Method for producing compound semiconductor, method for manufacturing photoelectric conversion device, and solution for forming semiconductor
US-9023680-B2 · May 5, 2015 · US
US9287434B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9287434-B2 |
| Application number | US-201214129684-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 18, 2012 |
| Priority date | Jun 27, 2011 |
| Publication date | Mar 15, 2016 |
| Grant date | Mar 15, 2016 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Methods for producing a semiconductor layer and for producing a photoelectric conversion device, semiconductor raw material are disclosed. An embodiment of the method for producing a semiconductor layer includes: forming a film containing a metal element and an oxygen element; generating oxygen gas by heating the film; and forming a semiconductor layer containing a metal chalcogenide from the film by allowing the metal element to react with a chalcogen element. Another embodiment of the method includes forming a lower film containing a metal element; forming an upper film, which contains the metal element and a substance that contains oxygen, on the lower film; generating oxygen gas by heating the substance; and forming a semiconductor layer containing a metal chalcogenide from the lower film and the upper film by allowing a chalcogen element to react with the metal element in the lower film and the upper film.
Opening claim text (preview).
The invention claimed is: 1. A method for producing a semiconductor layer, the method comprising: forming a lower film containing a metal element; forming an upper film on the lower film, the upper film containing the metal element and a substance that contains oxygen element; generating oxygen gas by heating the upper film; and forming a semiconductor layer containing a metal chalcogenide from the lower film and the upper film by allowing a chalcogen element to react with the metal element in the lower film and the upper film, wherein the substance contains an alkali metal element. 2. The method for producing a semiconductor layer according to claim 1 , wherein at least one of the lower film and the upper film contains the chalcogen element. 3. The method for producing a semiconductor layer according to claim 1 , wherein an atmosphere contains the chalcogen element when forming the semiconductor layer. 4. A method for producing a photoelectric conversion device, the method comprising: forming a first semiconductor layer by the method for producing the semiconductor layer according to claim 1 ; and forming a second semiconductor layer having a conductivity type different from the first semiconductor layer, and electrically connected to the first semiconductor layer.
being chalcogenide semiconductor materials not being oxides, e.g. ternary compounds · CPC title
being Group IIB-VIA materials · CPC title
consisting of two layers · CPC title
being conductive materials · CPC title
being chalcogenide semiconducting materials not being oxides, e.g. ternary compounds · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.