sources includes a first array of corresponding reflectors, and wherein there is a one-to-one correspondence between each of the light sources in the first array of light sources and each of the reflectors in the first array of reflectors. 2. The beam pattern projection device of claim 1 , wherein one or more of the reflectors in the first array of reflectors include etendue-preserving reflectors. 3. The beam pattern projection device of claim 2 , wherein the output plane of the first array of light sources corresponds to an output plane of the first array of etendue-preserving reflectors. 4. The beam pattern projection device of claim 1 , wherein each reflector in the first array of reflectors is configured to substantially direct a beam of light from a corresponding light source into a clear aperture size of the lens. 5. The beam pattern projection device of claim 1 , wherein each reflector in the first array of reflectors is configured to substantially direct a beam of light from a corresponding light source into an acceptance cone of the lens. 6. The beam pattern projection device of claim 1 , wherein the device does not include a mechanism for adjusting the focus of the device. 7. The beam pattern projection device of claim 1 , wherein the output of each of the light sources in the first array of light sources is independently controllable. 8. The beam pattern projection device of claim 7 , wherein each of the light sources in the first array of light sources is independently controllable between an ON state and an OFF state. 9. The beam pattern projection device of claim 8 , wherein each of the light sources in the first array of light sources is independently controllable to have a range of power levels between the ON state and the OFF state. 10. The beam pattern projection device of claim 1 , further comprising a controller for controlling the output of the first array of light sources to select the first beam pattern out of the first plurality of possible beam patterns. 11. A beam pattern projection device of comprising: a lens, the lens having a focal length and an optical axis; a first array of light sources having an output plane that is positioned substantially one focal length away from the lens along the optical axis such that light from each point on the output plane of the first array of light sources is substantially collimated by the lens, the output of the first array of light sources being controllable to create a first adjustable beam pattern out of a first plurality of possible beam patterns, each of the first plurality of possible beam patterns being associated with a power level of each light source in the first array of light sources; at least a second array of light sources positioned substantially one focal length away from the lens, the output of the second array of light sources being controllable to create a second beam pattern out of a second plurality of possible beam patterns; and a combining optical element to combine the light from the first array of light sources and the light from the second array of light sources, wherein the device is configured to project at a distance the first adjustable beam pattern created by the first array of light sources. 12. The beam pattern projection device of claim 11 wherein the combining optical element includes a beam splitter. 13. The beam pattern projection device of claim 11 , wherein the light sources in the first array of light sources are configured to output light of a first color and the light sources in the second array of light sources are configured to output light of a second color that is different from the first color. 14. The beam pattern projection device of claim 11 , wherein the second array of light sources includes a second array of corresponding reflectors. 15. The beam pattern projection device of claim 11 , further comprising a controller for controlling the output of the first array of light sources to select the first beam pattern out of the first plurality of possible beam patterns, and for controlling the output of the second array of light sources to select the second beam pattern out of the second plurality of possible beam patterns. 16. A beam pattern projection device comprising: a plurality of light production means for controllably creating any of a plurality of beams of light to form a near-field beam pattern; and focusing means for reducing the divergence of the plurality of beams of light that are created by the plurality of light production means and transforming the plurality of beams so that a far field beam pattern corresponds to the near-field beam pattern, the focusing means being associated with a focal length, and the focusing means being positioned one focal length away from the light production means to substantially collimate each of the plurality of beams of light, wherein the device is configured to project at a distance whichever of the plurality of beam patterns is created by the light production means, wherein the plurality of light production means include a plurality of corresponding light reflection means for reflecting the light, and wherein there is a one-to-one correspondence between each of the light production means and each of the light reflection means. 17. The beam pattern projection device of claim 16 , wherein the plurality of light production means comprise an array of light sources, the focusing means comprises a lens, and the plurality of light reflection means comprise an array of etendue-preserving reflectors. 18. A method of fabricating a beam pattern projection device, the method comprising: providing a lens having a focal length and an optical axis; providing an array of light sources having an output plane, the output of the array of light sources being controllable to create any of a first plurality of beam patterns; and disposing the output plane of the array of light sources substantially one focal length away from the lens along the optical axis such that light from each point on the output plane of the array of light sources is substantially collimated by the lens, and such that the device is capable of projecting at a distance whichever of the first plurality of beam patterns is created by the array of light sources, wherein the first array of light sources includes a first array of corresponding reflectors, and wherein there is a one-to-one correspondence between each of the light sources in the first array of light sources and each of the reflectors in the first array of reflectors. 19. The method of claim 18 , wherein one or more of the reflectors in the first array of reflectors include etendue-preser

Assignees

Inventors

Classifications

  • Mechanical Engineering · mapped topic

  • Mechanical Engineering · mapped topic

  • of lens shape · CPC title

  • Mechanical Engineering · mapped topic

  • using crossed beamsplitting surfaces, e.g. cross-dichroic cubes or X-cubes · CPC title

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What does patent US9291806B2 cover?
This disclosure provides systems, methods and apparatus for a beam pattern projection device that includes a modulating array of light sources. In one aspect, the beam pattern projection device may include a lens. The array of light sources can be positioned such that its output plane is substantially one focal length away from the lens along the optical axis. The output of the array of light s…
Who is the assignee on this patent?
Holman Robert L, Sampsell Matthew B, Qualcomm Mems Technologies Inc
What technology area does this patent fall under?
Primary CPC classification G02B19/0066. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 22 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).