Scanning ion beam deposition and etch
US-12176178-B2 · Dec 24, 2024 · US
Methods of fabricating semiconductor devices
US9281179B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9281179-B2 |
| Application number | US-201113303317-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 23, 2011 |
| Priority date | Dec 23, 2010 |
| Publication date | Mar 8, 2016 |
| Grant date | Mar 8, 2016 |
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Abstract
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Provided is a method of fabricating a semiconductor device. The method includes: preparing a substrate with an etching target, and etching the etching target through a plasma-free etching process that uses an etching gas including one of interhalogen compound, F 2 , XeF 2 and combinations thereof.
First claim
Opening claim text (preview).
What is claimed is: 1. A method of fabricating a semiconductor device, the method comprising: preparing a substrate with an etching target; and etching the etching target using a plasma-free etching process that uses an etching gas including one of an interhalogen compound, F 2 , XeF 2 , or combinations thereof, and performing a hydrogen replacement process on the substrate after the plasma-free etching process is performed, wherein the hydrogen replacement process includes p…
Assignees
Inventors
Classifications
- H10P50/242Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
- H10P70/234Primary
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US9281179B2 cover?
- Provided is a method of fabricating a semiconductor device. The method includes: preparing a substrate with an etching target, and etching the etching target through a plasma-free etching process that uses an etching gas including one of interhalogen compound, F 2 , XeF 2 and combinations thereof.
- Who is the assignee on this patent?
- Lee Mongsup, Hwang Inseak, Samsung Electronics Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10P50/242. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).