High aspect ratio dense pattern-programmable nanostructures utilizing metal assisted chemical etching
US-2015376798-A1 · Dec 31, 2015 · US
US9287016B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9287016-B2 |
| Application number | US-201013519175-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 28, 2010 |
| Priority date | Dec 28, 2009 |
| Publication date | Mar 15, 2016 |
| Grant date | Mar 15, 2016 |
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The device is configured from: a reflective surface shape controllable mirror in which a band-shaped X-ray reflective surface 2 is formed on a central portion of a front surface of a substrate 1 , reference planes 3 are formed along both sides of the X-ray reflective surface, and a plurality of piezoelectric elements 4 are attached to at least one of front and back surfaces of the substrate so as to be arranged in the longitudinal direction of the X-ray reflective surface on both side portions of the substrate, and a multichannel control system for applying a voltage to each of the piezoelectric elements.
Opening claim text (preview).
The invention claimed is: 1. A reflective surface shape controllable mirror device for reflecting an x-ray beam in the soft and hard x-ray regions to thereby change a wavefront of the x-ray beam into an ideal wavefront, the reflective surface shape controllable mirror device comprising: A reflective surface shape controllable mirror; the mirror including A substrate having a front surface and a back surface, A band-shaped x-ray reflective surface formed on a central portion of the front surface of the substrate with desired accurate precision, Reference planes formed along both sides of the x-ray reflective surface with desired accurate precision, Wherein shapes of the x-ray reflective surface and the reference planes are measured, and wherein the shapes and relative shape difference therebetween are calculated to be obtained as initial shape data, A plurality of piezoelectric elements attached to the front surface or the back surface of the substrate in lines along lateral sides of the reference planes so as to be arranged in the longitudinal direction of the x-ray reflective surface on both side portions of the substrate so as to be symmetric with respect to the x-ray reflective surface, and A plurality of-piezoelectric elements attached to an opposite surface of the substrate in such manner that the piezoelectric elements are arranged in lines so as to be symmetric with respect to the x-ray reflective surface, and A multichannel control system for applying a voltage to each of the piezoelectric elements. 2. The reflective surface shape controllable minor device according to claim 1 , wherein the reflective surface shape controllable minor is configured in such a manner that the piezoelectric elements are arranged in lines on both of the front surface and the back surface of the substrate with the same arrangement pattern. 3. An X-ray focusing method using the reflective surface shape controllable mirror device according to claim 1 , the X-ray focusing method comprising: incorporating the reflective surface shape controllable minor in which initial shape data of the X-ray reflective surface and the reference planes is obtained to calculate a relative shape difference therebetween in advance into an X-ray focusing optical system; monitoring the shapes of the reference planes of the reflective surface shape controllable minor in the incorporated state; calculating a phase error of the X-ray focusing optical system by a phase retrieval method based on an intensity distribution of an X-ray profile measured in an X-ray focusing area; and applying a voltage to each of the piezoelectric elements of the reflective surface shape controllable minor from the control system so as to eliminate the phase error to thereby change the shape of the X-ray reflective surface. 4. A method for manufacturing a reflective surface shape controllable mirror for reflecting an x-ray beam in the soft and hard x-ray regions to thereby change a wavefront of the x-ray beam into an ideal wavefront, the method comprising: Machining a band-shaped x-ray surface formed on a central portion of a front surface of a substrate having a front surface and a back surface, and reference planes formed along both sides of the x-ray reflective surface with a desired accuracy, and Measuring shapes of the x-ray reflective surface and the reference planes, calculating the shapes and the reference shape difference therebetween, and obtaining the calculated shapes as initial shape data, and thereafter Attaching a plurality of piezoelectric elements to one of the front and back surfaces of the substrate in lines along lateral sides of the reference planes so as to be arranged in the longitudinal direction of the x-ray reflective surface on both side portions of the substrate, so as to be symmetric with respect to the x-ray reflective surface, and Attaching the piezoelectric elements to the opposite surface of the substrate in such manner that the piezoelectric elements are arranged in lines so as to be symmetric with respect to the x-ray reflective surface. 5. The method according to claim 4 , wherein the piezoelectric elements are arranged in lines on both of the front and back surfaces of the substrate with the same arrangement pattern.
Piezoelectric device making · CPC title
using diffraction, refraction or reflection, e.g. monochromators (G21K1/10, G21K7/00 take precedence) · CPC title
having a curved surface · CPC title
Construction details · CPC title
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