Semiconductor device
US-2024413252-A1 · Dec 12, 2024 · US
Methods for passivating a carbonic nanolayer
US9281185B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9281185-B2 |
| Application number | US-201414535675-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 7, 2014 |
| Priority date | Oct 23, 2009 |
| Publication date | Mar 8, 2016 |
| Grant date | Mar 8, 2016 |
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Abstract
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Methods for passivating a nanotube fabric layer within a nanotube switching device to prevent or otherwise limit the encroachment of an adjacent material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous nanotube fabric layer to fill in the voids within the porous nanotube fabric layer while one or more other material layers are applied adjacent to the nanotube fabric layer. Once the other material layers are in place, the sacrificial material is removed. In other embodiments, a non-sacrificial filler material (selected and deposited in such a way as to not impair the switching function of the nanotube fabric layer) is used to form a barrier layer within a nanotube fabric layer. In other embodiments, individual nanotube elements are combined with and nanoscopic particles to limit the porosity of a nanotube fabric layer.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for forming a carbonic nanolayer based device, comprising: combining a first volume of carbon structures and a second volume of nanoscopic particles in a liquid medium to form an application solution; depositing said application solution over a first material layer as to form a composite layer, said composite layer comprising a mixture of said carbon structures and said nanoscopic particles; depositing a second material layer such that said com…
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Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US9281185B2 cover?
- Methods for passivating a nanotube fabric layer within a nanotube switching device to prevent or otherwise limit the encroachment of an adjacent material layer are disclosed. In some embodiments, a sacrificial material is implanted within a porous nanotube fabric layer to fill in the voids within the porous nanotube fabric layer while one or more other material layers are applied adjacent to th…
- Who is the assignee on this patent?
- Nantero Inc
- What technology area does this patent fall under?
- Primary CPC classification H10D62/118. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).