Apparatus for dynamic temperature control of an ion source

US9287079B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9287079-B2
Application numberUS-201414322357-A
CountryUS
Kind codeB2
Filing dateJul 2, 2014
Priority dateJul 2, 2014
Publication dateMar 15, 2016
Grant dateMar 15, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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An apparatus for controlling the temperature of an ion source is disclosed. The ion source includes a plurality of walls defining a chamber in which ions are generated. To control the temperature of the ion source, one or more heat shields is disposed exterior to the chamber. The heat shields are made of high temperature and/or refractory material designed to reflect heat back toward the ion source. In a first position, these heat shields are disposed to reflect a first amount of heat back toward the ion source. In a second position, these heat shields are disposed to reflect a lesser second amount of heat back toward the ion source. In some embodiments, the heat shields may be disposed in one or more intermediate positions, located between the first and second positions.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus comprising: an ion source having a plurality of walls defining a chamber; and a movable heat shield disposed outside the chamber and proximate at least one of the walls, where the movable heat shield has a first position where a first amount of heat is reflected back toward the chamber and a second position where a second amount of heat is reflected back toward the chamber, the second amount of heat being less than the first amount of heat. 2. The apparatus of claim 1 , wherein the plurality of walls comprises a bottom wall, a top wall with an aperture, two end walls and two side walls, where a cathode is disposed proximate one of the two end walls, and wherein the movable heat shield is disposed proximate one of the two end walls. 3. The apparatus of claim 2 , wherein the movable heat shield moves in a direction parallel to a plane of a first of the two end walls and in the first position, the movable heat shield overlaps a portion of a first end wall, and in the second position, the movable heat shield overlaps a smaller portion of the first end wall. 4. The apparatus of claim 2 , wherein the movable heat shield rotates about a pivot point proximate a first of the two end walls and in the first position, the movable heat shield forms a first angle with a first end wall, and in the second position, the movable heat shield forms a second angle with the first end wall, the second angle greater than the first angle. 5. The apparatus of claim 1 , wherein the plurality of walls comprises a bottom wall, a top wall with an aperture, two end walls and two side walls, where a cathode is disposed proximate one of the two end walls, and wherein the movable heat shield is disposed proximate one of the two side walls. 6. The apparatus of claim 5 , wherein the movable heat shield moves in a direction parallel to a plane of a first of the side walls and in the first position, the movable heat shield overlaps a portion of the first side wall, and in the second position, the movable heat shield overlaps a smaller portion of the first side wall. 7. The apparatus of claim 5 , wherein the movable heat shield rotates about a pivot point proximate a first of the side walls and in the first position, the movable heat shield forms a first angle with the first side wall, and in the second position, the movable heat shield forms a second angle with the first side wall, greater than the first angle. 8. The apparatus of claim 1 , further comprising an actuator in communication with the movable heat shield to move the movable heat shield between the first position and the second position. 9. An apparatus, comprising: an ion source having a plurality of walls defining a chamber, wherein the plurality of walls comprises a bottom wall, a top wall with an aperture, two end walls and two side walls, where a cathode is disposed proximate one of the two end walls; two movable heat shields, each disposed outside the chamber and proximate a respective one of the two side walls, where each of the two movable heat shields has a first position where a first amount of heat is reflected back toward the chamber and a second position where a second amount of heat is reflected back toward the chamber, where the second amount is less than the first amount; and an actuator in communication with each of the movable heat shields, to move each of the movable heat shields in a direction parallel to a plane of the side walls between the first position and the second position, wherein in the first position, the movable heat shields overlap a portion of the side walls, and in the second position, the movable heat shields overlap a smaller portion of the side walls. 10. The apparatus of claim 9 , wherein the actuator moves the movable heat shields independently. 11. The apparatus of claim 9 , wherein the actuator moves each of the movable heat shields to at least one intermediate position between the first position and the second position. 12. The apparatus of claim 9 , further comprising rails to guide the movable heat shields along a desired path between the first position and the second position. 13. The apparatus of claim 9 , further comprising a second set of movable heat shields, each disposed proximate a respective one of the two end walls, and in communication with the actuator. 14. An apparatus, comprising: an ion source having a plurality of walls defining a chamber, wherein the plurality of walls comprises a bottom wall, a top wall with an aperture, two end walls and two side walls, where a cathode is disposed proximate one of the two end walls; two movable heat shields, each disposed outside the chamber and proximate a respective one of the two side walls, where each of the movable heat shields has a first position where a first amount of heat is reflected back toward the chamber and a second position where a second amount of heat is reflected back toward the chamber, the second amount being less than the first amount; and an actuator in communication with each of the movable heat shields, to rotate each of the movable heat shields about a respective pivot point, wherein in the first position, the movable heat shields form a first angle with the respective side wall, and in the second position, the movable heat shields form a second angle with the respective side wall, greater than the first angle. 15. The apparatus of claim 14 , wherein the actuator rotates the movable heat shields independently. 16. The apparatus of claim 14 , wherein the actuator rotates each of the movable heat shields to at least one intermediate position between the first position and the second position.

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What does patent US9287079B2 cover?
An apparatus for controlling the temperature of an ion source is disclosed. The ion source includes a plurality of walls defining a chamber in which ions are generated. To control the temperature of the ion source, one or more heat shields is disposed exterior to the chamber. The heat shields are made of high temperature and/or refractory material designed to reflect heat back toward the ion so…
Who is the assignee on this patent?
Varian Semiconductor Equipment
What technology area does this patent fall under?
Primary CPC classification H01J27/022. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).