Method for producing semiconductor layer, method for producing photoelectric conversion device, and semiconductor starting material

US9287434B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9287434-B2
Application numberUS-201214129684-A
CountryUS
Kind codeB2
Filing dateJun 18, 2012
Priority dateJun 27, 2011
Publication dateMar 15, 2016
Grant dateMar 15, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods for producing a semiconductor layer and for producing a photoelectric conversion device, semiconductor raw material are disclosed. An embodiment of the method for producing a semiconductor layer includes: forming a film containing a metal element and an oxygen element; generating oxygen gas by heating the film; and forming a semiconductor layer containing a metal chalcogenide from the film by allowing the metal element to react with a chalcogen element. Another embodiment of the method includes forming a lower film containing a metal element; forming an upper film, which contains the metal element and a substance that contains oxygen, on the lower film; generating oxygen gas by heating the substance; and forming a semiconductor layer containing a metal chalcogenide from the lower film and the upper film by allowing a chalcogen element to react with the metal element in the lower film and the upper film.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a semiconductor layer, the method comprising: forming a lower film containing a metal element; forming an upper film on the lower film, the upper film containing the metal element and a substance that contains oxygen element; generating oxygen gas by heating the upper film; and forming a semiconductor layer containing a metal chalcogenide from the lower film and the upper film by allowing a chalcogen element to react with the metal element in the lower film and the upper film, wherein the substance contains an alkali metal element. 2. The method for producing a semiconductor layer according to claim 1 , wherein at least one of the lower film and the upper film contains the chalcogen element. 3. The method for producing a semiconductor layer according to claim 1 , wherein an atmosphere contains the chalcogen element when forming the semiconductor layer. 4. A method for producing a photoelectric conversion device, the method comprising: forming a first semiconductor layer by the method for producing the semiconductor layer according to claim 1 ; and forming a second semiconductor layer having a conductivity type different from the first semiconductor layer, and electrically connected to the first semiconductor layer.

Assignees

Inventors

Classifications

  • being chalcogenide semiconductor materials not being oxides, e.g. ternary compounds · CPC title

  • being Group IIB-VIA materials · CPC title

  • consisting of two layers · CPC title

  • being conductive materials · CPC title

  • being chalcogenide semiconducting materials not being oxides, e.g. ternary compounds · CPC title

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What does patent US9287434B2 cover?
Methods for producing a semiconductor layer and for producing a photoelectric conversion device, semiconductor raw material are disclosed. An embodiment of the method for producing a semiconductor layer includes: forming a film containing a metal element and an oxygen element; generating oxygen gas by heating the film; and forming a semiconductor layer containing a metal chalcogenide from the f…
Who is the assignee on this patent?
Yamamoto Akio, Oguri Seiji, Ogawa Hiromitsu, and 9 more
What technology area does this patent fall under?
Primary CPC classification H10P14/3236. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).