Fabricating self-formed nanometer pore array at wafer scale for DNA sequencing

Patent metadata

Field	Value
Publication number	US-9290806-B2
Application number	US-201514608675-A
Country	US
Kind code	B2
Filing date	Jan 29, 2015
Priority date	May 11, 2012
Publication date	Mar 22, 2016
Grant date	Mar 22, 2016

Abstract

A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.

First claim

What is claimed is:

1. A method of forming a structure, the method comprising:
providing a substrate having a nanopillar vertically positioned on the substrate, wherein a bottom layer is formed beneath the substrate;
providing a top layer formed on top of the substrate and on top of the nanopillar, wherein a cover layer covers the top layer and the nanopillar;
forming a window through the bottom layer and through the substrate, wherein the window ends at the top layer; and
forming a nanopore through the top layer by removing all of the cover layer and the nanopillar, such that none of the cover layer remains on the top layer.

2. The method of claim 1 , further comprising an array of nanopores formed through the top layer by a plurality of nanopillars;
wherein the array of nanopores are formed by:
the top layer being formed on top of the substrate and the plurality of nanopillars in which the cover layer covers the top layer and the plurality of nanopillars;
a plurality of windows formed through the bottom layer and formed through the substrate in which the plurality of windows respectively correspond on a one to one basis to the plurality of nanopillars;
removing each of the plurality of nanopillars and the cover layer, the array of nanopores remain in the top layer at each location of the plurality of nanopillars.

3. The method of claim 1 , wherein the substrate is silicon.

4. The method of claim 1 , wherein the nanopillar is at least one of silicon, silicon dioxide, and carbon nanotube.

5. The method of claim 1 , wherein a diameter of the nanopore formed through the top layer corresponds to a diameter of the nanopillar; and
wherein a depth of the nanopore corresponds to a thickness of the top layer.

6. A method of forming a structure, the method comprising:
providing a substrate having a nanopillar vertically positioned on the substrate, wherein a bottom layer formed beneath the substrate;
providing a plurality of top layers formed on top of the substrate and on top of the nanopillar, wherein a cover layer covers the plurality of top layers and the nanopillar;
forming a window through the bottom layer and formed through the substrate, wherein the window ends at the plurality of top layers; and
forming a nanopore through the plurality of top layers by removing all of the cover layer and the nanopillar, such that none of the cover layer remains on the plurality of top layers.

7. The method of claim 6 , further comprising an array of nanopores formed through the plurality of top layers by a plurality of nanopillars;
wherein the array of nanopores are formed by:
the plurality of top layers being formed on top of the substrate and the plurality of nanopillars in which the cover layer covers the plurality of top layers and the plurality of nanopillars;
a plurality of windows formed through the bottom layer and formed through the substrate in which the plurality of windows respectively correspond on a one to one basis to the plurality of nanopillars;
removing each of the plurality of nanopillars and the cover layer, the array of nanopores remain in the plurality of top layers at each location of the plurality of nanopillars.

8. The method of claim 6 , wherein the substrate is silicon.

9. The method of claim 6 , wherein the nanopillar is at least one of silicon, silicon dioxide, and carbon nanotube.

10. The method of claim 6 , wherein a diameter of the nanopore formed through the plurality of top layers corresponds to a diameter of the nanopillar; and
wherein a depth of the nanopore corresponds to a thickness of the plurality of top layers.

11. A method of forming a structure, the method comprising:
providing a substrate having a top layer and a bottom layer;
forming a hole through the top layer, wherein the hole is coated with a coating to capture a carbon nanotube in the hole, the carbon nanotube being captured to be positioned in the hole;
forming a window through the bottom layer and through the substrate, wherein the window ends at the top layer;
forming a cover layer that covers the top layer and the carbon nanotube positioned in the hole, wherein the cover layer is not formed in the hole of the top layer; and
forming a nanopore through the cover layer by removing the carbon nanotube from the cover layer.

12. The method of claim 11 , further comprising an array of nanopores formed through the cover layer by a plurality of carbon nanotubes;
wherein the array of nanopores are formed by:
a plurality of windows formed through the bottom layer and formed through the substrate in which the plurality of windows are to respectively correspond on a one to one basis to the plurality of carbon nanotubes;
a plurality of holes coated with the coating to respectively capture the plurality of carbon nanotubes in the plurality of holes, the cover layer being formed on top of the top layer and the plurality of carbon nanotubes in which the cover layer covers the top layer and the plurality of carbon nanotubes;
removing each of the plurality of carbon nanotubes, the array of nanopores remain in the cover layer at each location of the plurality of carbon nanotubes.

13. The method of claim 11 , wherein the substrate is silicon.

14. The method of claim 11 , wherein a diameter of the nanopore formed through the cover layer corresponds to a diameter of the carbon nanotube; and
wherein a depth of the nanopore corresponds to a thickness of the cover layer.

Assignees

• IBM
• Globalfoundries Inc

Inventors

• Stolovitzky Gustavo A
• Wang Deqiang

Classifications

• Y10S977/742

  Carbon nanotubes, CNTs · CPC title

• B81C1/00087

  Holes · CPC title

• C12Q1/6869

  Methods for sequencing · CPC title

• C12Q1/6874 Primary

  involving nucleic acid arrays, e.g. sequencing by hybridisation · CPC title

• Y10S977/904

  for medical, immunological, body treatment, or diagnosis · CPC title