Mask and mask assembly having the same

US9289798B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9289798-B2
Application numberUS-201313789343-A
CountryUS
Kind codeB2
Filing dateMar 7, 2013
Priority dateMay 8, 2012
Publication dateMar 22, 2016
Grant dateMar 22, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mask having both ends supported on a frame when a tensile force is applied in a first direction includes: a mask main body unit having a band form extended in the first direction; a plurality of pattern units including a plurality of pattern slits extended and opened in the first direction and separately disposed in a second direction crossing the first direction, and disposed in the mask main body unit in the first direction; and a plurality of dummy units including a plurality of dummy slits separated from each other with the pattern units therebetween, disposed in the mask main body unit, extended and opened in the first direction, and separately disposed in the second direction.

First claim

Opening claim text (preview).

What is claimed is: 1. A mask having both ends supported on a frame, said mask comprising: a mask main body unit having a length extending in a first direction and a width smaller than the length and extending in a second direction crossing the first direction; a plurality of pattern units disposed one after another in the first direction on the mask main body unit, each pattern unit including a plurality of pattern slits having a length extending in the first direction and a width smaller than the length and extending in the second direction; and two dummy units separated with respect to each other with the pattern units therebetween, each dummy unit including a plurality of dummy slits, each said dummy slit having a length extending in the first direction and a width smaller than the length and extending in the second direction; wherein a length extending in the first direction of a dummy slit disposed in an outer area of the dummy unit in the second direction from among the plurality of dummy slits is shorter than a length extending in the first direction of a dummy slit disposed in a center area of the dummy unit in the second direction. 2. The mask of claim 1 , wherein the plural dummy slits are disposed in the outer area of the dummy unit in the second direction, and the length in the first direction of said dummy unit becomes sequentially shorter as a distance between said each dummy slit and an outer side of the dummy unit becomes smaller. 3. The mask of claim 2 , wherein a number of dummy slits that are disposed in the outer area in the second direction is in a range of 5 to 10. 4. The mask of claim 3 , wherein five dummy slits are disposed in the outer area in the second direction; and wherein a length, in the first direction, between ends of neighboring dummy slits from among the dummy slits disposed, one after another, in the outer area in the second direction is five times a length in the second direction between the neighboring dummy slits. 5. The mask of claim 4 , wherein a width in the second direction of the dummy slit disposed in an outer area in the second direction is twice a width in the second direction of the dummy slit disposed in a center area in the second direction. 6. The mask of claim 3 , wherein five dummy slits are disposed one after another in the outer area in the second direction; and wherein a length in the first direction between ends of neighboring dummy slits from among the dummy slits that are disposed one after another in the outer area in the second direction is six times a length in the second direction between the neighboring dummy slits. 7. The mask of claim 3 , wherein five dummy slits are disposed one after another in the outer area in the second direction; and wherein a length in the first direction between ends of neighboring dummy slits from among the dummy slits that are disposed one after another in the outer area in the second direction is twice a length in the second direction between the neighboring dummy slits. 8. The mask of claim 3 , wherein ten dummy slits are disposed one after another in the outer area in the second direction; and wherein a length in the first direction between ends of neighboring dummy slits from among the dummy slits disposed one after another in the outer area in the second direction is five times a length in the second direction between the neighboring dummy slits. 9. A mask assembly, comprising a frame including an opening and a mask, said mask having both ends supported on the frame, said mask comprising: a mask main body unit having a length extending in a first direction and a width smaller than the length and extending in a second direction crossing the first direction; a plurality of pattern units disposed one after another in the first direction on the mask main body unit, each pattern unit including a plurality of pattern slits having a length extending in the first direction and a width smaller than the length and extending in the second direction, the plurality of pattern units being provided in the opening in the frame; and two dummy units separated with respect to each other with the pattern units therebetween, each dummy unit including a plurality of dummy slits, each said dummy slits having a length extending in the first direction and a width smaller than the length and extending in the second direction; wherein a length extending in the first direction of a dummy slit disposed in an outer area of the dummy unit in the second direction from among the plurality of dummy slits is shorter than a length extending in the first direction of a dummy slit disposed in a center area of the dummy unit in the second direction. 10. The mask assembly of claim 9 , wherein a length, extending in the first direction, of a dummy slit disposed in an outer area in the second direction from among the plurality of dummy slits is shorter than a length, extending in the first direction, of a dummy slit disposed in a center area in the second direction. 11. The mask assembly of claim 10 , wherein plural dummy slits are disposed one after another in the outer area in the second direction, and the length of each dummy slit, extending in the first direction, becomes sequentially shorter as said each dummy slit is closer to an outer side of the dummy unit in the second direction. 12. The mask assembly of claim 11 , wherein a number of dummy slits that are disposed one after another in the outer area in the second direction is in a range of 5 to 10. 13. The mask assembly of claim 12 , wherein five dummy slits are disposed one after another in the outer area in the second direction; and wherein a length, in the first direction, between ends of neighboring dummy slits from among the dummy slits disposed in the outer area in the second direction is five times a length in the second direction between the neighboring dummy slits. 14. The mask assembly of claim 13 , wherein a width in the second direction of the dummy slits disposed one after another in an outer area in the second direction is twice a width in the second direction of the dummy slits disposed in a center area in the second direction. 15. The mask assembly of claim 12 , wherein five dummy slits are disposed one after another in the outer area in the second direction; and wherein a length in the first direction between ends of neighboring dummy slits from among the dummy slits that are disposed one after another in the outer area in the second direction is six times a length in the second direction between the neighboring dummy slits. 16. The mask assembly of claim 12 , wherein five dummy slits are disposed one after another in the outer area in the second direction; and wherein a length in the first direction between ends of neighboring dummy slits from among the dummy slits that are disposed one after another in the outer area in the second direction is twice a length in the second direction between the neighboring dummy slits. 17. The mask assembly of claim 12 , wherein ten dummy slits are disposed one after another in the outer area in the second direction; and wherein a length in the first direction between ends of neighboring dummy slits from among the dummy slits disposed one after another in the outer area in the second direction is five times a length in the second direction between the neighboring dummy slits. 18. The mask assembly of claim 9 , wherein the two dummy units are disposed on the frame.

Assignees

Inventors

Classifications

  • B05C21/005Primary

    Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • Electricity · mapped topic

  • H10K71/00Primary

    Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • using selective deposition, e.g. using a mask · CPC title

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What does patent US9289798B2 cover?
A mask having both ends supported on a frame when a tensile force is applied in a first direction includes: a mask main body unit having a band form extended in the first direction; a plurality of pattern units including a plurality of pattern slits extended and opened in the first direction and separately disposed in a second direction crossing the first direction, and disposed in the mask mai…
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification B05C21/005. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 22 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).