Linear capacitive displacement sensor

US9285207B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9285207-B2
Application numberUS-201313952281-A
CountryUS
Kind codeB2
Filing dateJul 26, 2013
Priority dateMar 13, 2013
Publication dateMar 15, 2016
Grant dateMar 15, 2016

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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A method and system for measuring displacement of a structure is disclosed. The method and system comprise providing a first capacitance and providing a second capacitance. The first and second capacitances share a common terminal. The method and system further include determining a difference of the inverses of the value of the first and second capacitances when the structure is displaced. The first capacitance varies in inverse relation to the displacement of the structure.

First claim

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What is claimed is: 1. A method for measuring displacement of a structure, comprising: providing a first capacitance; providing a second capacitance, wherein the first and second capacitances share a common terminal; wherein the second capacitance is a rigid capacitance attached between the common terminal and the structure; and determining a difference of the inverses of the value of the first and second capacitances when the structure is displaced; wherein only the first capacitance varies in inverse relation to the displacement of the structure. 2. The method of claim 1 wherein the determining step is performed in at least two phases wherein the first phase produces a first output voltage corresponding to a difference of the first and second capacitances; wherein the first output voltage is stored in a sampling capacitance; and the second phase produces a second output voltage that is proportional to the stored first output voltage multiplied by the ratio of a sampling capacitance to the first capacitance. 3. The method of claim 1 , wherein the determining step is performed in three phases; wherein in the first phase, an output voltage is proportional to a difference between the values of the first and second capacitances; wherein the first output voltage is stored in a first sampling capacitance; in a second phase, the second phase produces a second output voltage that is proportional to the stored first voltage multiplied by the ratio of a sampling capacitance to the first capacitance; wherein the second output voltage is stored in a second sampling capacitance; the third phase produces a third output voltage that is proportional to the stored second voltage multiplied by the ratio of the second sampling capacitance to the second capacitance. 4. The method of claim 1 , wherein the determining step is performed in four phases; wherein in a first phase, an output voltage is proportional to a difference between the values of the first and second capacitances; wherein the first output voltage is stored in a first sampling capacitance; in a second phase, the second phase produces a second output voltage that is proportional to the stored first voltage multiplied by the ratio of the first sampling capacitance to the first capacitance; wherein the second output voltage is stored in a second sampling capacitance; in a third phase, the third phase produces a third output voltage that is proportional to the stored second voltage multiplied by the ratio of a second sampling capacitance to the second capacitance; wherein the third output voltage is stored in a third sampling capacitor; and in a fourth phase, the fourth phase produces a fourth output voltage that is proportional to the stored third voltage multiplied by the ratio of the third sampling capacitance to the first capacitance. 5. The method of claim 1 wherein the structure comprises a displacement sensor. 6. The method of claim 1 wherein the displacement varies in proportion to an applied pressure. 7. A displacement sensor, comprising: a first capacitor; a second capacitor; wherein the second capacitor is a rigid capacitance attached between the common terminal and the structure; wherein the first and second capacitors share a common terminal; wherein a value of the first capacitor varies in relation to a displacement; and an amplifier coupled to the first and second capacitors; wherein the amplifier determines a difference of the inverses of the value of the first and second capacitances when the structure is displaced; wherein only the first capacitance varies in inverse relation to the displacement of the structure. 8. The displacement sensor of claim 7 , wherein the determination is performed in at least two phases wherein the first phase produces a first output voltage corresponding to a difference of the first and second capacitors; wherein the first output voltage is stored in a sampling capacitance; and the second phase produces a second output voltage that is proportional to the stored first output voltage multiplied by the ratio of the sampling capacitance to the first capacitor. 9. The displacement sensor of claim 7 , wherein the determination is performed in three phases; wherein in the first phase, an output voltage is proportional to a difference between the values of the first and second capacitors; wherein the first output voltage is stored in a first sampling capacitance; in a second phase, the second phase produces a second output voltage that is proportional to the stored first voltage multiplied by the ratio of the first sampling capacitance to the first capacitor; wherein the second output voltage is stored in a second sampling capacitance; and in a third phase, the third phase produces a third output voltage that is proportional to the stored second voltage multiplied by the ratio of a second sampling capacitance to the second capacitor. 10. The displacement sensor of claim 7 , wherein the determination step is performed in four phases; wherein in a first phase, an output voltage is proportional to a difference between the values of the first and second capacitors; wherein the first output voltage is stored in a first sampling capacitance; in a second phase, the second phase produces a second output voltage that is proportional to the stored first voltage multiplied by the ratio of the first sampling capacitance to the first capacitor; wherein the second output voltage is stored in a second sampling capacitance; in a the third phase produces a third output voltage that is proportional to the stored second voltage multiplied by the ratio of a second sampling capacitance to the second capacitor; wherein the third output voltage is stored in a third sampling capacitor; and in a fourth phase; the fourth phase produces a fourth output voltage that is proportional to the stored third voltage multiplied by the ratio of the third sampling capacitance to the first capacitor. 11. The displacement sensor of claim 7 , wherein the amplifier comprises a differential amplifier.

Assignees

Inventors

Classifications

  • by varying capacitance · CPC title

  • G01B7/14Primary

    for measuring distance or clearance between spaced objects or spaced apertures (G01B7/30 takes precedence) · CPC title

  • by varying overlap · CPC title

  • with associated circuitry (G01L1/146 and G01L1/148 take precedence) · CPC title

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What does patent US9285207B2 cover?
A method and system for measuring displacement of a structure is disclosed. The method and system comprise providing a first capacitance and providing a second capacitance. The first and second capacitances share a common terminal. The method and system further include determining a difference of the inverses of the value of the first and second capacitances when the structure is displaced. The…
Who is the assignee on this patent?
Invensense Inc
What technology area does this patent fall under?
Primary CPC classification G01B7/14. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Mar 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).