Semiconductor device in which oxygen deficiency in semiconductor is reduced and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-9276129-B2
Application number	US-201414534220-A
Country	US
Kind code	B2
Filing date	Nov 6, 2014
Priority date	Jun 11, 2010
Publication date	Mar 1, 2016
Grant date	Mar 1, 2016

Abstract

An object of an embodiment of the present invention is to manufacture a highly-reliable semiconductor device comprising a transistor including an oxide semiconductor, in which change of electrical characteristics is small. In the transistor including an oxide semiconductor, oxygen-excess silicon oxide (SiO X (X>2)) is used for a base insulating layer of a top-gate structure or for a protective insulating layer of a bottom-gate structure. By using the oxygen-excess silicon oxide, oxygen is discharged from the insulating layer, and oxygen deficiency of an oxide semiconductor layer and the interface state density between the oxide semiconductor layer and the base insulating layer or the protective insulating layer can be reduced, so that the highly-reliable semiconductor device in which change of electrical characteristics is small can be manufactured.

First claim

The invention claimed is:

1. A semiconductor device comprising:
a first insulating layer comprising silicon and oxygen over a substrate;
an oxide semiconductor layer over and in contact with the first insulating layer;
a gate electrode over the oxide semiconductor layer;
a protective insulating layer over the gate electrode, the protective insulating layer comprising an opening; and
a source electrode and a drain electrode electrically connected to the oxide semiconductor layer through the opening,
wherein the number of oxygen atoms per unit volume of the first insulating layer is more than twice the number of silicon atoms per unit volume of the first insulating layer.

2. The semiconductor device according to claim 1 , further comprising a second insulating layer over the oxide semiconductor layer,
wherein the number of oxygen atoms per unit volume of the second insulating layer is more than twice the number of silicon atoms per unit volume of the second insulating layer.

3. The semiconductor device according to claim 1 , wherein the oxide semiconductor layer contains hydrogen at a concentration of less than 1×10 18 cm −3 .

4. The semiconductor device according to claim 1 , wherein a carrier concentration of the oxide semiconductor layer is less than 1×10 14 cm −3 .

5. The semiconductor device according to claim 1 , wherein the first insulating layer is a silicon oxide layer.

6. A method for manufacturing a semiconductor device, comprising the steps of:
forming a first insulating layer comprising silicon and oxygen over a substrate;
forming an oxide semiconductor layer over and in contact with the first insulating layer;
forming a gate electrode over the oxide semiconductor layer;
forming a protective insulating layer over the gate electrode, the protective insulating layer comprising an opening; and
forming a source electrode and a drain electrode electrically connected to the oxide semiconductor layer through the opening,
wherein the number of oxygen atoms per unit volume of the first insulating layer is more than twice the number of silicon atoms per unit volume of the first insulating layer.

7. The method for manufacturing the semiconductor device according to claim 6 , wherein the number of silicon atoms and the number of oxygen atoms per unit volume of the first insulating layer are measured by Rutherford backscattering spectrometry.

8. The method for manufacturing the semiconductor device according to claim 6 , wherein the oxide semiconductor layer contains hydrogen at a concentration of less than 1×10 18 cm −3 .

9. The method for manufacturing the semiconductor device according to claim 6 , wherein a carrier concentration of the oxide semiconductor layer is less than 1×10 14 cm −3 .

10. The method for manufacturing the semiconductor device according to claim 6 , wherein the first insulating layer is a silicon oxide layer.

11. The method for manufacturing the semiconductor device according to claim 6 , further comprising a step of performing a heat treatment in which an excess of oxygen in the first insulating layer is supplied to the oxide semiconductor layer.

12. A method for manufacturing a semiconductor device, comprising the steps of:
forming a first insulating layer comprising silicon and oxygen over a substrate;
forming an oxide semiconductor layer over and in contact with the first insulating layer;
forming a second insulating layer comprising silicon and oxygen over and in contact with the oxide semiconductor layer;
forming a gate electrode over the oxide semiconductor layer;
forming a protective insulating layer over the gate electrode, the protective insulating layer comprising an opening; and
forming a source electrode and a drain electrode electrically connected to the oxide semiconductor layer through the opening,
wherein the number of oxygen atoms per unit volume of the first insulating layer is more than twice the number of silicon atoms per unit volume of the first insulating layer, and
wherein the number of oxygen atoms per unit volume of the second insulating layer is more than twice the number of silicon atoms per unit volume of the second insulating layer.

13. The method for manufacturing the semiconductor device according to claim 12 , wherein the number of silicon atoms and the number of oxygen atoms per unit volume of the first insulating layer or the second insulating layer are measured by Rutherford backscattering spectrometry.

14. The method for manufacturing the semiconductor device according to claim 12 , wherein the oxide semiconductor layer contains hydrogen at a concentration of less than 1×10 18 cm −3 .

15. The method for manufacturing the semiconductor device according to claim 12 , wherein a carrier concentration of the oxide semiconductor layer is less than 1×10 14 cm −3 .

16. The method for manufacturing the semiconductor device according to claim 12 , wherein the first insulating layer or the second insulating layer is a silicon oxide layer.

17. The method for manufacturing the semiconductor device according to claim 12 , further comprising a step of performing a heat treatment in which an excess of oxygen in the first insulating layer is supplied to the oxide semiconductor layer.

18. The method for manufacturing the semiconductor device according to claim 12 , wherein the second insulating layer further includes an aluminum oxide layer.

Assignees

• Semiconductor Energy Lab

Inventors

• Yamazaki Shunpei
• Endo Yuta

Classifications

• H10P74/20

  characterised by the properties tested or measured, e.g. structural or electrical properties · CPC title

• H10W42/00

  Arrangements for protection of devices (arrangements for thermal protection H10W40/00) · CPC title

• H10D30/0312

  characterised by the gate electrodes · CPC title

• H10D30/6758

  characterised by the insulating substrates · CPC title

• H10D30/6704

  having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device · CPC title