Projection objective for a microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9280058-B2
Application number	US-201414506992-A
Country	US
Kind code	B2
Filing date	Oct 6, 2014
Priority date	Jun 10, 2004
Publication date	Mar 8, 2016
Grant date	Mar 8, 2016

Abstract

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>−2 successive sections A 1 to A N of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A j , j=1 . . . N and a second optical element is arranged in another section A k , k=1 . . . N, the magnitude difference |k−j| being an odd number.

First claim

The invention claimed is:

1. A projection objective, comprising:
a plurality of optical elements comprising a plurality of lenses, the plurality of optical elements being arranged to direct light from a first field plane to a second field plane in order to form an image at the second field plane of an object positioned at the first field plane, there being at least one intermediate image at a corresponding field plane between the first field plane and the second field plane, there being at least two pupil planes in a path of the light between the first field plane and the second field plane, each pupil plane separating adjacent field planes;
the plurality of optical elements comprising a first lens and a second lens, the first and second lenses each comprising a respective surface that is in the path of the light and is not rotationally symmetric with respect to an optical axis of the projection objective due to a corrective structure at the surface, wherein:
the first lens is positioned in the path of the light downstream from an adjacent one of the field planes and upstream from an adjacent one of the pupil planes and the second lens is positioned in the path of the light upstream from an adjacent one of the field planes and downstream from an adjacent one of the pupil planes,
during operation of the projection objective, the corrective structures at the corresponding surface of the first and second lenses reduce imaging errors at the second field plane, and
the projection objective is a microlithography projection objective,
wherein the imaging errors at the second field plane are due to a wavefront deformation of the light, a field-dependency of the wavefront deformation has even and odd symmetry components, and the corrective structures jointly correct the odd symmetry components of the field-dependency of the wavefront deformation.

2. The projection objective of claim 1 , wherein the projection objective is a catadioptric projection objective.

3. The projection objective of claim 2 , wherein the catadioptric projection objective comprises a concave mirror.

4. The projection objective of claim 3 , wherein the concave mirror is positioned in a vicinity of one of the pupil planes.

5. The projection objective of claim 3 , wherein one of the intermediate images is downstream from the concave mirror in the light path.

6. The projection objective of claim 3 , wherein the catadioptric projection objective comprises a pair of fold mirrors.

7. The projection objective of claim 1 , wherein the plurality of optical elements comprises a third lens comprising a surface that is in the path of the light and is not rotationally symmetric with respect to the optical axis of the projection objective due to a corrective structure at the surface.

8. The projection objective of claim 1 , wherein the corrective structures are formed by erosion of a lens material.

9. The projection objective of claim 8 , wherein a depth by which the lens material is eroded is less than 500 nm.

10. The projection objective of claim 1 , wherein the imaging error is caused by a form error in one of the optical elements or a refractive index inhomogeneity of a lens material.

11. The projection objective of claim 1 , wherein the plurality of optical elements comprises an additional optical element arranged in or close to one of the pupil planes, the additional optical element comprising a surface in the path of the light that is not rotationally symmetric with respect to the optical axis of the projection objective due to a corrective structure at the surface of the additional optical element.

12. The projection objective of claim 11 , wherein the corrective structure at the surface of the additional optical element corrects a field-independent wavefront error during operation of the projection objective.

13. The projection objective of claim 1 , wherein the corrective structures jointly correct even symmetry components of the field-dependency of the wavefront deformation in addition to odd components.

14. The projection objective of claim 13 , wherein the plurality of optical elements comprises an additional optical element arranged in or close to one of the pupil planes, the additional optical element comprising a surface in the path of the light that is not rotationally symmetric with respect to the optical axis of the projection objective due to a corrective structure at the surface of the additional optical element.

15. The projection objective of claim 14 , wherein the corrective structure at the surface of the additional optical element corrects a field-independent wavefront error during operation of the projection objective.

16. The method of claim 14 , wherein the corrective structure at the surface of the additional optical element corrects a field-independent wavefront error during operation of the projection objective.

17. A method for making a projection objective for microlithography, comprising:
arranging a plurality of optical elements relative to one another to provide the projection objective in a first arrangement, the plurality of optical elements including a first lens and a second lens to direct light from a first field plane to a second field plane in order to form an image at the second field plane of an object positioned at the first field plane, there being at least one intermediate image between the first field plane and the second field plane, there being at least one intermediate image at a corresponding field plane between the first field plane and the second field plane, there being at least two pupil planes in a path of the light between the first field plane and the second field plane, each pupil plane separating adjacent field planes;
forming a corrective structure on a curved surface of a first lens and forming a corrective structure on a curved surface of the second lens; and
after the forming the corrective structures, providing the projection objective in a second arrangement,
wherein the first lens is positioned in the projection objective in the path of the light downstream from an adjacent one of the field planes and upstream from an adjacent one of the pupil planes and the second lens is positioned in the path of the light upstream from an adjacent one of the field planes and downstream from an adjacent one of the pupil planes, and
wherein during operation of the projection objective in the second arrangement, the corrective structures reduce imaging errors of the projection objective at the second field plane relative to the first arrangement,
wherein the imaging errors at the second field plane are due to a wavefront deformation of the light, a field-dependency of the wavefront deformation has even and odd symmetry components, and the corrective structures jointly correct the odd symmetry components of the field-dependency of the wavefront deformation.

18. The method of claim 17 , wherein the projection objective is a catadioptric projection objective.

19. The method of claim 18 , wherein the catadioptric projection objective comprises a concave mirror.

20. The method of claim 19 , wherein the concave mirror is positioned in a vicinity of one of the pupil planes.

21. The method of claim 20 , wherein one of the intermediate images is downstream from the concave mirror in the light path.

22. The method of claim 20 , wherein the catadioptric projection objective comprises a pair of fold mirrors.

23. The method of claim 17 , further comprising forming a c

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Wabra Norbert
• Eder Robert

Classifications

• G02B27/0025

  for optical correction, e.g. distorsion, aberration · CPC title

• G03F7/706 Primary

  Aberration measurement · CPC title

• G03F7/70241

  Optical aspects of refractive lens systems, i.e. comprising only refractive elements · CPC title

• G03F7/70591

  Testing optical components · CPC title

• G03F7/70308 Primary

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title