Self-assemblable polymer and method for use in lithography

Patent metadata

Field	Value
Publication number	US-9285676-B2
Application number	US-201214124213-A
Country	US
Kind code	B2
Filing date	Jun 7, 2012
Priority date	Jun 23, 2011
Publication date	Mar 15, 2016
Grant date	Mar 15, 2016

Abstract

A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T OD , further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

First claim

The invention claimed is:

1. A block copolymer comprising a first block of first monomer and a second block of second monomer, the copolymer adapted to undergo a transition from a disordered state to an ordered state at a temperature less than T OD , the copolymer further comprising a bridging moiety comprising a functional group arranged to provide hydrogen bonding between bridging moieties of adjacent first and second block copolymer molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the copolymer.

2. The block copolymer of claim 1 , wherein the bridging moieties of adjacent first and second block copolymer molecules are arranged to be mutually bondable by hydrogen bonding at a temperature at or below a transition temperature T H , wherein T OD is greater than T H and T H is greater than T g , and wherein the first and second adjacent molecules of the block copolymer are not mutually bondable by hydrogen bonding at a temperature in excess of T H .

3. The block copolymer of claim 1 , wherein the first and second blocks are each directly covalently bonded to the bridging moiety.

4. The block copolymer of claim 1 , wherein the hydrogen bonding is between first functional groups of the bridging moiety of the first adjacent molecules and second functional groups of the bridging moiety of the second adjacent molecules and between second functional groups of the bridging moiety of the first adjacent molecules and first functional groups of the bridging moiety of the second adjacent molecules.

5. The block copolymer of claim 1 , wherein the bridging moiety comprises at least one urea group.

6. The block copolymer of claim 1 , wherein the bridging moiety comprises at least one 2-ureido[1H]-pyrimidin-4-one group.

7. The block copolymer of claim 1 , wherein the bridging moiety comprises at least one peptide group.

8. The block copolymer of claim 7 , wherein the peptide group comprises from 2 to 10 amino acids.

9. The block copolymer of claim 8 , wherein the peptide group is a polyalanine.

10. The block copolymer of claim 1 , wherein the bridging moiety further comprises an oligomeric stabilizing portion having a low chemical affinity with both the first monomer and with the second monomer.

11. The block copolymer of claim 10 , wherein the oligomeric stabilizing portion is selected from the group consisting of: an oligomer comprising an aromatic ring, a perfluorinated oligomer, and a silicone oligomer.

12. A method for providing an ordered layer of a block copolymer on a substrate, the block copolymer having a glass transition temperature T g and comprising a first block of first monomer, a second block of second monomer and a bridging moiety comprising a functional group,
wherein the block copolymer is adapted to undergo a transition from a disordered state to an ordered state at a temperature less than T OD ,
wherein bridging moieties of adjacent first and second block copolymer molecules when in the ordered state are arranged to be mutually bondable by hydrogen bonding due to the functional group at a temperature that is less than or equal to a transition temperature T H and is in excess of T g , wherein T OD is greater than T H ,
the method comprising:
providing a layer of the block copolymer on the substrate,
maintaining the layer at a first temperature T 1 above T g , wherein the first temperature T 1 is less than or equal to T OD and greater than T H , so that the block copolymer assembles to provide an ordered layer,
cooling the ordered layer to a second temperature T 2 wherein T 2 is less than or equal to T H and greater than T g and maintaining the ordered layer at temperature T 2 so that hydrogen bonding between the bridging moiety of adjacent molecules is effected, and
cooling the block copolymer to a temperature below its glass transition temperature T g .

13. The method of claim 12 wherein after the cooling of the ordered layer to a second temperature T 2 , the layer is cycled in temperature between alternating first and second temperatures prior to the cooling of the block copolymer to a temperature below its glass transition temperature T g .

14. A method for providing an ordered layer of a block copolymer on a substrate, the block copolymer having a glass transition temperature T g and comprising a first block of first monomer, a second block of second monomer and a bridging moiety comprising a functional group,
wherein the block copolymer is adapted to undergo a transition from a disordered state to an ordered state at a temperature less than T OD ,
wherein bridging moieties of adjacent first and second block copolymer molecules when in the ordered state are arranged to be mutually bondable by hydrogen bonding due to the functional group at a temperature that is less than or equal to a transition temperature T H and is in excess of T g , wherein T H is greater than T OD ,
the method comprising:
providing a layer of the block copolymer on the substrate,
maintaining the layer at a first temperature T 1 above T g , wherein the first temperature T 1 is greater than T OD and less than or equal to T H , so that hydrogen bonding between the bridging moiety of adjacent molecules is effected and the block copolymer pre-assembles through hydrogen bonding of the bridging moiety,
cooling the ordered layer to a second temperature T 2 wherein T 2 is less than T OD or T H and greater than T g and maintaining the ordered layer at temperature T 2 so that the block-copolymer self-assembles, and
cooling the block copolymer to a temperature below its glass transition temperature T g .

15. A lithography method for patterning a surface of a substrate by resist etching, wherein the method comprises providing an ordered layer of block copolymer at the surface by the method of claim 12 , at least partially removing the first block or second block from the ordered block copolymer layer, and etching on the surface of the substrate using the other of the first block or second block as a resist layer during the etching.

16. A composition comprising:
a block copolymer comprising a first block of first monomer and a second block of second monomer, the copolymer adapted to undergo a transition from a disordered state to an ordered state at a temperature less than T OD , and
a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second block copolymer molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the block copolymer is in the ordered state and at a temperature in excess of a glass transition temperature T g for the block copolymer.

17. The composition of claim 16 , wherein the non-covalent bonding is hydrogen bonding between the terminal groups and the functional group of the second monomer.

18. The composition of claim 16 , wherein the non-covalent bonding is ionic bonding between charged terminal groups and an oppositely charged functional group of the second monomer.

19. The composition of claim 16 , wherein the crosslinking occurs at a temperature at or below a transition temperature T H , wherein T OD is greater than T H and T H is greater than T g , and wherein the crosslinking is not substantially present at a temperature in excess of T H .

20. The composition of claim 16 , wherein the crosslinking compound has a molecular weight of 1500 Dalton or l

Assignees

• Brizard Aurelie Marie Andree
• Ketelaars Wilhelmus Sebastianus Marcus Maria
• Wuister Sander Frederik
• Koole Roelof
• Peeters Emiel
• Van Heesch Christianus Martinus
• Boots Henri Marie Joseph
• Nguyen Thanh Trung
• Asml Netherlands Bv

Inventors

• Brizard Aurelie Marie Andree
• Ketelaars Wilhelmus Sebastianus Marcus Maria
• Wuister Sander Frederik
• Koole Roelof
• Peeters Emiel
• Van Heesch Christianus Martinus
• Boots Henri Marie Joseph
• Nguyen Thanh Trung

Classifications

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• C08F299/02

  from unsaturated polycondensates · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• H01L51/0043

  Electricity · mapped topic

• C08F299/04

  from polyesters · CPC title