Deposition of ultra-thin inorganic oxide coatings on packaging

Patent metadata

Field	Value
Publication number	US-9284104-B2
Application number	US-201313923899-A
Country	US
Kind code	B2
Filing date	Jun 21, 2013
Priority date	Jun 23, 2012
Publication date	Mar 15, 2016
Grant date	Mar 15, 2016

Abstract

An apparatus and method for depositing an ultra-thin inorganic coating on to a packaging film substrate is disclosed. Flame pretreatment enhances the quality of the inorganic coating. Multiple coating layers may be deposited onto the substrate by passing the substrate over various one or more flame head configurations in either a stand-alone or in-line manufacturing environment.

First claim

We claim:

1. A method of coating a film substrate with at least one inorganic oxide layers comprising:
pretreating said substrate by passing said substrate through at least one flame treatment flame head assembly supplied with no inorganic oxide precursor;
after said pretreating step, depositing two or more inorganic oxide layers on said substrate by passing said substrate through two or more deposition flame heads on at least one deposition flame head assembly supplied with at least one inorganic oxide precursor, wherein
said pretreating and depositing steps occur at open atmosphere;
said depositing step is performed at a flame temperature that ranges from 650° C. to 1450° C.;
said pretreatment step substantially enhances an atomic percentage of inorganic oxide in said inorganic oxide layers during said deposition step such that WVTR of said inorganic layers is <0.2 g/m 2 /day; and OTR of said inorganic layers is <20 cc/m 2 /day.

2. The method of claim 1 wherein said at least one inorganic oxide precursor comprises at least one of tetraethyl orthosilicate, tetramethyl disiloxane, silicon tetrachloride, silane, trimethylaluminium, triethylaluminium, methylaluminiumdichlorid-diethyletherate, trimethylaluminium-diethyletherate, ethylaluminiumdichlorid-diethyletherate, diethylaluminium-dimethylamide, aluminum trichloride, and aluminum halides.

3. The method of claim 1 wherein said pretreating step comprising passing said substrate over a portion of at least one chill roll.

4. The method of claim 1 wherein said pretreating step comprises passing said substrate over a portion of multiple chill rolls.

5. The method of claim 3 wherein said chill roll comprises a temperature of 40° C. to 80° C.

6. The method of claim 1 wherein said pretreating and depositing steps occur as said film substrate is unwound from one roll and wound onto a second roll.

7. The method of claim 1 wherein said pretreating and depositing steps occur in-line during manufacturing of said film substrate.

8. The method of claim 1 wherein said film substrate is cooled during said pretreating step by spraying cooling fluid on said film substrate.

Assignees

• Frito Lay North America Inc

Inventors

• Godfroid Robert
• Jordan Glenn
• Knoerzer Anthony Robert
• Laverdure Kenneth Scott
• Mount Iii Eldridge M

Classifications

• C23C16/56

  After-treatment · CPC title

• C23C16/545

  for coating elongated substrates · CPC title

• C23C16/463

  Cooling of the substrate · CPC title

• C23C16/513

  using plasma jets · CPC title

• C23C16/401

  containing silicon · CPC title